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From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes

Journal of physical chemistry. C, 2008-08, Vol.112 (32), p.12432-12441

2008

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Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. I. N2/H2 and NH3/H2 Plasmas

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2015-12, Vol.119 (52), p.12962-12976

2015

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Molecular dissociation and vibrational excitation on a metal hot filament surface

Journal of physics. D, Applied physics, 2014-01, Vol.47 (2), p.25503-1-025503-12

2014

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Activation and Decomposition of N2 on Heated Tungsten Filament Surfaces

Journal of physical chemistry. C, 2011-04, Vol.115 (14), p.6748-6756

2011

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Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2012-09, Vol.116 (38), p.9447-9458

2012

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On the mechanism of H atom production in hot filament activated H2 and CH4/H2 gas mixtures

The Journal of chemical physics, 2009-07, Vol.131 (4), p.044326-044326

2009

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Self-consistent modeling of microwave activated N2/CH4/H2 (and N2/H2) plasmas relevant to diamond chemical vapor deposition

Plasma sources science & technology, 2022-03, Vol.31 (3)

2022

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Imaging and Modeling C 2 Radical Emissions from Microwave Plasma-Activated Methane/Hydrogen Gas Mixtures: Contributions from Chemiluminescent Reactions and Investigations of Higher-Pressure Effects and Plasma Constriction

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2021-05, Vol.125 (19), p.4184-4199

2021

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Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2016-11, Vol.120 (43), p.8537-8549

2016

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N-Doped Carbon NanoWalls for Power Sources

Scientific reports, 2019-04, Vol.9 (1), p.6716-6716, Article 6716

2019

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Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H 2 /Ar and H 2 /Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2019-04, Vol.123 (13), p.2544-2558

2019

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Study of CoTa alloy as barrier layer for Cu/low-k interconnects

Journal of physics. D, Applied physics, 2017-10, Vol.50 (40), p.405306

2017

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Mechanisms of hydrogen atom interactions with MoS2monolayer

Journal of physics. Condensed matter, 2020-10, Vol.32 (44)

2020

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Imaging and Modeling the Optical Emission from CH Radicals in Microwave Activated C/H Plasmas

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2019-11, Vol.123 (46), p.9966-9977

2019

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Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition

Journal of applied physics, 2009-02, Vol.105 (4)

2009

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Spatially Resolved Optical Emission and Modeling Studies of Microwave-Activated Hydrogen Plasmas Operating under Conditions Relevant for Diamond Chemical Vapor Deposition

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2018-10, Vol.122 (42), p.8286-8300

2018

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Boron-doped Homoepitaxial Diamond CVD from Microwave Plasma-Activated Ethanol/Trimethyl Borate/Hydrogen Mixtures

Chemical vapor deposition, 2012-09, Vol.18 (10-12), p.302-308

2012

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Reactive pathways of hydrogen and carbon removal from organosilicate glass low-κ films by F atoms

The European physical journal. D, Atomic, molecular, and optical physics, 2017-07, Vol.71 (7), p.1-10, Article 184

2017

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What [plasma used for growing] diamond can shine like flame?

Chemical communications (Cambridge, England), 2017-09, Vol.53 (76), p.1482-1495

2017

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Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films

Journal of physics. D, Applied physics, 2016-07, Vol.49 (34)

2016

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Modeling of Single and Dual Frequency Capacitive Discharge in Argon Hydrogen Mixture − Dynamic Effects and Ion Energy Distribution Functions

Plasma processes and polymers, 2017-04, Vol.14 (4-5), p.np-n/a

2017

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Effect of porosity and pore size on dielectric constant of organosilicate based low-k films: An analytical approach

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2016-07, Vol.34 (4)

2016

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Pore sealing mechanism in OSG low‐k films under ion bombardment

Plasma processes and polymers, 2020-02, Vol.17 (2), p.n/a

2020

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Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH 4 /N 2 /H 2 Plasmas

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2016-11, Vol.120 (43), p.8537-8549

2016

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Environmentally Friendly Method of Silicon Recycling: Synthesis of Silica Nanoparticles in an Aqueous Solution

ACS sustainable chemistry & engineering, 2020-09, Vol.8 (37), p.14006-14012

2020

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From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. I. N2/H2 and NH3/H2 Plasmas

Molecular dissociation and vibrational excitation on a metal hot filament surface

Activation and Decomposition of N2 on Heated Tungsten Filament Surfaces

Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition

On the mechanism of H atom production in hot filament activated H2 and CH4/H2 gas mixtures

Self-consistent modeling of microwave activated N2/CH4/H2 (and N2/H2) plasmas relevant to diamond chemical vapor deposition

Imaging and Modeling C 2 Radical Emissions from Microwave Plasma-Activated Methane/Hydrogen Gas Mixtures: Contributions from Chemiluminescent Reactions and Investigations of Higher-Pressure Effects and Plasma Constriction

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH4/N2/H2 Plasmas

N-Doped Carbon NanoWalls for Power Sources

Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H 2 /Ar and H 2 /Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition

Study of CoTa alloy as barrier layer for Cu/low-k interconnects

Mechanisms of hydrogen atom interactions with MoS2monolayer

Imaging and Modeling the Optical Emission from CH Radicals in Microwave Activated C/H Plasmas

Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition

Spatially Resolved Optical Emission and Modeling Studies of Microwave-Activated Hydrogen Plasmas Operating under Conditions Relevant for Diamond Chemical Vapor Deposition

Boron-doped Homoepitaxial Diamond CVD from Microwave Plasma-Activated Ethanol/Trimethyl Borate/Hydrogen Mixtures

Reactive pathways of hydrogen and carbon removal from organosilicate glass low-κ films by F atoms

What [plasma used for growing] diamond can shine like flame?

Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films

Modeling of Single and Dual Frequency Capacitive Discharge in Argon Hydrogen Mixture − Dynamic Effects and Ion Energy Distribution Functions

Effect of porosity and pore size on dielectric constant of organosilicate based low-k films: An analytical approach

Pore sealing mechanism in OSG low‐k films under ion bombardment

Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH 4 /N 2 /H 2 Plasmas

Environmentally Friendly Method of Silicon Recycling: Synthesis of Silica Nanoparticles in an Aqueous Solution

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