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Thick titanium dioxide films for semiconductor photocatalysis

Journal of photochemistry and photobiology. A, Chemistry., 2003-08, Vol.160 (3), p.185-194

2003

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Tungsten Oxide Coatings from the Aerosol-Assisted Chemical Vapor Deposition of W(OAr)6 (Ar = C6H5, C6H4F-4, C6H3F2-3,4); Photocatalytically Active γ-WO3 Films

Chemistry of materials, 2003-07, Vol.15 (14), p.2786-2796

2003

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Synthesis of Titanium(IV) Guanidinate Complexes and the Formation of Titanium Carbonitride via Low-Pressure Chemical Vapor Deposition

Inorganic chemistry, 2005-02, Vol.44 (3), p.615-619

2005

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Anatase Thin Films on Glass from the Chemical Vapor Deposition of Titanium(IV) Chloride and Ethyl Acetate

Chemistry of materials, 2003-01, Vol.15 (1), p.46-50

2003

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Spectral and photocatalytic characteristics of TiO2 CVD films on quartz

Photochemical & photobiological sciences, 2002-11, Vol.1 (11), p.865-868

2002

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Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

Chemistry of materials, 2004-03, Vol.16 (6), p.1120-1125

2004

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Tin phosphide coatings from the atmospheric pressure chemical vapour deposition of SnX4 (X=Cl or Br) and PRxH3−x (R=Cychex or phenyl)

Polyhedron, 2002-08, Vol.21 (19), p.1943-1947

2002

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Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

Journal of materials chemistry, 2003-01, Vol.13 (1), p.56-60

2003

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Quantification and Evaluation of the Role of Antielastin Autoantibodies in the Emphysematous Lung

Pulmonary Medicine, 2011-01, Vol.2011 (2011), p.262-267

2011

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Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

Journal of materials chemistry, 2003-01, Vol.13 (12), p.2952

2003

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Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Applied surface science, 2003-04, Vol.211 (1), p.2-5

2003

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Novel TiO2 CVD films for semiconductor photocatalysis

Journal of photochemistry and photobiology. A, Chemistry., 2002-08, Vol.151 (1-3), p.171-179

2002

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Atmospheric-pressure CVD of vanadium phosphide thin films from reaction of tetrakisdimethylamidovanadium and cyclohexylphosphine

Chemical vapor deposition, 2004-10, Vol.10 (5), p.253-255

2004

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Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]

Journal of materials chemistry, 2004, Vol.14 (5), p.830-834

2004

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The dual source APCVD of titanium nitride thin films from reaction of hexamethyldisilazane and titanium tetrachloride

Journal of materials chemistry, 2002-05, Vol.12 (6), p.1906-1909

2002

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Dual-Source Atmospheric Pressure CVD of Amorphous Molybdenum Phosphide Films on Glass Using Molybdenum(V) Chloride and Cyclohexylphosphine

Chemical vapor deposition, 2003-01, Vol.9 (1), p.10-13

2003

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Dual source APCVD synthesis of TaN and NbN thin films on glass from the reaction of MCl5 (M = Ta, Nb) and 1,1,1,3,3,3-hexamethyldisilazane

Journal of materials chemistry, 2004-01, Vol.14 (22), p.3333-3336

2004

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Titania and tungsten doped titania thin films on glass; active photocatalysts

Polyhedron, 2003, Vol.22 (1), p.35-44

2003

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Inhibition of Toll-Like Receptor 2-Mediated Interleukin-8 Production in Cystic Fibrosis Airway Epithelial Cells via the α7-Nicotinic Acetylcholine Receptor

Mediators of inflammation, 2010, Vol.2010 (2010), p.1-8

2010

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Molecular precursors for the CVD of niobium and tantalum nitride

Polyhedron, 2005-02, Vol.24 (3), p.463-468

2005

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Formation of VN from VCl4 and NH(SiMe3)2 by APCVD − a Potential Solar Control Coating

European journal of inorganic chemistry, 2004-11, Vol.2004 (21), p.4286-4290

2004

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Tungsten Oxide Coatings from the Aerosol-Assisted Chemical Vapor Deposition of W(OAr) 6 (Ar = C 6 H 5 , C 6 H 4 F-4, C 6 H 3 F 2 -3,4); Photocatalytically Active γ-WO 3 Films

Chemistry of materials, 2003-07, Vol.15 (14), p.2786-2796

2003

Volltextzugriff (PDF)

Tin phosphide coatings from the atmospheric pressure chemical vapour deposition of SnX 4 (X=Cl or Br) and PR xH 3− x (R=Cyc hex or phenyl)

Polyhedron, 2002, Vol.21 (19), p.1943-1947

2002

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Atmospheric pressure chemical vapour deposition of thin films of Nb2Os on glass

Journal of materials chemistry, 2003, Vol.13 (12), p.2952-2956

2003

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Formation of VN from VCl 4 and NH(SiMe 3 ) 2 by APCVD − a Potential Solar Control Coating

European journal of inorganic chemistry, 2004-11, Vol.2004 (21), p.4286-4290

2004

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Thick titanium dioxide films for semiconductor photocatalysis

Tungsten Oxide Coatings from the Aerosol-Assisted Chemical Vapor Deposition of W(OAr)6 (Ar = C6H5, C6H4F-4, C6H3F2-3,4); Photocatalytically Active γ-WO3 Films

Synthesis of Titanium(IV) Guanidinate Complexes and the Formation of Titanium Carbonitride via Low-Pressure Chemical Vapor Deposition

Anatase Thin Films on Glass from the Chemical Vapor Deposition of Titanium(IV) Chloride and Ethyl Acetate

Spectral and photocatalytic characteristics of TiO2 CVD films on quartz

Atmospheric-Pressure Chemical Vapor Deposition of Group IVb Metal Phosphide Thin Films from Tetrakisdimethylamidometal Complexes and Cyclohexylphosphine

Tin phosphide coatings from the atmospheric pressure chemical vapour deposition of SnX4 (X=Cl or Br) and PRxH3−x (R=Cychex or phenyl)

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

Quantification and Evaluation of the Role of Antielastin Autoantibodies in the Emphysematous Lung

Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Novel TiO2 CVD films for semiconductor photocatalysis

Atmospheric-pressure CVD of vanadium phosphide thin films from reaction of tetrakisdimethylamidovanadium and cyclohexylphosphine

Titanium sulfide thin films from the aerosol-assisted chemical vapour deposition of [Ti(SBut)4]

The dual source APCVD of titanium nitride thin films from reaction of hexamethyldisilazane and titanium tetrachloride

Dual-Source Atmospheric Pressure CVD of Amorphous Molybdenum Phosphide Films on Glass Using Molybdenum(V) Chloride and Cyclohexylphosphine

Dual source APCVD synthesis of TaN and NbN thin films on glass from the reaction of MCl5 (M = Ta, Nb) and 1,1,1,3,3,3-hexamethyldisilazane

Titania and tungsten doped titania thin films on glass; active photocatalysts

Inhibition of Toll-Like Receptor 2-Mediated Interleukin-8 Production in Cystic Fibrosis Airway Epithelial Cells via the α7-Nicotinic Acetylcholine Receptor

Molecular precursors for the CVD of niobium and tantalum nitride

Formation of VN from VCl4 and NH(SiMe3)2 by APCVD − a Potential Solar Control Coating

Tungsten Oxide Coatings from the Aerosol-Assisted Chemical Vapor Deposition of W(OAr) 6 (Ar = C 6 H 5 , C 6 H 4 F-4, C 6 H 3 F 2 -3,4); Photocatalytically Active γ-WO 3 Films

Tin phosphide coatings from the atmospheric pressure chemical vapour deposition of SnX 4 (X=Cl or Br) and PR xH 3− x (R=Cyc hex or phenyl)

Atmospheric pressure chemical vapour deposition of thin films of Nb2Os on glass

Formation of VN from VCl 4 and NH(SiMe 3 ) 2 by APCVD − a Potential Solar Control Coating

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