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Postnatal maternal mental health and postnatal attachment

Rural and remote health, 2023-01, Vol.23 (1), p.8126-8126

2023

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Innovative remote plasma source for atomic layer deposition for GaN devices

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2021-12, Vol.39 (6)

2021

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Pilot production & commercialization of LAPPD

Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2015-07, Vol.787 (C), p.78-84

2015

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Atomic layer deposition of alternative glass microchannel plates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Advanced materials technologies, 2021-11, Vol.6 (11), p.n/a

2021

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Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer

Advanced materials technologies, 2021-11, Vol.6 (11)

2021

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Atomic layer deposition of alternative glass microchannel plates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Nucleation and Chemical Transformation of RuO2 Films Grown on (100) Si Substrates by Atomic Layer Deposition

Chemical vapor deposition, 2011-06, Vol.17 (4-6), p.114-122

2011

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(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

ECS transactions, 2013, Vol.58 (10), p.249-261

2013

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In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy

ECS transactions, 2009, Vol.16 (4), p.349-354

2009

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Nucleation and Chemical Transformation of RuO 2 Films Grown on (100) Si Substrates by Atomic Layer Deposition

Chemical vapor deposition, 2011-06, Vol.17 (4-6), p.114-122

2011

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Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al 2 O 3 Deposited by Atomic Layer Deposition and Incorporated at the High-k/III-V Interface of MO 2 /In x Ga 1-x As (M = Hf|Zr, x = 0|0.53) Gate Stacks

ECS transactions, 2010-10, Vol.33 (2), p.69-82

2010

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(Invited) Equivalent Oxide Thickness Correction in the High-k/In 0.53 Ga 0.47 As/InP System

ECS transactions, 2010-10, Vol.33 (3), p.433-444

2010

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Structural and Electrical Properties of HfO2/n-In x Ga 1-x As structures (x: 0, 0.15, 0.3 and 0.53)

ECS transactions, 2009-09, Vol.25 (6), p.113-127

2009

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Real Time In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy

Meeting abstracts (Electrochemical Society), 2008-08, Vol.MA2008-02 (24), p.1911-1911

2008

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Atomic Layer Deposition of Magnesium Oxide on GaAs

Meeting abstracts (Electrochemical Society), 2009-07, Vol.MA2009-02 (34), p.2520-2520

2009

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Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared By Atomic Layer Deposition

Meeting abstracts (Electrochemical Society), 2013-10, Vol.MA2013-02 (24), p.1858-1858

2013

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Atomic Layer Deposition of Metal and Metal Oxide Nanostructures

Meeting abstracts (Electrochemical Society), 2008-08, Vol.MA2008-02 (24), p.1910-1910

2008

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Fixed Charge, Interface States and Equivalent Oxide Thickness Correction in the High-k/In 0.53 Ga 0.47 As System

Meeting abstracts (Electrochemical Society), 2010-07, Vol.MA2010-02 (22), p.1525-1525

2010

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Structural and Electrical Analysis of Thin Interface Control Layer Effects of MgO or Al 2 O 3 Deposited by Atomic Layer Deposition, Incorporated at the High-k/IIIV Interface of MO 2 /In x Ga 1-x As (M = Hf|Zr, x = 0|0.53) Gate in Metal-Oxide-Semiconductor Capacitors

Meeting abstracts (Electrochemical Society), 2010-07, Vol.MA2010-02 (20), p.1413-1413

2010

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Capacitance-Voltage and Conductance Analysis of High-k/In x Ga 1-x As Structures (x = 0, 0.15, 0.3, and 0.53)

Meeting abstracts (Electrochemical Society), 2009-07, Vol.MA2009-02 (25), p.2115-2115

2009

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Functional genome analysis of Bifidobacterium breve UCC2003 reveals type IVb tight adherence (Tad) pili as an essential and conserved host-colonization factor

Proceedings of the National Academy of Sciences - PNAS, 2011-07, Vol.108 (27), p.11217-11222

2011

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Enhancing Men's Awareness of Testicular Diseases (E-MAT) using virtual reality: A randomised pilot feasibility study and mixed method process evaluation

PloS one, 2024-07, Vol.19 (7), p.e0307426

2024

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Targeting the EP1 receptor reduces Fas ligand expression and increases the antitumor immune response in an in vivo model of colon cancer

International journal of cancer, 2013-08, Vol.133 (4), p.825-834

2013

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Development of a risk assessment profile tool to determine appropriate use of SARS-CoV-2 rapid antigen detection tests for different activities and events in Ireland, since October 2021

Euro surveillance : bulletin européen sur les maladies transmissibles, 2022-01, Vol.27 (3), p.1

2022

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Postnatal maternal mental health and postnatal attachment

Innovative remote plasma source for atomic layer deposition for GaN devices

Pilot production & commercialization of LAPPD

Atomic layer deposition of alternative glass microchannel plates

Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer

Atomic layer deposition of alternative glass microchannel plates

Nucleation and Chemical Transformation of RuO2 Films Grown on (100) Si Substrates by Atomic Layer Deposition

(Invited) Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared by Atomic Layer Deposition

In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy

Nucleation and Chemical Transformation of RuO 2 Films Grown on (100) Si Substrates by Atomic Layer Deposition

Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al 2 O 3 Deposited by Atomic Layer Deposition and Incorporated at the High-k/III-V Interface of MO 2 /In x Ga 1-x As (M = Hf|Zr, x = 0|0.53) Gate Stacks

(Invited) Equivalent Oxide Thickness Correction in the High-k/In 0.53 Ga 0.47 As/InP System

Structural and Electrical Properties of HfO2/n-In x Ga 1-x As structures (x: 0, 0.15, 0.3 and 0.53)

Real Time In-Situ Probing of Atomic Layer Deposition Processes using Infrared and Near Infrared Spectroscopy

Atomic Layer Deposition of Magnesium Oxide on GaAs

Synthesis, Characterization, and Application of Tunable Resistance Coatings Prepared By Atomic Layer Deposition

Atomic Layer Deposition of Metal and Metal Oxide Nanostructures

Fixed Charge, Interface States and Equivalent Oxide Thickness Correction in the High-k/In 0.53 Ga 0.47 As System

Structural and Electrical Analysis of Thin Interface Control Layer Effects of MgO or Al 2 O 3 Deposited by Atomic Layer Deposition, Incorporated at the High-k/IIIV Interface of MO 2 /In x Ga 1-x As (M = Hf|Zr, x = 0|0.53) Gate in Metal-Oxide-Semiconductor Capacitors

Capacitance-Voltage and Conductance Analysis of High-k/In x Ga 1-x As Structures (x = 0, 0.15, 0.3, and 0.53)

Functional genome analysis of Bifidobacterium breve UCC2003 reveals type IVb tight adherence (Tad) pili as an essential and conserved host-colonization factor

Enhancing Men's Awareness of Testicular Diseases (E-MAT) using virtual reality: A randomised pilot feasibility study and mixed method process evaluation

Targeting the EP1 receptor reduces Fas ligand expression and increases the antitumor immune response in an in vivo model of colon cancer

Development of a risk assessment profile tool to determine appropriate use of SARS-CoV-2 rapid antigen detection tests for different activities and events in Ireland, since October 2021

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