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Sub- 50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-11, Vol.26 (6), p.2064-2068

2008

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Nanodevice fabrication technologies with advanced high resolution electron beam lithography systems

Nanoindustry Russia, 2015 (3), p.70-75

2015

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Development of a new sample chamber for proton microprobe analysis of mineral samples

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1998-08, Vol.142 (4), p.599-605

1998

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Quantitative trace element analyses of silicate reference materials and a stainless steel using the proton microprobe

Chemical geology, 1999-08, Vol.160 (3), p.241-250

1999

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Nanometer scale marker for fluorescent microscopy

Review of scientific instruments, 2005-07, Vol.76 (7), p.073701-073701-4

2005

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Sub-50nm resolution surface electron emission lithography using nano-Si ballistic electron emitter

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-11, Vol.26 (6), p.2064-2068

2008

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Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography

Japanese Journal of Applied Physics, 2000-12, Vol.39 (12S), p.7070

2000

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Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-11, Vol.26 (6), p.2611-2618

2008

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Diamond mold for nanoimprint lithography

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387), 2000, p.190-191

2000

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7.5: Massive parallel Electron Beam lithography based on a planar type Si nanowire array ballistic electron source with large surface

International Vacuum Nanoelectronics Conference, 2010, p.111-112

2010

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An analysis of SEM techniques used to profile chemical etching on the semiconductor Hg1-xCdxTe

Micron (Oxford, England : 1993), 1994-01, Vol.25 (6), p.511-517

1994

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An analysis of SEM techniques used to profile chemical etching on the semiconductor Hg 1-xCd xTe

Micron (Oxford, England : 1993), 1994, Vol.25 (6), p.511-517

1994

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Biopolymers from Marine Invertebrates. XIII. Characterization of an Antibacterial Protein, Dolabellanin A, from the Albumen Gland of the Sea Hare, Dolabella auricularia

Chemical and Pharmaceutical Bulletin, 1992/06/25, Vol.40(6), pp.1537-1539

1992

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Sub- 50 nm resolution surface electron emission lithography using nano-Si ballistic electron emitter

Nanodevice fabrication technologies with advanced high resolution electron beam lithography systems

Development of a new sample chamber for proton microprobe analysis of mineral samples

Quantitative trace element analyses of silicate reference materials and a stainless steel using the proton microprobe

Nanometer scale marker for fluorescent microscopy

Sub-50nm resolution surface electron emission lithography using nano-Si ballistic electron emitter

Preparation of Diamond Mold Using Electron Beam Lithography for Application to Nanoimprint Lithography

Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media

Diamond mold for nanoimprint lithography

7.5: Massive parallel Electron Beam lithography based on a planar type Si nanowire array ballistic electron source with large surface

An analysis of SEM techniques used to profile chemical etching on the semiconductor Hg1-xCdxTe

An analysis of SEM techniques used to profile chemical etching on the semiconductor Hg 1-xCd xTe

Biopolymers from Marine Invertebrates. XIII. Characterization of an Antibacterial Protein, Dolabellanin A, from the Albumen Gland of the Sea Hare, Dolabella auricularia

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