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The use of atomic layer deposition in advanced nanopatterning

Nanoscale, 2014-10, Vol.6 (19), p.1941-196

2014

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Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma

ACS applied materials & interfaces, 2018-11, Vol.10 (44), p.38588-38595

2018

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Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation

Journal of physical chemistry. C, 2022-02, Vol.126 (5), p.2463-2474

2022

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Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

Langmuir, 2023-03, Vol.39 (12), p.4265-4273

2023

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Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O 2 Plasma

ACS applied materials & interfaces, 2018-11, Vol.10 (44), p.38588-38595

2018

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The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

The journal of physical chemistry letters, 2024-07, Vol.15 (29), p.7496-7501

2024

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In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd

Journal of physics. D, Applied physics, 2016-03, Vol.49 (11), p.115504-115515

2016

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Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements

Journal of physical chemistry. C, 2013-05, Vol.117 (20), p.10788-10798

2013

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Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

Applied physics letters, 2009-07, Vol.95 (1)

2009

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Nanopatterning by direct-write atomic layer deposition

Nanoscale, 2012-08, Vol.4 (15), p.4477-4480

2012

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Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-01, Vol.28 (1), p.77-87

2010

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Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition

Journal of applied physics, 2007-10, Vol.102 (8)

2007

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Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18O2 Isotope Labeling

Journal of physical chemistry. C, 2013-10, Vol.117 (41), p.21320-21330

2013

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Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-12, Vol.40 (6)

2022

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Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

Journal of applied physics, 2011-04, Vol.109 (8)

2011

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Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

Applied physics letters, 2017-09, Vol.111 (11)

2017

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Dehydrogenation Reactions during Atomic Layer Deposition of Ru Using O 2

Chemistry of materials, 2012-10, Vol.24 (19), p.3696-3700

2012

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Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

Journal of applied physics, 2010-06, Vol.107 (11), p.116102-116102-3

2010

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(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry

ECS transactions, 2017, Vol.80 (3), p.39-48

2017

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Erratum: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd (2016 J. Phys. D: Appl. Phys. 49 115504)

Journal of physics. D, Applied physics, 2016-07, Vol.49 (26), p.269601

2016

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Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18 O 2 Isotope Labeling

Journal of physical chemistry. C, 2013-10, Vol.117 (41), p.21320-21330

2013

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Remote Plasma ALD of Platinum and Platinum Oxide Films

Electrochemical and solid-state letters, 2009, Vol.12 (7), p.G34

2009

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(Invited) Catalytic Surface Reactions during Nucleation and Growth of Atomic Layer Deposition of Noble Metals: A Case Study for Platinum

ECS transactions, 2013, Vol.58 (10), p.183-193

2013

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Investigating the difference in nucleation during Si-based ALD on different surfaces for future area-selective deposition

2018 IEEE 18th International Conference on Nanotechnology (IEEE-NANO), 2018, p.1-2

2018

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Nanopatterning by direct-write atomic layer depositionElectronic supplementary information (ESI) available: The XPS spectrum used for composition analysis, high-angle annular dark field (HAADF) cross-section TEM images, an energy dispersive X-ray spectroscopy (EDX) spectrum for area-selective ALD of Pd on Pt EBID material, and a more detailed TEM image of the MWCNT of Fig. 4b. See DOI: 10.1039/c2nr30664f

2012-07

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The use of atomic layer deposition in advanced nanopatterning

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma

Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation

Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O 2 Plasma

The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd

Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements

Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

Nanopatterning by direct-write atomic layer deposition

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition

Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18O2 Isotope Labeling

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma

Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

Dehydrogenation Reactions during Atomic Layer Deposition of Ru Using O 2

Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

(Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry

Erratum: In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd (2016 J. Phys. D: Appl. Phys. 49 115504)

Catalytic Combustion Reactions During Atomic Layer Deposition of Ru Studied Using 18 O 2 Isotope Labeling

Remote Plasma ALD of Platinum and Platinum Oxide Films

(Invited) Catalytic Surface Reactions during Nucleation and Growth of Atomic Layer Deposition of Noble Metals: A Case Study for Platinum

Investigating the difference in nucleation during Si-based ALD on different surfaces for future area-selective deposition

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