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Structural and compositional studies of magnetron-sputtered Nd-Fe-B thin films on Si(100)

Journal of materials science, 1998-03, Vol.33 (5), p.1349-1357

1998

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Plasma diagnostics of the high pressure oxygen-sputtering process

Thin solid films, 1993-03, Vol.224 (2), p.137-140

1993

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Study of the processes occurring when sputtering YBa2Cu3O7-x in pure oxygen

Vacuum, 1998-03, Vol.49 (3), p.221-225

1998

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Characterization of titanium thin films prepared by bias assisted magnetron sputtering

Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 1996-12, Vol.27 (6), p.1057-1060

1996

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Estimation of density of charge species in a triode discharge system

Vacuum, 1997-10, Vol.48 (10), p.845-848

1997

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Differential temperature controller: An energy conservative device for solar water heating systems

Energy conversion and management, 1991, Vol.31 (1), p.61-63

1991

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Fabrication and performance study of a YBa2Cu3O7-δ thin film varistor

Thin solid films, 1994-01, Vol.238 (1), p.115-118

1994

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Studies of process parameter controlled composition variation in sputtered YBa2Cu3O7-x films

Vacuum, 1997-02, Vol.48 (2), p.113-118

1997

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A Beginner's Guide to Introduce Artificial Intelligence in Teaching and Learning

1, 2023

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Wide beam ion optics of mass analyser for ion implanters

Vacuum, 1992, Vol.43 (4), p.293-295

1992

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Critical exponent of the electrical conductivity in the paracoherence region of a thin film of YBa2Cu3O7−x

Bulletin of materials science, 1994-11, Vol.17 (6), p.585-594

1994

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Electron microscopy studies of ion implanted silicon for seeding electroless copper films

Journal of applied physics, 1998-06, Vol.83 (11), p.5709-5713

1998

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Critical current densities of high pressure oxygen sputtered thin films of YBa2Cu3O7−x by non-resonant rf absorption method

Pramāṇa, 1993-02, Vol.40 (2), p.119-122

1993

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Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering

Thin solid films, 1997-01, Vol.292 (1), p.20-25

1997

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An unbalanced magnetron sputtering device for low and medium pressures

Review of scientific instruments, 1995-10, Vol.66 (10), p.4961-4966

1995

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Effect of deposition parameters on the structural properties and Tc of YBaCuO films by high pressure oxygen sputtering

Physica. C, Superconductivity, 1992-03, Vol.192 (3), p.447-452

1992

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Effect of strain and temperature on the behavior of oxygen ion implanted manganese films

Journal of applied physics, 1994-09, Vol.76 (6), p.3573-3578

1994

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Mass analyser optics for wide-beam ion sources in ion implantation systems

Journal of physics. E, Scientific instruments, 1989-08, Vol.22 (8), p.666-668

1989

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Characterization of YBa2Cu3O7−x thin films deposited by high pressure oxygen sputtering

Solid state communications, 1994-02, Vol.89 (8), p.713-717

1994

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Study of discharge characteristics in pure argon and oxygen during dc sputtering of YBaCuO films

Vacuum, 1993-10, Vol.44 (10), p.1049-1052

1993

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A novel electron beam evaporation technique for the deposition of superconducting thin films

Physica. C, Superconductivity, 1991-05, Vol.175 (5), p.623-626

1991

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Characterization of YBa sub 2 Cu sub 3 O sub 7-x thin films deposited by high pressure oxygen sputtering

Solid state communications, 1994-01, Vol.89 (8), p.713-717

1994

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Characterization of YBa2Cu7-x thin films deposited by high pressure oxygen sputtering

Solid state communications, 1994, Vol.89 (8), p.713-717

1994

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Effect of Deposition Parameters on the Structural Properties and T sub c of YBaCuO Films by High Pressure Oxygen Sputtering

Physica. C, Superconductivity, 1992-03, Vol.192 (3-4), p.447-452

1992

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Critical current densities of high pressure oxygen sputtered thin films of YBa sub 2 Cu sub 3 O sub 7-x by non-resonant radio frequency absorption method

Pramāṇa, 1993-02, Vol.40 (2), p.119-122

1993

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Structural and compositional studies of magnetron-sputtered Nd-Fe-B thin films on Si(100)

Plasma diagnostics of the high pressure oxygen-sputtering process

Study of the processes occurring when sputtering YBa2Cu3O7-x in pure oxygen

Characterization of titanium thin films prepared by bias assisted magnetron sputtering

Estimation of density of charge species in a triode discharge system

Differential temperature controller: An energy conservative device for solar water heating systems

Fabrication and performance study of a YBa2Cu3O7-δ thin film varistor

Studies of process parameter controlled composition variation in sputtered YBa2Cu3O7-x films

A Beginner's Guide to Introduce Artificial Intelligence in Teaching and Learning

Wide beam ion optics of mass analyser for ion implanters

Critical exponent of the electrical conductivity in the paracoherence region of a thin film of YBa2Cu3O7−x

Electron microscopy studies of ion implanted silicon for seeding electroless copper films

Critical current densities of high pressure oxygen sputtered thin films of YBa2Cu3O7−x by non-resonant rf absorption method

Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering

An unbalanced magnetron sputtering device for low and medium pressures

Effect of deposition parameters on the structural properties and Tc of YBaCuO films by high pressure oxygen sputtering

Effect of strain and temperature on the behavior of oxygen ion implanted manganese films

Mass analyser optics for wide-beam ion sources in ion implantation systems

Characterization of YBa2Cu3O7−x thin films deposited by high pressure oxygen sputtering

Study of discharge characteristics in pure argon and oxygen during dc sputtering of YBaCuO films

A novel electron beam evaporation technique for the deposition of superconducting thin films

Characterization of YBa sub 2 Cu sub 3 O sub 7-x thin films deposited by high pressure oxygen sputtering

Characterization of YBa2Cu7-x thin films deposited by high pressure oxygen sputtering

Effect of Deposition Parameters on the Structural Properties and T sub c of YBaCuO Films by High Pressure Oxygen Sputtering

Critical current densities of high pressure oxygen sputtered thin films of YBa sub 2 Cu sub 3 O sub 7-x by non-resonant radio frequency absorption method

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