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Review Article: Atomic layer deposition of optoelectronic materials

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2019-05, Vol.37 (3)

2019

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Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Advanced materials interfaces, 2021-03, Vol.8 (6), p.n/a

2021

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Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth

Advanced materials interfaces, 2017-09, Vol.4 (18), p.n/a

2017

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MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier

Advanced materials interfaces, 2023-04, Vol.10 (12), p.n/a

2023

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Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

2019

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Conversion of ALD CuO Thin Films into Transparent Conductive p‐Type CuI Thin Films

Advanced materials interfaces, 2023-01, Vol.10 (3), p.n/a

2023

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Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion

ACS omega, 2016-12, Vol.1 (6), p.1296-1306

2016

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Atomic Layer Deposition of Photoconductive Cu2O Thin Films

ACS omega, 2019-06, Vol.4 (6), p.11205-11214

2019

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Atomic Layer Deposition of PbI 2 Thin Films

Chemistry of materials, 2019-02, Vol.31 (3), p.1101-1109

2019

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Chemistry of materials, 2019-08, Vol.31 (15), p.5713-5724

2019

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Atomic Layer Deposition of Rhenium Disulfide

Advanced materials (Weinheim), 2018-06, Vol.30 (24), p.e1703622-n/a

2018

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Atomic Layer Deposition of PbI2 Thin Films

Chemistry of materials, 2019-02, Vol.31 (3), p.1101-1109

2019

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Highly conductive and stable Co 9 S 8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Dalton transactions : an international journal of inorganic chemistry, 2021-10, Vol.50 (38), p.13264-13275

2021

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Low‐Temperature Wafer‐Scale Deposition of Continuous 2D SnS2 Films

Small (Weinheim an der Bergstrasse, Germany), 2018-05, Vol.14 (21), p.e1800547-n/a

2018

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Atomic layer deposition of GdF3 thin films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-03, Vol.40 (2)

2022

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Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

Angewandte Chemie International Edition, 2018-10, Vol.57 (44), p.14538-14542

International ed. in English, 2018

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Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 °C through Control of Plasma Chemistry

Chemistry of materials, 2022-08, Vol.34 (16), p.7280-7292

2022

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Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Dalton transactions : an international journal of inorganic chemistry, 2021-10, Vol.50 (38), p.13264-13275

2021

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Growth Mechanism and Film Properties of Atomic-Layer-Deposited Titanium Oxysulfide

Chemistry of materials, 2022-09, Vol.34 (17), p.7750-7760

2022

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Structural Aspects of MoS x Prepared by Atomic Layer Deposition for Hydrogen Evolution Reaction

ACS catalysis, 2024-07, Vol.14 (13), p.10089-10101

2024

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Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS 2 Thin Films at 150 °C

ACS applied materials & interfaces, 2023-07, Vol.15 (29), p.35565-35579

2023

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Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Chemistry of materials, 2018-05, Vol.30 (10), p.3499-3507

2018

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Atomic Layer Deposition of PbS Thin Films at Low Temperatures

Chemistry of materials, 2020-10, Vol.32 (19), p.8216-8228

2020

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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS 2 and ZrS 2 , for Optoelectronics

Chemistry of materials, 2019-08, Vol.31 (15), p.5713-5724

2019

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Atomic layer deposition of PbCl 2 , PbBr 2 and mixed lead halide (Cl, Br, I) PbX n Y 2− n thin films

Dalton transactions : an international journal of inorganic chemistry, 2022-10, Vol.51 (39), p.15142-15157

2022

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Review Article: Atomic layer deposition of optoelectronic materials

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Atomic Layer Deposition of Crystalline MoS2 Thin Films: New Molybdenum Precursor for Low‐Temperature Film Growth

MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier

Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing

Conversion of ALD CuO Thin Films into Transparent Conductive p‐Type CuI Thin Films

Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion

Atomic Layer Deposition of Photoconductive Cu2O Thin Films

Atomic Layer Deposition of PbI 2 Thin Films

Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics

Atomic Layer Deposition of Rhenium Disulfide

Atomic Layer Deposition of PbI2 Thin Films

Highly conductive and stable Co 9 S 8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Low‐Temperature Wafer‐Scale Deposition of Continuous 2D SnS2 Films

Atomic layer deposition of GdF3 thin films

Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition

Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100 °C through Control of Plasma Chemistry

Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

Growth Mechanism and Film Properties of Atomic-Layer-Deposited Titanium Oxysulfide

Structural Aspects of MoS x Prepared by Atomic Layer Deposition for Hydrogen Evolution Reaction

Toolbox of Advanced Atomic Layer Deposition Processes for Tailoring Large-Area MoS 2 Thin Films at 150 °C

Diamine Adduct of Cobalt(II) Chloride as a Precursor for Atomic Layer Deposition of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films

Atomic Layer Deposition of PbS Thin Films at Low Temperatures

Atomic Layer Deposition of Emerging 2D Semiconductors, HfS 2 and ZrS 2 , for Optoelectronics

Atomic layer deposition of PbCl 2 , PbBr 2 and mixed lead halide (Cl, Br, I) PbX n Y 2− n thin films

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