UB Paderborn / Katalog / Suche / in CDI

Electronic structure analysis of Zr silicate and Hf silicate films by using spatially resolved valence electron energy-loss spectroscopy

Journal of applied physics, 2003-07, Vol.94 (1), p.480-486

2003

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Spatially-resolved valence-electron energy-loss spectroscopy of Zr-oxide and Zr-silicate films

Applied physics letters, 2002-06, Vol.80 (22), p.4127-4129

2002

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Mechanism for Fermi Level Pinning at Electrode/Hf-Based Dielectric Interface: Systematic Study of Dependence of Effective Work Functions for Polycrystalline Silicon and Fully Silicided NiSi Electrodes on Hf Density at Interface

Japanese Journal of Applied Physics, 2006-12, Vol.45 (12R), p.9053

2006

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Fully Silicided NiSi Gate Electrodes on HfSiON Gate Dielectrics for Low-Power Applications

Japanese Journal of Applied Physics, 2005-04, Vol.44 (4S), p.2205

2005

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High-Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics

Japanese Journal of Applied Physics, 2005-04, Vol.44 (4S), p.2210

2005

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Mechanism for Leakage Reduction by La Incorporation in a HfO2/SiO2/Si Gate Stack

IEEE electron device letters, 2013-03, Vol.34 (3), p.348-350

2013

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Mechanism for Leakage Reduction by La Incorporation in a \hbox\hbox\hbox Gate Stack

IEEE electron device letters, 2013-03, Vol.34 (3), p.348-350

2013

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Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method

Japanese Journal of Applied Physics, 2005-04, Vol.44 (4S), p.2235

2005

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Mechanism of Suppressed Change in Effective Work Functions for Impurity-Doped Fully Silicided NiSi Electrodes on Hf-Based Gate Dielectrics

Japanese Journal of Applied Physics, 2007-01, Vol.46 (1R), p.91

2007

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Analysis of Origin of Threshold Voltage Change Induced by Impurity in Fully Silicided NiSi/SiO 2 Gate Stacks

Japanese Journal of Applied Physics, 2006-04, Vol.45 (4S), p.2919

2006

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Single metal/single dielectric gate stack realizing triple effective workfunction for embedded memory application

2008 Symposium on VLSI Technology, 2008, p.46-47

2008

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Mechanism of Leakage Current Reduction by Adding WO 3 to Crystallized Ta 2 O 5

Japanese Journal of Applied Physics, 2001-06, Vol.40 (6B), p.L625

2001

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Dual workfunction Ni-Silicide/HfSiON gate stacks by phase-controlled full-silicidation (PC-FUSI) technique for 45nm-node LSTP and LOP devices

IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004, 2004, p.91-94

2004

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On superconductivity of α-(BEDT-TTF)2KHg(SCN)4 under uniaxial stress below 1K

Czechoslovak journal of physics, 1996-02, Vol.46 (S2), p.813-814

1996

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Integration Technology of PC-FUSI (Phase Controlled FUSI) / HfSiON Gate Stack for Embedded Memory Application

2007 IEEE International Electron Devices Meeting, 2007, p.69-72

2007

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Practical Vth Control Methods for Ni-FUSI/HfSiON MOSFETs on SOI Substrates

2006 International Electron Devices Meeting, 2006, p.1-4

2006

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IGF2 Autocrine-Mediated IGF1R Activation Is a Clinically Relevant Mechanism of Osimertinib Resistance in Lung Cancer

Molecular cancer research, 2020-04, Vol.18 (4), p.549-559

2020

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Current status of delirium assessment tools in the intensive care unit: a prospective multicenter observational survey

Scientific reports, 2022-02, Vol.12 (1), p.2185-2185, Article 2185

2022

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SHOC2 Is a Critical Modulator of Sensitivity to EGFR-TKIs in Non-Small Cell Lung Cancer Cells

Molecular cancer research, 2021-02, Vol.19 (2), p.317-328

2021

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Functional dissection of the KRAS G12C mutation by comparison among multiple oncogenic driver mutations in a lung cancer cell line model

Biochemical and biophysical research communications, 2021-01, Vol.534, p.1-7

2021

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Comparison of detection methods of EGFR T790M mutations using plasma, serum, and tumor tissue in EGFR-TKI-resistant non-small cell lung cancer

OncoTargets and therapy, 2018-01, Vol.11, p.3335-3343

2018

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Efficacy of afatinib or osimertinib plus cetuximab combination therapy for non-small-cell lung cancer with EGFR exon 20 insertion mutations

Lung cancer (Amsterdam, Netherlands), 2019-01, Vol.127, p.146-152

2019

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Adoptive transfer of zoledronate-expanded autologous Vγ9Vδ2 T-cells in patients with treatment-refractory non-small-cell lung cancer: a multicenter, open-label, single-arm, phase 2 study

Journal for immunotherapy of cancer, 2020-09, Vol.8 (2), p.e001185

2020

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An orthodontic-orthognathic patient with obstructive sleep apnea treated with Le Fort I osteotomy advancement and alar cinch suture combined with a muco-musculo-periosteal V-Y closure to minimize nose deformity

The Angle orthodontist, 2019-11, Vol.89 (6), p.946-952

2019

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Abstract 2991: Establishment of patient-derived cancer cell lines to elucidate the resistant mechanism of tyrosine kinase inhibitors

Cancer research (Chicago, Ill.), 2020-08, Vol.80 (16_Supplement), p.2991-2991

2020

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Electronic structure analysis of Zr silicate and Hf silicate films by using spatially resolved valence electron energy-loss spectroscopy

Spatially-resolved valence-electron energy-loss spectroscopy of Zr-oxide and Zr-silicate films

Mechanism for Fermi Level Pinning at Electrode/Hf-Based Dielectric Interface: Systematic Study of Dependence of Effective Work Functions for Polycrystalline Silicon and Fully Silicided NiSi Electrodes on Hf Density at Interface

Fully Silicided NiSi Gate Electrodes on HfSiON Gate Dielectrics for Low-Power Applications

High-Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics

Mechanism for Leakage Reduction by La Incorporation in a HfO2/SiO2/Si Gate Stack

Mechanism for Leakage Reduction by La Incorporation in a \hbox\hbox\hbox Gate Stack

Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method

Mechanism of Suppressed Change in Effective Work Functions for Impurity-Doped Fully Silicided NiSi Electrodes on Hf-Based Gate Dielectrics

Analysis of Origin of Threshold Voltage Change Induced by Impurity in Fully Silicided NiSi/SiO 2 Gate Stacks

Single metal/single dielectric gate stack realizing triple effective workfunction for embedded memory application

Mechanism of Leakage Current Reduction by Adding WO 3 to Crystallized Ta 2 O 5

Dual workfunction Ni-Silicide/HfSiON gate stacks by phase-controlled full-silicidation (PC-FUSI) technique for 45nm-node LSTP and LOP devices

On superconductivity of α-(BEDT-TTF)2KHg(SCN)4 under uniaxial stress below 1K

Integration Technology of PC-FUSI (Phase Controlled FUSI) / HfSiON Gate Stack for Embedded Memory Application

Practical Vth Control Methods for Ni-FUSI/HfSiON MOSFETs on SOI Substrates

IGF2 Autocrine-Mediated IGF1R Activation Is a Clinically Relevant Mechanism of Osimertinib Resistance in Lung Cancer

Current status of delirium assessment tools in the intensive care unit: a prospective multicenter observational survey

SHOC2 Is a Critical Modulator of Sensitivity to EGFR-TKIs in Non-Small Cell Lung Cancer Cells

Functional dissection of the KRAS G12C mutation by comparison among multiple oncogenic driver mutations in a lung cancer cell line model

Comparison of detection methods of EGFR T790M mutations using plasma, serum, and tumor tissue in EGFR-TKI-resistant non-small cell lung cancer

Efficacy of afatinib or osimertinib plus cetuximab combination therapy for non-small-cell lung cancer with EGFR exon 20 insertion mutations

Adoptive transfer of zoledronate-expanded autologous Vγ9Vδ2 T-cells in patients with treatment-refractory non-small-cell lung cancer: a multicenter, open-label, single-arm, phase 2 study

An orthodontic-orthognathic patient with obstructive sleep apnea treated with Le Fort I osteotomy advancement and alar cinch suture combined with a muco-musculo-periosteal V-Y closure to minimize nose deformity

Abstract 2991: Establishment of patient-derived cancer cell lines to elucidate the resistant mechanism of tyrosine kinase inhibitors

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