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Comparison of the Active Species in the RF and Microwave Flowing Discharges of N2 and Ar–20 %N2

Plasma chemistry and plasma processing, 2016-11, Vol.36 (6), p.1559-1570

2016

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Consideration of the electron energy distribution function shape in a Ar and N2 global model

Journal of applied physics, 2012-11, Vol.112 (10)

2012

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Modeling and experimental study of molecular nitrogen dissociation in an Ar–N2 ICP discharge

Plasma sources science & technology, 2011-08, Vol.20 (4), p.045015

2011

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Quantitative evaluation of the densities of active species of N2 in the afterglow of Ar-embedded N2 RF plasma

Current Applied Physics, 2015, 15(11), , pp.1453-1462

2015

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A passive mitigation strategy of impurity deposition on the first mirrors using duct with baffles: A case study at a port of KSTAR with in-situ deposition monitoring

Fusion engineering and design, 2018-04, Vol.129, p.269-276

2018

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Determination of the electron temperature in a planar inductive argon plasma with emission spectroscopy and electrostatic probe

Journal of physics. D, Applied physics, 2008-08, Vol.41 (15), p.155203-155203 (6)

2008

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Design of combined system of helium charge exchange spectroscopy and hydrogen beam emission spectroscopy in VEST

Fusion engineering and design, 2017-11, Vol.123, p.975-978

2017

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Suppression of Ag deposition by Ar gas in mtorr range and its implication to mitigation of impurity deposition on first mirrors

Current Applied Physics, 2015, 15(12), , pp.1615-1619

2015

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A Micromachined Flexible Hollow Cathode Discharge Device

Japanese Journal of Applied Physics, 2009-06, Vol.48 (6S), p.6

2009

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Line-ratio determination of atomic oxygen and ${\rm N}_2(A\,{}^3\Sigma_{\rm u}^+)$ metastable absolute densities in an RF nitrogen late afterglow

Plasma sources science & technology, 2013-05, Vol.22 (3), p.35009

2013

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Modeling and experimental study of pulse modulated ICP discharge: production of Ar highly excited states

Plasma sources science & technology, 2011-06, Vol.20 (3), p.035002

2011

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Experimental evaluation of the gas-phase collision cross-section of effusive Au beam with noble gases: The effect of size and flux

Current Applied Physics, 2014, 14(4), , pp.543-546

2014

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Kinetics of Metastable Argon Atoms in an Ar-N2 RF ICP Discharge

Journal of the Korean Physical Society, 2011-04, Vol.58 (4), p.776-781

2011

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Velocity distribution function of sputtered Cu atoms obtained by time resolved optical absorption spectroscopy

Review of scientific instruments, 2010-01, Vol.81 (1), p.013102-013102-5

2010

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Effects of metal buffer layers on the hot filament chemical vapor deposition of nanostructured carbon films

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-01, Vol.21 (1), p.623-626

2003

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Development of two-grating spectrometer for the charge exchange spectroscopy system on KSTAR

Review of scientific instruments, 2011-06, Vol.82 (6), p.063510-063510-5

2011

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Experimental study of Ar and Ar–N2 afterglow in a pulse-modulated ICP discharge: observation of highly excited Ar(6d) afterpeak emission

Journal of physics. D, Applied physics, 2009, Vol.42 (11), p.112001-112001 (5)

2009

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Optical properties of Au nanocluster embedded dielectric films

Thin solid films, 2000-12, Vol.377, p.97-102

2000

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Determination of Absolute Nitrogen Atom Density in Ar-N2 ICP Discharge

Journal of the Korean Physical Society, 2011-11, Vol.59 (5), p.3031-3036

2011

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Time-resolved optical emission spectroscopy of pulsed RF plasmas with copper magnetron sputtering

Thin solid films, 2008-04, Vol.516 (11), p.3460-3463

2008

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Real-time ellipsometry studies of gold thin-film growth

Japanese Journal of Applied Physics, 1997-06, Vol.36 (6A), p.3662-3668

1997

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In situ ellipsometry studies of ZnS thin film growth

Japanese Journal of Applied Physics, 1997-08, Vol.36 (8), p.5346-5350

1997

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Spectro-ellipsometric studies of amorphization and thermal annealing in ion-implanted silicon

Japanese Journal of Applied Physics, 1996-12, Vol.35 (12A), p.5929-5936

1996

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Spatially resolved optical emission studies of pulsed D.C. plasmas for TiN deposition by unbalanced magnetron sputtering

Thin solid films, 2005-03, Vol.475 (1-2), p.6-11

2005

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Wide wavelength-range optical studies of hydrogenated amorphous carbon films: from 700 nm to 10 μm

Applied surface science, 2001-01, Vol.169, p.217-222

2001

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Comparison of the Active Species in the RF and Microwave Flowing Discharges of N2 and Ar–20 %N2

Consideration of the electron energy distribution function shape in a Ar and N2 global model

Modeling and experimental study of molecular nitrogen dissociation in an Ar–N2 ICP discharge

Quantitative evaluation of the densities of active species of N2 in the afterglow of Ar-embedded N2 RF plasma

A passive mitigation strategy of impurity deposition on the first mirrors using duct with baffles: A case study at a port of KSTAR with in-situ deposition monitoring

Determination of the electron temperature in a planar inductive argon plasma with emission spectroscopy and electrostatic probe

Design of combined system of helium charge exchange spectroscopy and hydrogen beam emission spectroscopy in VEST

Suppression of Ag deposition by Ar gas in mtorr range and its implication to mitigation of impurity deposition on first mirrors

A Micromachined Flexible Hollow Cathode Discharge Device

Line-ratio determination of atomic oxygen and ${\rm N}_2(A\,{}^3\Sigma_{\rm u}^+)$ metastable absolute densities in an RF nitrogen late afterglow

Modeling and experimental study of pulse modulated ICP discharge: production of Ar highly excited states

Experimental evaluation of the gas-phase collision cross-section of effusive Au beam with noble gases: The effect of size and flux

Kinetics of Metastable Argon Atoms in an Ar-N2 RF ICP Discharge

Velocity distribution function of sputtered Cu atoms obtained by time resolved optical absorption spectroscopy

Effects of metal buffer layers on the hot filament chemical vapor deposition of nanostructured carbon films

Development of two-grating spectrometer for the charge exchange spectroscopy system on KSTAR

Experimental study of Ar and Ar–N2 afterglow in a pulse-modulated ICP discharge: observation of highly excited Ar(6d) afterpeak emission

Optical properties of Au nanocluster embedded dielectric films

Determination of Absolute Nitrogen Atom Density in Ar-N2 ICP Discharge

Time-resolved optical emission spectroscopy of pulsed RF plasmas with copper magnetron sputtering

Real-time ellipsometry studies of gold thin-film growth

In situ ellipsometry studies of ZnS thin film growth

Spectro-ellipsometric studies of amorphization and thermal annealing in ion-implanted silicon

Spatially resolved optical emission studies of pulsed D.C. plasmas for TiN deposition by unbalanced magnetron sputtering

Wide wavelength-range optical studies of hydrogenated amorphous carbon films: from 700 nm to 10 μm

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