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Studies on atomic layer deposition of MOF-5 thin films

Microporous and mesoporous materials, 2013-12, Vol.182, p.147-154

2013

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Atomic layer deposition and characterization of vanadium oxide thin films

RSC advances, 2013-01, Vol.3 (4), p.1179-1185

2013

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Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis

Journal of photochemistry and photobiology. A, Chemistry., 2009-05, Vol.204 (2-3), p.200-208

2009

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Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors

Chemistry of materials, 2015-01, Vol.27 (2), p.604-611

2015

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Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps

Chemistry of materials, 2009-10, Vol.21 (20), p.4868-4872

2009

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Nanostructured and chemically modified hydrophobic polyolefin surfaces

Colloids and surfaces. A, Physicochemical and engineering aspects, 2006-09, Vol.287 (1), p.175-181

2006

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ALD of YF3 Thin Films from TiF4 and Y(thd)3 Precursors

Chemical vapor deposition, 2009-03, Vol.15 (1-3), p.27-32

2009

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High-temperature X-ray scattering studies of atomic layer deposited IrO 2

Journal of applied crystallography, 2020-04, Vol.53 (2), p.369-380

2020

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Superhydrophobic Polyolefin Surfaces: Controlled Micro- and Nanostructures

Langmuir, 2007-06, Vol.23 (13), p.7263-7268

2007

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Study of a novel ALD process for depositing MgF2 thin films

Journal of materials chemistry, 2007-01, Vol.17 (48), p.5077-5083

2007

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Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants

Thin solid films, 2013-03, Vol.531, p.243-250

2013

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High‐temperature X‐ray scattering studies of atomic layer deposited IrO2

Journal of applied crystallography, 2020-04, Vol.53 (2), p.369-380

2020

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Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2015-03, Vol.119 (11), p.2298-2306

2015

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Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films

Chemistry of materials, 2012-03, Vol.24 (6), p.975-980

2012

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Studies on atomic layer deposition of IRMOF-8 thin films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-01, Vol.33 (1)

2015

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Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

Journal of crystal growth, 2010, Vol.312 (2), p.245-249

2010

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Atomic Layer Deposition of Osmium

Chemistry of materials, 2012-01, Vol.24 (1), p.55-60

2012

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Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors

Chemistry of materials, 2013-05, Vol.25 (9), p.1656-1663

2013

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Molecular Organization of the Tear Fluid Lipid Layer

Biophysical journal, 2010-10, Vol.99 (8), p.2559-2567

2010

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Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Journal of the Electrochemical Society, 2011, Vol.158 (3), p.D158

2011

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Atomic Layer Deposition and Characterization of Bi 2 Te 3 Thin Films

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2015-03, Vol.119 (11), p.2298-2306

2015

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Atomic Layer Deposition and Characterization of Bi sub(2)Te sub(3) Thin Films

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2015-03, Vol.119 (11), p.2298-2306

2015

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Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors

Chemical vapor deposition, 2013-06, Vol.19 (4-6), p.111-116

2013

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Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source

Chemistry of materials, 2008-08, Vol.20 (15), p.5023-5028

2008

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Atomic Layer Deposition of AlF 3 Thin Films Using Halide Precursors

Chemistry of materials, 2015-01, Vol.27 (2), p.604-611

2015

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Studies on atomic layer deposition of MOF-5 thin films

Atomic layer deposition and characterization of vanadium oxide thin films

Effect of thickness of ALD grown TiO2 films on photoelectrocatalysis

Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors

Atomic Layer Deposition of Iridium Thin Films by Consecutive Oxidation and Reduction Steps

Nanostructured and chemically modified hydrophobic polyolefin surfaces

ALD of YF3 Thin Films from TiF4 and Y(thd)3 Precursors

High-temperature X-ray scattering studies of atomic layer deposited IrO 2

Superhydrophobic Polyolefin Surfaces: Controlled Micro- and Nanostructures

Study of a novel ALD process for depositing MgF2 thin films

Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactants

High‐temperature X‐ray scattering studies of atomic layer deposited IrO2

Atomic Layer Deposition and Characterization of Bi2Te3 Thin Films

Evaluation and Comparison of Novel Precursors for Atomic Layer Deposition of Nb2O5 Thin Films

Studies on atomic layer deposition of IRMOF-8 thin films

Growth and phase stabilization of HfO2 thin films by ALD using novel precursors

Atomic Layer Deposition of Osmium

Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors

Molecular Organization of the Tear Fluid Lipid Layer

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Atomic Layer Deposition and Characterization of Bi 2 Te 3 Thin Films

Atomic Layer Deposition and Characterization of Bi sub(2)Te sub(3) Thin Films

Atomic Layer Deposition of LiF Thin Films from Lithd and TiF4 Precursors

Atomic Layer Deposition of MgF2 Thin Films Using TaF5 as a Novel Fluorine Source

Atomic Layer Deposition of AlF 3 Thin Films Using Halide Precursors

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