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Optical characterization of thin chalcogenide films by multiple-angle-of-incidence ellipsometry

Thin solid films, 2010-04, Vol.518 (12), p.3280-3288

2010

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Clinical and immunological characteristics of bacterial pneumonia associated with HIV infection coupled to drug addiction

Infekt͡s︡ii͡a︡ i immunitet, 2020-11, Vol.10 (4), p.775-781

2020

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Ellipsometric Characterization of Thin Films from Multicomponent Chalcogenide Glasses for Application in Modern Optical Devices

Advances in Condensed Matter Physics, 2013-01, Vol.2013, p.1-11

2013

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ECG/echo indexes in the diagnostic approach to amyloid cardiomyopathy: A head-to-head comparison from the AC-TIVE study

European journal of internal medicine, 2024-04, Vol.122, p.68-77

2024

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Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO2 interface : a spectroscopic ellipsometry study

Thin solid films, 2003-06, Vol.433 (1-2), p.367-370

2003

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Effect of Si nanoparticles embedded in SiOx on optical properties of the films studied by spectroscopic ellipsometry and photoluminescence spectroscopy

Optical materials, 2008-03, Vol.30 (7), p.1115-1120

2008

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Silicon nanoparticles in thermally annealed thin silicon monoxide films

Materials science & engineering. B, Solid-state materials for advanced technology, 2005-12, Vol.124, p.504-507

2005

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Ellipsometric approach for determination of the pseudodielectric function of the Si-interface in the Si-SiO2 structure

Surface science, 1999-12, Vol.443 (3), p.186-194

1999

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Optical study of ultrathin SiO2 grown on hydrogenated silicon

Vacuum, 2002-12, Vol.69 (1-3), p.355-360

2002

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Spectroscopic ellipsometry of oxides and interfaces thermally formed on (100)Si and (111)Si

Surface science, 2000-05, Vol.454, p.402-406

2000

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Determination of refractive index profiles of gradient optical waveguides by ellipsometry

Optics communications, 1998-05, Vol.150 (1), p.121-125

1998

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Study of thin SiO2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon

Vacuum, 2001-05, Vol.61 (2-4), p.263-268

2001

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Spectroscopic ellipsometry characterization of strained interface region in thermally oxidized Si(111)

Thin solid films, 1999, Vol.343, p.385-388

1999

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Effect of hydrogen ion implantation on the physical properties of SiO2/Si system

Vacuum, 2000-08, Vol.58 (2-3), p.166-173

2000

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Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO 2 interface: a spectroscopic ellipsometry study

Thin solid films, 2003, Vol.433 (1), p.367-370

2003

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Light Scattering from Chiral Polymers

Physica scripta, 2000-05, Vol.61 (5), p.611-616

2000

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Ellipsometric approach for evaluation of optical parameters in thin multilayer structures

Surface and interface analysis, 1993-04, Vol.20 (4), p.290-294

1993

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Multiple-angle ellipsometric study of the interfacial layer in SiSiO2 structures

Surface and interface analysis, 1992-06, Vol.19 (1-12), p.483-486

1992

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Some electrophysical characteristics of AC Binder EL structures with as-s protective films

Physica status solidi. A, Applied research, 1992-04, Vol.130 (2), p.455-461

1992

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Ellipsometric approach for determination of the pseudodielectric function of the Si–interface in the Si–SiO 2 structure

Surface science, 1999, Vol.443 (3), p.186-194

1999

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Stress-induced refractive index variation in dry SiO2

Philosophical magazine. B, Physics of condensed matter. Structural, electronic, optical, and magnetic properties., 1992-05, Vol.65 (5), p.961-966

1992

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Study of thin SiO 2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon

Vacuum, 2001, Vol.61 (2), p.263-268

2001

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Effect of hydrogen ion implantation on the physical properties of SiO 2/Si system

Vacuum, 2000, Vol.58 (2), p.166-173

2000

Volltextzugriff (PDF)

Optical study of ultrathin SiO 2 grown on hydrogenated silicon

Vacuum, 2002, Vol.69 (1), p.355-360

2002

Volltextzugriff (PDF)

Multiple‐angle ellipsometric study of the interfacial layer in SiSiO 2 structures

Surface and interface analysis, 1992-06, Vol.19 (1-12), p.483-486

1992

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Optical characterization of thin chalcogenide films by multiple-angle-of-incidence ellipsometry

Clinical and immunological characteristics of bacterial pneumonia associated with HIV infection coupled to drug addiction

Ellipsometric Characterization of Thin Films from Multicomponent Chalcogenide Glasses for Application in Modern Optical Devices

ECG/echo indexes in the diagnostic approach to amyloid cardiomyopathy: A head-to-head comparison from the AC-TIVE study

Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO2 interface : a spectroscopic ellipsometry study

Effect of Si nanoparticles embedded in SiOx on optical properties of the films studied by spectroscopic ellipsometry and photoluminescence spectroscopy

Silicon nanoparticles in thermally annealed thin silicon monoxide films

Ellipsometric approach for determination of the pseudodielectric function of the Si-interface in the Si-SiO2 structure

Optical study of ultrathin SiO2 grown on hydrogenated silicon

Spectroscopic ellipsometry of oxides and interfaces thermally formed on (100)Si and (111)Si

Determination of refractive index profiles of gradient optical waveguides by ellipsometry

Study of thin SiO2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon

Spectroscopic ellipsometry characterization of strained interface region in thermally oxidized Si(111)

Effect of hydrogen ion implantation on the physical properties of SiO2/Si system

Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO 2 interface: a spectroscopic ellipsometry study

Light Scattering from Chiral Polymers

Ellipsometric approach for evaluation of optical parameters in thin multilayer structures

Multiple-angle ellipsometric study of the interfacial layer in SiSiO2 structures

Some electrophysical characteristics of AC Binder EL structures with as-s protective films

Ellipsometric approach for determination of the pseudodielectric function of the Si–interface in the Si–SiO 2 structure

Stress-induced refractive index variation in dry SiO2

Study of thin SiO 2 and its interface formed by thermal oxidation of rf hydrogen plasma-cleaned silicon

Effect of hydrogen ion implantation on the physical properties of SiO 2/Si system

Optical study of ultrathin SiO 2 grown on hydrogenated silicon

Multiple‐angle ellipsometric study of the interfacial layer in SiSiO 2 structures

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