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Luminescence and structural study of porous silicon films

Journal of applied physics, 1992-03, Vol.71 (5), p.2403-2407

1992

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On the role of oxygen and hydrogen in diamond-forming discharges

Journal of applied physics, 1989-05, Vol.65 (9), p.3448-3452

1989

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The thermal conductivity of chemical-vapor-deposited diamond films on silicon

Journal of applied physics, 1992-04, Vol.71 (7), p.3143-3146

1992

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Diamond crystal growth by plasma chemical vapor deposition

Journal of applied physics, 1988-03, Vol.63 (5), p.1744-1748

1988

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Sources of thermal resistance in chemically vapor deposited diamond

Diamond and related materials, 1996-05, Vol.5 (6), p.682-687

1996

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Selected‐Area Nucleation and Patterning of Diamond Thin Films by Electrophoretic Seeding

Journal of the Electrochemical Society, 1991-02, Vol.138 (2), p.635-636

1991

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Plasmaless dry etching of silicon with fluorine-containing compounds

Journal of applied physics, 1984-01, Vol.56 (10), p.2939-2942

1984

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Kinetics of SiC CVD : surface decomposition of silacyclobutane and methylsilane

Journal of physical chemistry (1952), 1993-12, Vol.97 (49), p.12937-12948

1993

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Direct pattern replication in plasma deposited silicon nitride films by 193 nm ArF excimer laser-induced suppression of etching

Applied physics letters, 1989-04, Vol.54 (16), p.1567-1569

1989

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Plasma enhanced layer-by-layer deposition and nanocrystallization of hydrogenated amorphous silicon films

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2013-11, Vol.31 (6), p.61209

2013

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Mechanisms of dehydrogenation during ArF excimer laser patterning of plasma-deposited silicon nitride films

Journal of applied physics, 1990-04, Vol.67 (7), p.3337-3342

1990

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Selective interhalogen etching of tantalum compounds and other semiconductor materials

Applied physics letters, 1985-04, Vol.46 (8), p.794-796

1985

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Correction of Nonlinear Derivative Diode Laser Data in Standard Addition Analyses

Applied spectroscopy, 1984-01, Vol.38 (1), p.68-73

Mucha, J. A.

1984

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Trace analysis of microvolume gas samples: dynamic considerations for analytical accuracy

Analytical chemistry (Washington), 1985-08, Vol.57 (9), p.1963-1969

Mucha, J. A

1985

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Kinetics of silicon carbide CVD: surface decomposition of silacyclobutane and methylsilane

Journal of physical chemistry (1952), 1993-12, Vol.97 (49), p.12937-12948

1993

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Comparison of XeF2 and F-atom reactions with Si and SiO2

Applied physics letters, 1984-06, Vol.44 (12), p.1129-1131

1984

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Tunable Diode Laser Measurements of Water Vapor Line Parameters in the 6-μm Spectral Region

Applied spectroscopy, 1982-03, Vol.36 (2), p.141-147

Mucha, J. A.

1982

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The etching of doped polycrystalline silicon by molecular chlorine

Journal of applied physics, 1988-12, Vol.64 (11), p.6510-6514

1988

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Copper-catalyzed etching of silicon by F2: kinetics and feature morphology

Journal of applied physics, 1988-08, Vol.64 (3), p.1494-1498

1988

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Catalyzed gaseous etching of silicon

Journal of applied physics, 1987-08, Vol.62 (3), p.1049-1053

1987

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Chemiluminescence and the reaction of molecular fluorine with silicon

Journal of physical chemistry (1952), 1981-11, Vol.85 (23), p.3529-3532

1981

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Downstream Atomic Monitoring for Absolute Etch Rate Determinations

Journal of the Electrochemical Society, 1983-04, Vol.130 (4), p.905-907

1983

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Heterodyne measurements of submillimeter laser spectrometer frequencies

IEEE journal of quantum electronics, 1977-03, Vol.13 (3), p.92-94

1977

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Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1989-11, Vol.7 (6), p.1345-1351

1989

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Infrared Studies of Ozone-Organosilicon Chemistries for SiO2 Deposition

MRS proceedings, 1993, Vol.334

1993

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Luminescence and structural study of porous silicon films

On the role of oxygen and hydrogen in diamond-forming discharges

The thermal conductivity of chemical-vapor-deposited diamond films on silicon

Diamond crystal growth by plasma chemical vapor deposition

Sources of thermal resistance in chemically vapor deposited diamond

Selected‐Area Nucleation and Patterning of Diamond Thin Films by Electrophoretic Seeding

Plasmaless dry etching of silicon with fluorine-containing compounds

Kinetics of SiC CVD : surface decomposition of silacyclobutane and methylsilane

Direct pattern replication in plasma deposited silicon nitride films by 193 nm ArF excimer laser-induced suppression of etching

Plasma enhanced layer-by-layer deposition and nanocrystallization of hydrogenated amorphous silicon films

Mechanisms of dehydrogenation during ArF excimer laser patterning of plasma-deposited silicon nitride films

Selective interhalogen etching of tantalum compounds and other semiconductor materials

Correction of Nonlinear Derivative Diode Laser Data in Standard Addition Analyses

Trace analysis of microvolume gas samples: dynamic considerations for analytical accuracy

Kinetics of silicon carbide CVD: surface decomposition of silacyclobutane and methylsilane

Comparison of XeF2 and F-atom reactions with Si and SiO2

Tunable Diode Laser Measurements of Water Vapor Line Parameters in the 6-μm Spectral Region

The etching of doped polycrystalline silicon by molecular chlorine

Copper-catalyzed etching of silicon by F2: kinetics and feature morphology

Catalyzed gaseous etching of silicon

Chemiluminescence and the reaction of molecular fluorine with silicon

Downstream Atomic Monitoring for Absolute Etch Rate Determinations

Heterodyne measurements of submillimeter laser spectrometer frequencies

Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

Infrared Studies of Ozone-Organosilicon Chemistries for SiO2 Deposition

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