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Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-09, Vol.37 (5)

2019

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Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2022-03, Vol.40 (2)

2022

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Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

Journal of physics. D, Applied physics, 2019-09, Vol.52 (47)

2019

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Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Japanese Journal of Applied Physics, 2017-06, Vol.56 (6S2), p.6

2017

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Hyperthermal molecular beam source using a non-diaphragm-type small shock tube

Review of scientific instruments, 2016-10, Vol.87 (10)

2016

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Molecular Beam Study of the Scattering Behavior of Water Molecules from a Graphite Surface

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2014-07, Vol.118 (26), p.4611-4619

2014

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Incident energy dependence of the scattering dynamics of water molecules on silicon and graphite surfaces: the effect on tangential momentum accommodation

Microfluidics and nanofluidics, 2017-02, Vol.21 (2), p.1-13, Article 15

2017

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A non-diaphragm type small shock tube for application to a molecular beam source

Review of scientific instruments, 2013-07, Vol.84 (7), p.075105-075105

2013

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Atomic layer etching of titanium nitride with surface modification by Cl radicals and rapid thermal annealing

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-05, Vol.40 (3)

2022

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Isotropic atomic layer etchings of various materials by using dry chemical removal

Japanese Journal of Applied Physics, 2023-06, Vol.62 (SG), p.SG0801

2023

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Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-07, Vol.42 (4)

2024

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Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2021-09, Vol.39 (5)

2021

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Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-01, Vol.40 (1)

2022

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Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF 3 /O 2 downstream plasma

Journal of physics. D, Applied physics, 2019-11, Vol.52 (47), p.475106

2019

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Development of High-Energy Molecular Beam Source Using Small Shock Tube

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series B, 2013, Vol.79(798), pp.140-150

2013

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(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

ECS transactions, 2017, Vol.80 (3), p.3-14

2017

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Development of High-Energy Molecular Beam Source Using Small Shock Tube

Nihon Kikai Gakkai rombunshuu. B hen, 2015-03, Vol.79 (798), p.140-150

2015

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Development of Ultra Small Shock Tube for High Energy Molecular Beam Source

AIP conference proceedings, 2009, Vol.1084 (1), p.557-564

2009

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(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

Meeting abstracts (Electrochemical Society), 2017-09, Vol.MA2017-02 (25), p.1084-1084

2017

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J053013 Investigation of water-graphite interaction using molecular beam technique

The Proceedings of Mechanical Engineering Congress, Japan, 2012, Vol.2012, p.J053013-1-J053013-5

2012

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J053033 Scattering Behavior of Water Molecules on Graphite Surface

The Proceedings of Mechanical Engineering Congress, Japan, 2013-09, Vol.2013, p.J053033-1-J053033-5

2013

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0301 Proton transport in hydrogen bond network of confined water

The Proceedings of the Fluids engineering conference, 2010-10, Vol.2010, p.99-100

2010

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MNM-P4-2 Proton transport in hydrogen bond network of confined water

The Proceedings of the Symposium on Micro-Nano Science and Technology, 2010-10, Vol.2010.2, p.87-88

2010

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J053012 Measurements of Time-of-Flight Distributions of Shock-heated Molecular Beams

The Proceedings of Mechanical Engineering Congress, Japan, 2012-09, Vol.2012, p.J053012-1-J053012-5

2012

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J054024 Shape optimization of a molecular beam source using a small shock tube and improvement of its operating frequency

The Proceedings of Mechanical Engineering Congress, Japan, 2011-09, Vol.2011, p.J054024-1-J054024-4

2011

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Self-limiting reactions of ammonium salt in CHF3/O2 downstream plasma for thermal-cyclic atomic layer etching of silicon nitride

Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate

Hyperthermal molecular beam source using a non-diaphragm-type small shock tube

Molecular Beam Study of the Scattering Behavior of Water Molecules from a Graphite Surface

Incident energy dependence of the scattering dynamics of water molecules on silicon and graphite surfaces: the effect on tangential momentum accommodation

A non-diaphragm type small shock tube for application to a molecular beam source

Atomic layer etching of titanium nitride with surface modification by Cl radicals and rapid thermal annealing

Isotropic atomic layer etchings of various materials by using dry chemical removal

Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing

Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF 3 /O 2 downstream plasma

Development of High-Energy Molecular Beam Source Using Small Shock Tube

(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

Development of High-Energy Molecular Beam Source Using Small Shock Tube

Development of Ultra Small Shock Tube for High Energy Molecular Beam Source

(Invited) Thermal Cyclic Atomic-Level Etching of Nitride Films: A Novel Way for Atomic-Scale Nanofabrication

J053013 Investigation of water-graphite interaction using molecular beam technique

J053033 Scattering Behavior of Water Molecules on Graphite Surface

0301 Proton transport in hydrogen bond network of confined water

MNM-P4-2 Proton transport in hydrogen bond network of confined water

J053012 Measurements of Time-of-Flight Distributions of Shock-heated Molecular Beams

J054024 Shape optimization of a molecular beam source using a small shock tube and improvement of its operating frequency

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