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Fatigue behavior of a wrought Al0.5CoCrCuFeNi two-phase high-entropy alloy

Acta materialia, 2015-10, Vol.99 (C), p.247-258

2015

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The Community Firn Model (CFM) v1.0

Geoscientific Model Development, 2020-09, Vol.13 (9), p.4355-4377

2020

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A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons

Plasma sources science & technology, 2017-11, Vol.26 (12), p.125003

2017

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Gut microbiome and innate immune response patterns in IgE-associated eczema

Clinical and experimental allergy, 2015-09, Vol.45 (9), p.1419-1429

2015

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High power impulse magnetron sputtering discharge

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-05, Vol.30 (3), p.030801-030801-35

2012

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Particle-balance models for pulsed sputtering magnetrons

Journal of physics. D, Applied physics, 2017-09, Vol.50 (35), p.354003

2017

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A multi-barrier osmotic dilution process for simultaneous desalination and purification of impaired water

Journal of membrane science, 2010-10, Vol.362 (1), p.417-426

2010

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Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Journal of physics. D, Applied physics, 2022-01, Vol.55 (1), p.15202

2022

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Spokes and charged particle transport in HiPIMS magnetrons

Journal of physics. D, Applied physics, 2013-02, Vol.46 (8), p.84005-1-10

2013

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A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region model

Journal of applied physics, 2017-05, Vol.121 (17)

2017

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An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Plasma sources science & technology, 2016-10, Vol.25 (6)

2016

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Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction

Plasma sources science & technology, 2023-12, Vol.32 (12), p.125006

2023

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Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

Journal of physics. D, Applied physics, 2016-01, Vol.49 (6), p.65202-65209

2016

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Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS

Plasma sources science & technology, 2023-07, Vol.32 (7), p.75019

2023

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Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures

Journal of applied physics, 2017-05, Vol.121 (17)

2017

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An ionization region model of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

Plasma sources science & technology, 2016-12, Vol.25 (6), p.65004

2016

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Argon metastables in HiPIMS: validation of the ionization region model by direct comparison to time resolved tunable diode-laser diagnostics

Plasma sources science & technology, 2015-08, Vol.24 (4), p.45011-21

2015

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Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Surface & coatings technology, 2014-09, Vol.255, p.52-61

2014

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Genomic and Seasonal Variations among Aquatic Phages Infecting the Baltic Sea Gammaproteobacterium Rheinheimera sp. Strain BAL341

Applied and environmental microbiology, 2019-09, Vol.85 (18), p.1

2019

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Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Plasma sources science & technology, 2012-04, Vol.21 (2), p.25005-1-9

2012

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Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges

Plasma sources science & technology, 2023-07, Vol.32 (7), p.75016

2023

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Modeling of high power impulse magnetron sputtering discharges with graphite target

Plasma sources science & technology, 2021-11, Vol.30 (11), p.115017

2021

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Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering

Surface & coatings technology, 2019-06, Vol.368, p.88-96

2019

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Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics

Plasma sources science & technology, 2012-04, Vol.21 (2), p.25010-1-11

2012

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Alfvén's critical ionization velocity observed in high power impulse magnetron sputtering discharges

Physics of plasmas, 2012-09, Vol.19 (9), p.093505

2012

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Fatigue behavior of a wrought Al0.5CoCrCuFeNi two-phase high-entropy alloy

The Community Firn Model (CFM) v1.0

A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons

Gut microbiome and innate immune response patterns in IgE-associated eczema

High power impulse magnetron sputtering discharge

Particle-balance models for pulsed sputtering magnetrons

A multi-barrier osmotic dilution process for simultaneous desalination and purification of impaired water

Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Spokes and charged particle transport in HiPIMS magnetrons

A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region model

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction

Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride

Temporal, spatial and spectroscopic study of plasma emission on Cu target in bipolar HiPIMS

Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures

An ionization region model of the reactive Ar/O 2 high power impulse magnetron sputtering discharge

Argon metastables in HiPIMS: validation of the ionization region model by direct comparison to time resolved tunable diode-laser diagnostics

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Genomic and Seasonal Variations among Aquatic Phages Infecting the Baltic Sea Gammaproteobacterium Rheinheimera sp. Strain BAL341

Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges

Modeling of high power impulse magnetron sputtering discharges with graphite target

Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering

Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics

Alfvén's critical ionization velocity observed in high power impulse magnetron sputtering discharges

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