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Applications of atomic layer deposition to nanofabrication and emerging nanodevices

Thin solid films, 2009-02, Vol.517 (8), p.2563-2580

2009

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The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

Applied surface science, 2014-09, Vol.313, p.585-590

2014

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Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

Thin solid films, 2010-10, Vol.519 (1), p.362-366

2010

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Studies on optical, structural and electrical properties of atomic layer deposited Al-doped ZnO thin films with various Al concentrations and deposition temperatures

Journal of physics. D, Applied physics, 2011-11, Vol.44 (44), p.445305-1-7

2011

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The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition

Applied surface science, 2013-12, Vol.287, p.349-354

2013

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Tetragonally strained BiFeO3 thin film on single crystal Rh substrate

Journal of crystal growth, 2013-01, Vol.363, p.105-108

2013

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Highly (111)-oriented multiferroic BiFeO3 thin film on a glass substrate

Journal of crystal growth, 2013-03, Vol.367, p.24-26

2013

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Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant

Journal of alloys and compounds, 2015-11, Vol.649, p.216-221

2015

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The Effect of Active-Layer Thickness and Back-Channel Conductivity on the Subthreshold Transfer Characteristics of Hf-In-Zn-O TFTs

IEEE electron device letters, 2011-08, Vol.32 (8), p.1077-1079

2011

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Interface roughness effect between gate oxide and metal gate on dielectric property

Thin solid films, 2009-05, Vol.517 (14), p.3892-3895

2009

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Growth characteristics and film properties of gallium doped zinc oxide prepared by atomic layer deposition

Journal of electroceramics, 2013-12, Vol.31 (3-4), p.338-344

2013

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Flat band voltage (VFB) modulation by controlling compositional depth profile in La2O3/HfO2 nanolaminate gate oxide

Journal of applied physics, 2010-04, Vol.107 (7)

2010

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Room temperature ferroelectricity of tetragonally strained SrTiO3 thin films on single crystal Rh substrates

Solid state communications, 2012-07, Vol.152 (14), p.1256-1258

2012

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Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

Microelectronic engineering, 2008, Vol.85 (1), p.39-44

2008

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Low temperature atomic layer deposited Al-doped ZnO thin films and associated semiconducting properties

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012-05, Vol.30 (3), p.031210-031210-7

2012

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The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation

Journal of applied physics, 2008-09, Vol.104 (6)

2008

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Biohydrogenation and digestion of long chain fatty acids in steers fed on different sources of lipid

The Journal of agricultural science, 2001-05, Vol.136 (3), p.345-355

2001

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Electrical property improvements of high- k gate oxide by in situ nitrogen incorporation during atomic layer deposition

Applied physics letters, 2007-02, Vol.90 (6), p.062909-062909-3

2007

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Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-01, Vol.26 (1), p.189-194

2008

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Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant

Ceramics international, 2015-11, Vol.41 (9), p.10782-10787

2015

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Effect of Al concentration on the electrical characteristics of solution-processed Al doped ZnSnO thin film transistors

Ceramics international, 2014-07, Vol.40 (6), p.8769-8774

2014

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Uptake of acetylated peptides from the small intestine in sheep and their nutritive value in rats

British journal of nutrition, 1998-07, Vol.80 (1), p.101-108

1998

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Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics

Applied physics letters, 2007-08, Vol.91 (9), p.092901-092901-3

2007

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Variation in ferroelectric polarization direction of epitaxial (001) SrBi2Ta2O9 thin film induced by oxygen vacancy

Ceramics international, 2014-03, Vol.40 (2), p.2741-2745

2014

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The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO x N y prepared by in situ nitridation

Journal of applied physics, 2008-09, Vol.104 (6), p.064111-064111-5

2008

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Applications of atomic layer deposition to nanofabrication and emerging nanodevices

The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics

Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition

Studies on optical, structural and electrical properties of atomic layer deposited Al-doped ZnO thin films with various Al concentrations and deposition temperatures

The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition

Tetragonally strained BiFeO3 thin film on single crystal Rh substrate

Highly (111)-oriented multiferroic BiFeO3 thin film on a glass substrate

Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant

The Effect of Active-Layer Thickness and Back-Channel Conductivity on the Subthreshold Transfer Characteristics of Hf-In-Zn-O TFTs

Interface roughness effect between gate oxide and metal gate on dielectric property

Growth characteristics and film properties of gallium doped zinc oxide prepared by atomic layer deposition

Flat band voltage (VFB) modulation by controlling compositional depth profile in La2O3/HfO2 nanolaminate gate oxide

Room temperature ferroelectricity of tetragonally strained SrTiO3 thin films on single crystal Rh substrates

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

Low temperature atomic layer deposited Al-doped ZnO thin films and associated semiconducting properties

The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridation

Biohydrogenation and digestion of long chain fatty acids in steers fed on different sources of lipid

Electrical property improvements of high- k gate oxide by in situ nitrogen incorporation during atomic layer deposition

Hybrid nanofabrication processes utilizing diblock copolymer nanotemplate prepared by self-assembled monolayer based surface neutralization

Atomic layer deposition of highly conductive indium oxide using a liquid precursor and water oxidant

Effect of Al concentration on the electrical characteristics of solution-processed Al doped ZnSnO thin film transistors

Uptake of acetylated peptides from the small intestine in sheep and their nutritive value in rats

Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics

Variation in ferroelectric polarization direction of epitaxial (001) SrBi2Ta2O9 thin film induced by oxygen vacancy

The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO x N y prepared by in situ nitridation

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