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Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review

Thin solid films, 2016-01, Vol.598, p.315-334

2016

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Reinforcing ionic conductivity and alleviating dendrite propagation of dense cubic Ga0.3Li6.1La3Zr2O12via two-step sintering

Journal of materials chemistry. A, Materials for energy and sustainability, 2023-10, Vol.11 (38), p.20408-20422

2023

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Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma

Journal of materials chemistry. C, Materials for optical and electronic devices, 2020, Vol.8 (5), p.1846-1851

2020

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Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas

Nanotechnology, 2020-04, Vol.31 (26)

2020

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Tailoring the grain boundary structure and chemistry of the dendrite-free garnet solid electrolyte Li6.1Ga0.3La3Zr2O12

NPG Asia materials, 2024-08, Vol.16 (1), p.42-12, Article 42

2024

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Changes in thickness of central macula and retinal nerve fibre layer in severe hypertensive retinopathy: a 1‐year longitudinal study

Acta ophthalmologica (Oxford, England), 2018-05, Vol.96 (3), p.e386-e392

2018

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A technique for prediction of SPEs from solar radio flux by statistical analysis, ANN and GA

Astrophysics and space science, 2018-08, Vol.363 (8), p.1-10, Article 170

2018

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Self-Assembled Layer (SAL)-Based Doping on Black Phosphorus (BP) Transistor and Photodetector

ACS photonics, 2017-07, Vol.4 (7), p.1822-1830

2017

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Electrical and ionic conductivity of Li2O-B2O3-Al2O3 glass electrolyte for solid-state batteries

Journal of energy storage, 2024-01, Vol.77, p.110018, Article 110018

2024

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Enhanced C-rate capability and long-term cycling behavior of LiFePO4/C-BaTiO3 composite cathode

Journal of energy storage, 2024-06, Vol.90, p.111915, Article 111915

2024

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Properties of an Internal U-Shaped Inductively Coupled Plasma Source Operated by Superimposed Dual Frequency

IEEE transactions on plasma science, 2018-09, Vol.46 (9), p.3159-3164

2018

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Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Journal of physics. D, Applied physics, 2013-06, Vol.46 (23), p.235203

2013

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Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam

Journal of nanoscience and nanotechnology, 2016-11, Vol.16 (11), p.11823-11830

2016

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Synergetic effects in a discharge produced by a dual frequency-dual antenna large-area ICP source

Plasma sources science & technology, 2012-06, Vol.21 (3), p.35018-1-5

2012

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Anisotropic/Isotropic Atomic Layer Etching of Metals

Applied Science and Convergence Technology, 2020-05, Vol.29 (3), p.41-49

2020

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An investigation of the temporal evolution of plasma potential in a 60 MHz/2 MHz pulsed dual-frequency capacitively coupled discharge

Plasma sources science & technology, 2012-10, Vol.21 (5), p.55006

2012

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Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas

Jpn J Appl Phys, 2013-05, Vol.52 (5), p.05EB03-05EB03-6

2013

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Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Japanese Journal of Applied Physics, 2013-05, Vol.52 (5), p.05EA02-05EA02-5

2013

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Etching characteristics of multiple U-type internal linear inductively coupled plasma for flat panel display

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.780-783

2005

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대기압 플라즈마를 이용한 산화물 박막 트랜지스터 표면처리에 관한 연구

한국표면공학회지, 2015, 48(1), , pp.7-10

2015

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상압 플라즈마를 이용한 무기박막의 화학기상 증착법에 대한 연구동향

한국표면공학회지, 2015, 48(5), , pp.245-252

2015

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Line-type inductively coupled plasma source with ferromagnetic module

Journal of physics. D, Applied physics, 2009-01, Vol.42 (1), p.015204-015204 (5)

2009

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Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System

IEEE transactions on plasma science, 2010-02, Vol.38 (2), p.133-136

2010

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Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications

Japanese Journal of Applied Physics, 2005-11, Vol.44 (11R), p.8133

2005

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Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing

Japanese Journal of Applied Physics, 2004-07, Vol.43 (7R), p.4373-4375

2004

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Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review

Reinforcing ionic conductivity and alleviating dendrite propagation of dense cubic Ga0.3Li6.1La3Zr2O12via two-step sintering

Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma

Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas

Tailoring the grain boundary structure and chemistry of the dendrite-free garnet solid electrolyte Li6.1Ga0.3La3Zr2O12

Changes in thickness of central macula and retinal nerve fibre layer in severe hypertensive retinopathy: a 1‐year longitudinal study

A technique for prediction of SPEs from solar radio flux by statistical analysis, ANN and GA

Self-Assembled Layer (SAL)-Based Doping on Black Phosphorus (BP) Transistor and Photodetector

Electrical and ionic conductivity of Li2O-B2O3-Al2O3 glass electrolyte for solid-state batteries

Enhanced C-rate capability and long-term cycling behavior of LiFePO4/C-BaTiO3 composite cathode

Properties of an Internal U-Shaped Inductively Coupled Plasma Source Operated by Superimposed Dual Frequency

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam

Synergetic effects in a discharge produced by a dual frequency-dual antenna large-area ICP source

Anisotropic/Isotropic Atomic Layer Etching of Metals

An investigation of the temporal evolution of plasma potential in a 60 MHz/2 MHz pulsed dual-frequency capacitively coupled discharge

Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas

Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Etching characteristics of multiple U-type internal linear inductively coupled plasma for flat panel display

대기압 플라즈마를 이용한 산화물 박막 트랜지스터 표면처리에 관한 연구

상압 플라즈마를 이용한 무기박막의 화학기상 증착법에 대한 연구동향

Line-type inductively coupled plasma source with ferromagnetic module

Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System

Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications

Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing

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