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Basic Characteristics of Gliding-Arc Discharges in Air and Natural Gas

IEEE transactions on plasma science, 2011-02, Vol.39 (2), p.775-780

2011

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Tar Reforming under a Microwave Plasma Torch

Energy & fuels, 2013-02, Vol.27 (2), p.1174-1181

2013

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Flexible camphor diamond-like carbon coating on polyurethane to prevent Candida albicans biofilm growth

Journal of the mechanical behavior of biomedical materials, 2017-04, Vol.68, p.239-246

2017

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Nitrogen doping of SiC thin films deposited by RF magnetron sputtering

Journal of materials science. Materials in electronics, 2008-09, Vol.19 (8-9), p.835-840

2008

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Comparison of the Ablation Mechanism of C/C-SiC Composite under Atmospheric and Low Pressure

Advances in Science and Technology, 2014-10, Vol.91, p.134-139

2014

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Formation of electrostatic double-layers and electron-holes in a low pressure mercury plasma column

Journal of physics. D, Applied physics, 2003-11, Vol.36 (22), p.2798-2805

2003

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Mixed LTCC and LTTT Technology for Microplasma Generator Fabrication

Journal of microelectronics and electronic packaging, 2009-04, Vol.6 (2), p.101-107

2009

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Similarity Relations of Power-Voltage Characteristics for Tornado Gliding Arc in Plasma-Assisted Combustion Processes

IEEE transactions on plasma science, 2015-05, Vol.43 (5), p.1742-1746

2015

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Physics and Biology: Bio-plasma physics

American journal of physics, 2000-05, Vol.68 (5), p.450-455

2000

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Atomic layer deposition of TiO2 thin films on electrospun poly (butylene adipate-co-terephthalate) fibers: Freestanding TiO2 nanostructures via polymer carbonization

Materials today : proceedings, 2019, Vol.14, p.656-662

2019

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Evaluation of Ion Flux in Ar and SF6 Asymmetric Capacitive Coupled Plasmas Through Invasive and Non-Invasive Methods

2017 IEEE International Conference on Plasma Science (ICOPS), 2017, p.1-1

2017

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Plasma-Enhanced Atomic Layer Deposition Of Al2O3 Thin Film On Tio2 Nanotubes

2017 IEEE International Conference on Plasma Science (ICOPS), 2017, p.1-1

2017

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Effect of Storage Temperature on pH and Conductivity of Reverse Osmosis Water Treated with Atmospheric Plasma

Plasma medicine, 2018, Vol.8 (3), p.237-244

2018

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Approximation of Physical Properties of Steam and Other Arc Plasmas for Anisotropic Model Concerning Gasification Processes

IEEE transactions on plasma science, 2013-12, Vol.41 (12), p.3287-3292

2013

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Surfatron-Produced Atmospheric-Pressure Plasma Jet Applied to Candida Biofilms

Plasma medicine, 2018, Vol.8 (4), p.345-355

2018

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Tar Reforming under a Microwave Plasma Torch

Energy & fuels, 2013, Vol.27 (JANFEV), p.1174-1181

2013

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Generalization of the Total Current-Voltage Characteristics for Transferred Arc Plasma Torch With Steam and Air Plasmas Based on the Analytical Anisotropic Model

IEEE transactions on plasma science, 2015-10, Vol.43 (10), p.3707-3715

2015

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Investigations of capacitively-coupled plasmas by electrostatic probe technique

2015 30th Symposium on Microelectronics Technology and Devices (SBMicro), 2015, p.1-4

2015

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Surface Modification of Ti6Al4V Alloy by Two Process: Immersion Ion Implantation and Plasma Jet

Journal of Metastable and Nanocrystalline Materials, 2004-07, Vol.20-21, p.213-218

2004

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Mechanisms of surface roughness induced in silicon by fluorine containing plasmas

Vacuum, 1997-09, Vol.48 (7), p.677-679

1997

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SixCy Thin Films Deposited at Low Temperature by DC Dual Magnetron Sputtering: Effect of Power Supplied to Si and C Cathode Targets on Film Physicochemical Properties

Materials science forum, 2012, Vol.717-720, p.197-201

2012

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Morphological and Chemical Analysis of Silicon Etched by SF 6 +O 2 and CF 4 +O 2 Low Pressure Constricted Plasma Jet

ECS transactions, 2011-09, Vol.39 (1), p.409-416

2011

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Studies about Flow Rate Effect on Atomic Fluorine Generation in Inductively Coupled CF 4 Plasmas: A Global Model Investigation

ECS transactions, 2010-10, Vol.31 (1), p.125-134

2010

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Optical Diagnostics of SF 6 Low Pressure Plasma Jet Applied to Silicon Etching

ECS transactions, 2009-09, Vol.23 (1), p.181-189

2009

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Reactive ion etching of PECVD silicon nitride in SF6 plasma

Journal of nuclear materials, 1993-05, Vol.200 (3), p.371-374

1993

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Basic Characteristics of Gliding-Arc Discharges in Air and Natural Gas

Tar Reforming under a Microwave Plasma Torch

Flexible camphor diamond-like carbon coating on polyurethane to prevent Candida albicans biofilm growth

Nitrogen doping of SiC thin films deposited by RF magnetron sputtering

Comparison of the Ablation Mechanism of C/C-SiC Composite under Atmospheric and Low Pressure

Formation of electrostatic double-layers and electron-holes in a low pressure mercury plasma column

Mixed LTCC and LTTT Technology for Microplasma Generator Fabrication

Similarity Relations of Power-Voltage Characteristics for Tornado Gliding Arc in Plasma-Assisted Combustion Processes

Physics and Biology: Bio-plasma physics

Atomic layer deposition of TiO2 thin films on electrospun poly (butylene adipate-co-terephthalate) fibers: Freestanding TiO2 nanostructures via polymer carbonization

Evaluation of Ion Flux in Ar and SF6 Asymmetric Capacitive Coupled Plasmas Through Invasive and Non-Invasive Methods

Plasma-Enhanced Atomic Layer Deposition Of Al2O3 Thin Film On Tio2 Nanotubes

Effect of Storage Temperature on pH and Conductivity of Reverse Osmosis Water Treated with Atmospheric Plasma

Approximation of Physical Properties of Steam and Other Arc Plasmas for Anisotropic Model Concerning Gasification Processes

Surfatron-Produced Atmospheric-Pressure Plasma Jet Applied to Candida Biofilms

Tar Reforming under a Microwave Plasma Torch

Generalization of the Total Current-Voltage Characteristics for Transferred Arc Plasma Torch With Steam and Air Plasmas Based on the Analytical Anisotropic Model

Investigations of capacitively-coupled plasmas by electrostatic probe technique

Surface Modification of Ti6Al4V Alloy by Two Process: Immersion Ion Implantation and Plasma Jet

Mechanisms of surface roughness induced in silicon by fluorine containing plasmas

SixCy Thin Films Deposited at Low Temperature by DC Dual Magnetron Sputtering: Effect of Power Supplied to Si and C Cathode Targets on Film Physicochemical Properties

Morphological and Chemical Analysis of Silicon Etched by SF 6 +O 2 and CF 4 +O 2 Low Pressure Constricted Plasma Jet

Studies about Flow Rate Effect on Atomic Fluorine Generation in Inductively Coupled CF 4 Plasmas: A Global Model Investigation

Optical Diagnostics of SF 6 Low Pressure Plasma Jet Applied to Silicon Etching

Reactive ion etching of PECVD silicon nitride in SF6 plasma

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