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Reactive oxygen species (ROS) assay-based photosafety screening for complex ingredients: Modification of the ROS assay protocol

The Journal of Toxicological Sciences, 2022, Vol.47(11), pp.483-492

2022

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Phototoxic Risk Assessments on Benzophenone Derivatives: Photobiochemical Assessments and Dermal Cassette-Dosing Pharmacokinetic Study

The Journal of pharmacology and experimental therapeutics, 2015-08, Vol.354 (2), p.195-202

2015

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Development of fluorometric reactive oxygen species assay for photosafety evaluation

Toxicology in vitro, 2016-08, Vol.34, p.113-119

2016

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Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

Journal of applied physics, 2010-02, Vol.107 (4), p.043302-043302-6

2010

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SiN etching characteristics of Ar/CH3F/O2 plasma and dependence on SiN film density

Japanese Journal of Applied Physics, 2016-07, Vol.55 (8)

2016

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Enzymatic reactive oxygen species assay to evaluate phototoxic risk of metabolites

Toxicology letters, 2017-08, Vol.278, p.59-65

2017

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Characterization of CO2 plasma ashing for less low-dielectric-constant film damage

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-11, Vol.33 (6)

2015

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Mechanisms of silicon damage during N2/H2 organic etching for fin field-effect-transistor CMOS

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-09, Vol.33 (5)

2015

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New Photosafety Assessment Strategy Based on the Photochemical and Pharmacokinetic Properties of Both Parent Chemicals and Metabolites

Drug metabolism and disposition, 2015-11, Vol.43 (11), p.1815-1822

2015

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Photochemical Mechanism of Riboflavin-Induced Degradation of Famotidine and a Suggested Pharmaceutical Strategy for Improving Photostability

Journal of pharmaceutical sciences, 2016-02, Vol.105 (2), p.741-746

2016

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Comparative study on prediction performance of photosafety testing tools on photoallergens

Toxicology in vitro, 2016-06, Vol.33, p.147-152

2016

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Highly selective and precisely controlled aluminum etching by Ar/HBr/CH3F/O2 gas chemistry

Japanese Journal of Applied Physics, 2014-03, Vol.53 (3S2)

2014

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Prediction of etching-shape anomaly due to distortion of ion sheath around a large-scale three-dimensional structure by means of on-wafer monitoring technique and computer simulation

Journal of physics. D, Applied physics, 2013-10, Vol.46 (41), p.415203-1-7

2013

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Photosafety testing of dermally-applied chemicals based on photochemical and cassette-dosing pharmacokinetic data

Asian journal of pharmceutical sciences, 2016-02, Vol.11 (1), p.237-238

2016

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Environmentally harmonized CF3I plasma for low-damage and highly selective low-k etching

Journal of applied physics, 2008-03, Vol.103 (5)

2008

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Isotropic atomic layer etchings of various materials by using dry chemical removal

Japanese Journal of Applied Physics, 2023-06, Vol.62 (SG), p.SG0801

2023

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Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet

Solid state phenomena, 2012-01, Vol.187, p.145-148

2012

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Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential

Japanese Journal of Applied Physics, 2011-03, Vol.50 (3R), p.36204

2011

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Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential

Japanese Journal of Applied Physics, 2011-03, Vol.50 (3), p.036204-036204-5

2011

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Phototoxic risk assessment of dermally-applied chemicals with structural variety based on photoreactivity and skin deposition

Regulatory toxicology and pharmacology, 2020-06, Vol.113, p.104619, Article 104619

2020

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Novel Particle-Reduction System in Plasma-Enhanced Chemical Vapor Deposition Process of Interlayer Dielectrics

Japanese Journal of Applied Physics, 2010-04, Vol.49 (4), p.04DB13-04DB13-4

2010

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200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-09, Vol.28 (5), p.1169-1174

2010

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Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System

Japanese Journal of Applied Physics, 2010-04, Vol.49 (4), p.04DB14-04DB14-5

2010

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Photochemically stabilized formulation of dacarbazine with reduced production of algogenic photodegradants

International journal of pharmaceutics, 2019-06, Vol.564, p.492-498

2019

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Etching selectivity of SiO 2 to SiN using HF and methanol at higher pressure up to 900 Pa

Japanese Journal of Applied Physics, 2024-04

2024

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Reactive oxygen species (ROS) assay-based photosafety screening for complex ingredients: Modification of the ROS assay protocol

Phototoxic Risk Assessments on Benzophenone Derivatives: Photobiochemical Assessments and Dermal Cassette-Dosing Pharmacokinetic Study

Development of fluorometric reactive oxygen species assay for photosafety evaluation

Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique

SiN etching characteristics of Ar/CH3F/O2 plasma and dependence on SiN film density

Enzymatic reactive oxygen species assay to evaluate phototoxic risk of metabolites

Characterization of CO2 plasma ashing for less low-dielectric-constant film damage

Mechanisms of silicon damage during N2/H2 organic etching for fin field-effect-transistor CMOS

New Photosafety Assessment Strategy Based on the Photochemical and Pharmacokinetic Properties of Both Parent Chemicals and Metabolites

Photochemical Mechanism of Riboflavin-Induced Degradation of Famotidine and a Suggested Pharmaceutical Strategy for Improving Photostability

Comparative study on prediction performance of photosafety testing tools on photoallergens

Highly selective and precisely controlled aluminum etching by Ar/HBr/CH3F/O2 gas chemistry

Prediction of etching-shape anomaly due to distortion of ion sheath around a large-scale three-dimensional structure by means of on-wafer monitoring technique and computer simulation

Photosafety testing of dermally-applied chemicals based on photochemical and cassette-dosing pharmacokinetic data

Environmentally harmonized CF3I plasma for low-damage and highly selective low-k etching

Isotropic atomic layer etchings of various materials by using dry chemical removal

Thermomechanical Resist Removal-Cleaning System Using Cryogenic Micro-Slush Jet

Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential

Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential

Phototoxic risk assessment of dermally-applied chemicals with structural variety based on photoreactivity and skin deposition

Novel Particle-Reduction System in Plasma-Enhanced Chemical Vapor Deposition Process of Interlayer Dielectrics

200-mm-diameter neutral beam source based on inductively coupled plasma etcher and silicon etching

Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System

Photochemically stabilized formulation of dacarbazine with reduced production of algogenic photodegradants

Etching selectivity of SiO 2 to SiN using HF and methanol at higher pressure up to 900 Pa

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