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Real space soft x-ray imaging at 10 nm spatial resolution

Optics express, 2012-04, Vol.20 (9), p.9777-9783

2012

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Determination of effective attenuation length of slow electrons in polymer films

Journal of applied physics, 2020-06, Vol.127 (24)

2020

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Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning

Advanced materials (Weinheim), 2015-10, Vol.27 (38), p.5813-5819

2015

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Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

Journal of physics. D, Applied physics, 2021-11, Vol.54 (46), p.464002

2021

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Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2017-11, Vol.35 (6)

2017

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Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography

Applied Optics, 2009-06, Vol.48 (18), p.3302

Naulleau, Patrick P.

2009

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Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization

Applied Optics, 2003-06, Vol.42 (17), p.3390

2003

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Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests

Applied Optics, 2004-07, Vol.43 (20), p.4025

Naulleau, Patrick P.

2004

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Quantitative phase retrieval with arbitrary pupil and illumination

Optics express, 2015-10, Vol.23 (20), p.26672-26682

2015

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Microscopy of extreme ultraviolet lithography masks with 132 nm tabletop laser illumination

Optics letters, 2009-02, Vol.34 (3), p.271

2009

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Extreme ultraviolet microscope characterization using photomask surface roughness

Scientific reports, 2020-07, Vol.10 (1), p.11673-11673, Article 11673

2020

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Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Applied Optics, 2003-02, Vol.42 (5), p.820

2003

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Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model

Journal of Micro/Nanopatterning, Materials, and Metrology, 2021-07, Vol.20 (3)

2021

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Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source

Journal of synchrotron radiation, 2014-11, Vol.21 (6), p.1370-1377

2014

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Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2010-11, Vol.28 (6), p.1259-1266

2010

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EUV Extendibility: Challenges Facing EUV at 1x and beyond

Journal of Photopolymer Science and Technology, 2013/12/28, Vol.26(6), pp.697-704

2013

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Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography

Applied Optics, 2005-01, Vol.44 (2), p.183

Naulleau, Patrick P.

2005

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Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist

Applied Optics, 2004-02, Vol.43 (4), p.788

Naulleau, Patrick P.

2004

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Determination of effective attenuation length of slow electrons in polymer films

Journal of applied physics, 2020-06, Vol.127 (24)

2020

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Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Applied Optics, 1999-12, Vol.38 (35), p.7252

1999

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Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

Applied Optics, 2011-07, Vol.50 (19), p.3346

2011

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Optical modeling of Fresnel zoneplate microscopes

Applied Optics, 2011-07, Vol.50 (20), p.3678

2011

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Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging

Applied Optics, 2017-04, Vol.56 (12), p.3325

2017

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Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-11, Vol.22 (6), p.2962-2965

2004

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Molybdenum/silicon multilayer components for high harmonic generation sources

Applied Optics, 2015-05, Vol.54 (13), p.4280

2015

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Real space soft x-ray imaging at 10 nm spatial resolution

Determination of effective attenuation length of slow electrons in polymer films

Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning

Near total reflection x-ray photoelectron spectroscopy: quantifying chemistry at solid/liquid and solid/solid interfaces

Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography

Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization

Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests

Quantitative phase retrieval with arbitrary pupil and illumination

Microscopy of extreme ultraviolet lithography masks with 132 nm tabletop laser illumination

Extreme ultraviolet microscope characterization using photomask surface roughness

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model

Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source

Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer

EUV Extendibility: Challenges Facing EUV at 1x and beyond

Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography

Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist

Determination of effective attenuation length of slow electrons in polymer films

Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

Optical modeling of Fresnel zoneplate microscopes

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Molybdenum/silicon multilayer components for high harmonic generation sources

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