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Variability of the large scale general circulation of the Mediterranean Sea from observations and modelling: a review

Palaeogeography, palaeoclimatology, palaeoecology, 2000-05, Vol.158 (3), p.153-173

2000

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Mutations in the caveolin-3 gene cause autosomal dominant limb-girdle muscular dystrophy

Nature genetics, 1998-04, Vol.18 (4), p.365-368

1998

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Mutation in the CAV3 gene causes partial caveolin-3 deficiency and hyperCKemia

Neurology, 2000-03, Vol.54 (6), p.1373

2000

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Lithium diffusion in cerium–vanadium mixed oxide thin films: a systematic study

Electrochimica acta, 2001-04, Vol.46 (13), p.2069-2075

2001

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Development and test of a new grating-polarimeter and its application in ellipsometric measurements

Thin solid films, 2004-05, Vol.455, p.138-142

2004

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Sputter deposited cerium–vanadium oxide: optical characterization and electrochromic behavior

Electrochimica acta, 2001-04, Vol.46 (13), p.2085-2090

2001

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Study of lithium diffusion in RF sputtered Nickel–Vanadium mixed oxides thin films

Electrochimica acta, 2002-05, Vol.47 (13), p.2231-2238

2002

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A comparison of the electrochromic properties of WO3 films intercalated with H+, Li+ and Na+

Journal of applied electrochemistry, 1996-06, Vol.26 (6), p.647-653

1996

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Indium−Vanadium Oxides Deposited by Radio Frequency Sputtering: New Thin Film Transparent Materials for Li-Insertion Electrochemical Devices

Chemistry of materials, 2002-02, Vol.14 (2), p.636-642

2002

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Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films

Thin solid films, 2004-05, Vol.455-456, p.468-472

2004

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Electrochemical and optical characterization of RF-sputtered thin films of vanadium–nickel mixed oxides

Electrochimica acta, 2001-04, Vol.46 (13), p.2257-2262

2001

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Sputter-deposited cerium vanadium mixed oxide as counter-electrode for electrochromic devices

Electrochimica acta, 1999-01, Vol.44 (18), p.3117-3119

1999

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Optical and electrochemical properties of cerium–zirconium mixed oxide thin films deposited by sol–gel and r.f. sputtering

Electrochimica acta, 1999-01, Vol.44 (18), p.3149-3156

1999

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Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

Solar energy materials and solar cells, 1999, Vol.56 (3-4), p.259-269

1999

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Ion assistance effects on electron beam deposited MgF2 films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2002-05, Vol.20 (3), p.714-720

2002

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Model intercomparison in the Mediterranean: MEDMEX simulations of the seasonal cycle

Journal of marine systems, 2002-06, Vol.33, p.215-251

2002

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Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry

Thin solid films, 2001-11, Vol.397 (1), p.229-237

2001

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Surface evolution of Ni-V transparent oxide films upon Li insertion reactions

Surface and interface analysis, 2002-10, Vol.33 (10-11), p.815-824

2002

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Ellipsometric methods for absorbing layers: a modified downhill simplex algorithm

Thin solid films, 1996-11, Vol.289 (1), p.54-58

1996

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In situ monitoring of film deposition with an ellipsometer based on a four-detector photopolarimeter

Applied Optics, 1996-10, Vol.35 (28), p.5626

1996

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Thin Film Counterelectrodes with High Li Charge Capacity for Electrochromic Windows

Monatshefte für Chemie, 2001-01, Vol.132 (1), p.83-95

2001

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Ion Potential Diagrams for Electrochromic Devices

Journal of the Electrochemical Society, 1998-12, Vol.145 (12), p.4212-4218

1998

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Growth of Ge layers on Si(100) monitored by in situ ellipsometry

Thin solid films, 1998-03, Vol.315 (1), p.49-56

1998

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Development of a phase-sensitive ellipsometer and application to the real-time analysis of chromogenic WO3 films during the coloration process

Thin solid films, 1998-02, Vol.313-314, p.62-67

1998

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UHV-CVD Ge/Si(100) heteroepitaxy monitored by in situ ellipsometry

Applied surface science, 1996-08, Vol.102, p.52-56

1996

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Variability of the large scale general circulation of the Mediterranean Sea from observations and modelling: a review

Mutations in the caveolin-3 gene cause autosomal dominant limb-girdle muscular dystrophy

Mutation in the CAV3 gene causes partial caveolin-3 deficiency and hyperCKemia

Lithium diffusion in cerium–vanadium mixed oxide thin films: a systematic study

Development and test of a new grating-polarimeter and its application in ellipsometric measurements

Sputter deposited cerium–vanadium oxide: optical characterization and electrochromic behavior

Study of lithium diffusion in RF sputtered Nickel–Vanadium mixed oxides thin films

A comparison of the electrochromic properties of WO3 films intercalated with H+, Li+ and Na+

Indium−Vanadium Oxides Deposited by Radio Frequency Sputtering: New Thin Film Transparent Materials for Li-Insertion Electrochemical Devices

Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin films

Electrochemical and optical characterization of RF-sputtered thin films of vanadium–nickel mixed oxides

Sputter-deposited cerium vanadium mixed oxide as counter-electrode for electrochromic devices

Optical and electrochemical properties of cerium–zirconium mixed oxide thin films deposited by sol–gel and r.f. sputtering

Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

Ion assistance effects on electron beam deposited MgF2 films

Model intercomparison in the Mediterranean: MEDMEX simulations of the seasonal cycle

Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry

Surface evolution of Ni-V transparent oxide films upon Li insertion reactions

Ellipsometric methods for absorbing layers: a modified downhill simplex algorithm

In situ monitoring of film deposition with an ellipsometer based on a four-detector photopolarimeter

Thin Film Counterelectrodes with High Li Charge Capacity for Electrochromic Windows

Ion Potential Diagrams for Electrochromic Devices

Growth of Ge layers on Si(100) monitored by in situ ellipsometry

Development of a phase-sensitive ellipsometer and application to the real-time analysis of chromogenic WO3 films during the coloration process

UHV-CVD Ge/Si(100) heteroepitaxy monitored by in situ ellipsometry

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