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Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light

Optics letters, 2006-05, Vol.31 (9), p.1214

2006

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Integration of Scanning Probes and Ion Beams

Nano letters, 2005-06, Vol.5 (6), p.1087-1091

2005

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Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process

Applied physics letters, 2003-02, Vol.82 (8), p.1152-1154

2003

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Electrical activation and electron spin coherence of ultralow dose antimony implants in silicon

Applied physics letters, 2006-03, Vol.88 (11), p.112101-112101-3

2006

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Parallel Fabrication of Sub-50-nm Uniformly Sized Nanoparticles by Deposition through a Patterned Silicon Nitride Nanostencil

Nano letters, 2005-06, Vol.5 (6), p.1129-1134

2005

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Metal-Induced Assembly of a Semiconductor Island Lattice: Ge Truncated Pyramids on Au-Patterned Si

Nano letters, 2005-10, Vol.5 (10), p.2070-2073

2005

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Nanoimaging with a compact extreme-ultraviolet laser

Optics letters, 2005-08, Vol.30 (16), p.2095

2005

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Chemical Nanomachining of Silicon by Gold-Catalyzed Oxidation

Nano letters, 2007-07, Vol.7 (7), p.2009-2013

2007

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Optical tracking of nanoscale particles in microscale environments

Applied physics reviews, 2016-03, Vol.3 (1)

2016

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Sculpting semiconductor heteroepitaxial islands: from dots to rods

Physical review letters, 2007-03, Vol.98 (10), p.106102-106102, Article 106102

2007

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Research Update: Electron beam-based metrology after CMOS

APL materials, 2018-07, Vol.6 (7), p.070701-070701-14

2018

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Electron beam-based metrology after CMOS

APL materials, 2018, Vol.6

2018

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Advancing the ion beam thin film planarization process for the smoothing of substrate particles

Microelectronic engineering, 2005-04, Vol.77 (3), p.369-381

2005

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A silicon-based, sequential coat-and-etch process to fabricate nearly perfect substrate surfaces

Journal of nanoscience and nanotechnology, 2006-01, Vol.6 (1), p.28-35

2006

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Strategies for integration of donor electron spin qubits in silicon

Microelectronic engineering, 2006-04, Vol.83 (4), p.1814-1817

2006

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One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography

Applied physics. A, Materials science & processing, 2005-03, Vol.80 (6), p.1173-1178

2005

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Morphological evolution of Ge islands on Au-patterned Si

Journal of crystal growth, 2006-01, Vol.287 (2), p.518-521

2006

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Solid state quantum computer development in silicon with single ion implantation

Journal of applied physics, 2003-12, Vol.94 (11), p.7017-7024

2003

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10-nm channel length pentacene transistors

IEEE transactions on electron devices, 2005-08, Vol.52 (8), p.1874-1879

2005

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Sub-pixel alignment for direct-write electron beam lithography

Microelectronic engineering, 2004-06, Vol.73-74, p.74-79

2004

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Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser

Optics express, 2005-05, Vol.13 (11), p.3983-3988

2005

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Shot noise models for sequential processes and the role of lateral mixing

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2006-07, Vol.24 (4), p.1902-1908