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Control of silica cap properties by oxygen plasma treatment for single-cap selective impurity free vacancy disordering

Applied physics letters, 1999-02, Vol.74 (5), p.732-734

1999

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Modified AlAs epitaxial layers for use as pattern transfer masks

Microelectronic engineering, 1999, Vol.46 (1), p.327-330

1999

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New chemistry for selective reactive ion etching of InGaAs and InP over InAlAs in SiCl4/SiF4/HBr plasmas

Applied physics letters, 1995-10, Vol.67 (18), p.2660-2662

1995

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Anisotropic pattern transfer of fine resist features to silicon nitride via an intermediate titanium layer

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.99-102

1997

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Fabrication and photoluminescence of GaN/sapphire submicron-scale structures with nanometre scale resolution

Materials science & engineering. B, Solid-state materials for advanced technology, 1999-05, Vol.59 (1), p.335-339

1999

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Two-dimensional waveguide based photonic microstructures in GaAs and InP

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.29-32, Article 29

1997

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Improving the resistance of PECVD silicon nitride to dry etching using an oxygen plasma

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.41-44

1997

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Functional outcome of spaghetti wrist following surgery- our experience in 26 patients

International Journal of Orthopaedics Sciences, 2024-01, Vol.10 (1S), p.11-15

2024

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Nanometre Scale Reactive Ion Etching of GaN Epilayers

Materials science forum, 1998-01, Vol.264-268, p.1403-1406

1998

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Method of dry-etching evaluation using quantum dots

Microelectronic engineering, 1997-02, Vol.35 (1-4), p.91-94

1997

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Damage free and selective RIE of GaAs/AlGaAs in SiCl4/SiF4 plasma for MESFET and pseudomorphic HEMT's gate recess etching

Microelectronic engineering, 1995-02, Vol.27 (1-4), p.439-444

1995

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Effect of Verapamil Adjuvant with Local Anaesthetic Mixtures in Supraclavicular Brachial Plexus Block

Bangladesh medical journal, 2019-02, Vol.46 (2), p.43-47

2019

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Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-01, Vol.16 (1), p.54-58

1998

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A surface-potential based model for GaN HEMTs in RF power amplifier applications

2010 International Electron Devices Meeting, 2010, p.8.3.1-8.3.4

2010

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Selective reactive ion etching of InGaAs and InP over InAlAs in SiCl4/SiF4/HBr plasmas

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1995-11, Vol.13 (6), p.2344-2349

1995

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Very low damage etching of GaAs

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1993-11, Vol.11 (6), p.2237-2243

1993

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Artificial dielectric optical structures: A challenge for nanofabrication

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-11, Vol.16 (6), p.3903-3905

1998

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Small signal and pulse characteristics of AlN/GaN MOS-HEMTs

2011 6th European Microwave Integrated Circuit Conference, 2011, p.340-343

2011

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Can dry-etching systems be designed for low damage ab initio ?

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-11, Vol.16 (6), p.3334-3338

1998

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Selective and nonselective RIE of GaAs and AlxGa1−xAs in SiCl4 plasma

Microelectronic engineering, 1994-01, Vol.23 (1-4), p.357-360

1994

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Molecular simulation of osmosis, reverse osmosis, and electro-osmosis in aqueous and methanolic electrolyte solutions

Molecular physics, 1998-10, Vol.95 (3), p.401-408

MURAD K. ODER J. LIN, S.

1998

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Effects of O2 addition to SiCl4/SiF4 and the thickness of the capping layer on gate recess etching of GaAs-pseudomorphic high electron mobility transistors

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1996-11, Vol.14 (6), p.3668-3673

1996

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Genetic fingerprinting of palestinian olive (olea europea l.) Cultivars using snp markers

Jordan Journal of Agricultural Sciences : an International Refereed Research Journal., 2009, Vol.5 (3), p.282-294

2009

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Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1999-01, Vol.17 (1), p.113-117

1999

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Imaging for the diagnosis of hepatocellular carcinoma: A systematic review and meta‐analysis

Hepatology (Baltimore, Md.), 2018-01, Vol.67 (1), p.401-421

2018

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Control of silica cap properties by oxygen plasma treatment for single-cap selective impurity free vacancy disordering

Modified AlAs epitaxial layers for use as pattern transfer masks

New chemistry for selective reactive ion etching of InGaAs and InP over InAlAs in SiCl4/SiF4/HBr plasmas

Anisotropic pattern transfer of fine resist features to silicon nitride via an intermediate titanium layer

Fabrication and photoluminescence of GaN/sapphire submicron-scale structures with nanometre scale resolution

Two-dimensional waveguide based photonic microstructures in GaAs and InP

Improving the resistance of PECVD silicon nitride to dry etching using an oxygen plasma

Functional outcome of spaghetti wrist following surgery- our experience in 26 patients

Nanometre Scale Reactive Ion Etching of GaN Epilayers

Method of dry-etching evaluation using quantum dots

Damage free and selective RIE of GaAs/AlGaAs in SiCl4/SiF4 plasma for MESFET and pseudomorphic HEMT's gate recess etching

Effect of Verapamil Adjuvant with Local Anaesthetic Mixtures in Supraclavicular Brachial Plexus Block

Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography

A surface-potential based model for GaN HEMTs in RF power amplifier applications

Selective reactive ion etching of InGaAs and InP over InAlAs in SiCl4/SiF4/HBr plasmas

Very low damage etching of GaAs

Artificial dielectric optical structures: A challenge for nanofabrication

Small signal and pulse characteristics of AlN/GaN MOS-HEMTs

Can dry-etching systems be designed for low damage ab initio ?

Selective and nonselective RIE of GaAs and AlxGa1−xAs in SiCl4 plasma

Molecular simulation of osmosis, reverse osmosis, and electro-osmosis in aqueous and methanolic electrolyte solutions

Effects of O2 addition to SiCl4/SiF4 and the thickness of the capping layer on gate recess etching of GaAs-pseudomorphic high electron mobility transistors

Genetic fingerprinting of palestinian olive (olea europea l.) Cultivars using snp markers

Use of polymethylmethacrylate as an initial pattern transfer layer in fluorine- and chlorine-based reactive-ion etching

Imaging for the diagnosis of hepatocellular carcinoma: A systematic review and meta‐analysis

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