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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (μc-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

Thin solid films, 2001-09, Vol.395 (1-2), p.206-212

2001

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Influence of silane flow on structural, optical and electrical properties of a-Si:H thin films deposited by hot wire chemical vapor deposition (HW-CVD) technique

Solar energy materials and solar cells, 2002-02, Vol.71 (2), p.153-167

2002

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Narrow band gap, high photosensitivity a-SiGe:H films prepared by hot wire chemical vapor deposition (HW-CVD) method

Materials letters, 2002-02, Vol.52 (6), p.399-403

2002

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Formation of diamond particulates by pulsed ruby laser irradiation of graphite immersed in benzene

Solid state communications, 1992-10, Vol.84 (4), p.371-373

1992

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Raman, photoluminescence and morphological studies of Si- and N-doped diamond films grown on Si(100) substrate by hot-filament chemical vapor deposition technique

Diamond and related materials, 2002, Vol.11 (1), p.75-86

2002

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Raman scattering and short range order in amorphous germanium

Solid state communications, 1985-03, Vol.53 (11), p.939-942

1985

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Properties of diamond films grown from CH 4CF 4H 2 gas mixture using the hot-filament chemical vapor deposition technique

Thin solid films, 2002, Vol.422 (1), p.20-27

2002

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Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (μc-Si:H) by a hot-wire chemical vapor deposition (HWCVD) technique

Solar energy materials and solar cells, 2000, Vol.64 (4), p.333-346

2000

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Influence of process pressure on HW-CVD deposited a-Si:H films

Solar energy materials and solar cells, 2005-01, Vol.85 (3), p.301-312

2005

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Gradual transitions in morphology of diamond films grown by using N 2 admixtures of CH 4+H 2 gas in a hot filament assisted chemical vapour deposition system

Diamond and related materials, 2005, Vol.14 (2), p.232-242

2005

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Properties of diamond films grown from CH4CF4H2 gas mixture using the hot-filament chemical vapor deposition technique

Thin solid films, 2002-12, Vol.422 (1-2), p.20-27

2002

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Raman scattering studies of amorphous Si x Ge 1− x :H alloy films produced by hot-filament assisted chemical vapour deposition technique

Thin solid films, 1997, Vol.302 (1), p.102-107

1997

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Gradual transitions in morphology of diamond films grown by using N2 admixtures of CH4+H2 gas in a hot filament assisted chemical vapour deposition system

Diamond and related materials, 2005-02, Vol.14 (2), p.232-242

2005

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Ion implantation effects in laser-deposited amorphous carbon films

Thin solid films, 1990-12, Vol.193, p.588-594

1990

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The effect of substrate temperature on HW-CVD deposited a-SiGe:H films

Journal of non-crystalline solids, 2002-04, Vol.299, p.168-173

2002

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Effect of chamber pressure on p-type μc-SiC:H thin films prepared by photo-CVD

Thin solid films, 1997-02, Vol.295 (1), p.37-42

1997

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Anomalous low-temperature Raman scattering in a –Si 1− x H x

Journal of materials research, 1995-06, Vol.10 (6), p.1362-1370

1995

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Effect of coupling of radio-frequency plasma on the growth of diamond films in a hot filament reactor

Thin solid films, 1998-06, Vol.322 (1), p.167-176

1998

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Hot plasma box glow discharge deposition of a-Si 1− x:C x:H alloys

Materials letters, 1991, Vol.11 (10), p.348-351

1991

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Low-pressure chemical vapour deposition of diamond films in a radio-frequency-plasma-assisted hot-filament reactor

Diamond and related materials, 1998-10, Vol.7 (10), p.1526-1533

1998

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Comparative study of properties of a-Si:H films produced by hot-filament CVD, glow discharge CVD and their hybrid version

Thin solid films, 1996-09, Vol.283 (1), p.49-56

1996

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Raman scattering studies of amorphous SixGe1−x:H alloy films produced by hot-filament assisted chemical vapour deposition technique

Thin solid films, 1997-06, Vol.302 (1-2), p.102-107

1997

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Role of surface features in CVD diamond nucleation on surface-pretreated substrates

Materials letters, 1998, Vol.34 (3), p.387-391

1998

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Enhancement of nucleation and growth of diamond films using In–Sn–O buffer layer on Si substrate

Materials letters, 1999-04, Vol.39 (2), p.86-90

1999

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Crystallographic studies of some mixed manganite spinels

The Journal of physics and chemistry of solids, 1967-01, Vol.28 (8), p.1493-1499

1967

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon (μc-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

Influence of silane flow on structural, optical and electrical properties of a-Si:H thin films deposited by hot wire chemical vapor deposition (HW-CVD) technique

Narrow band gap, high photosensitivity a-SiGe:H films prepared by hot wire chemical vapor deposition (HW-CVD) method

Formation of diamond particulates by pulsed ruby laser irradiation of graphite immersed in benzene

Raman, photoluminescence and morphological studies of Si- and N-doped diamond films grown on Si(100) substrate by hot-filament chemical vapor deposition technique

Raman scattering and short range order in amorphous germanium

Properties of diamond films grown from CH 4CF 4H 2 gas mixture using the hot-filament chemical vapor deposition technique

Synthesis of highly conductive boron-doped p-type hydrogenated microcrystalline silicon (μc-Si:H) by a hot-wire chemical vapor deposition (HWCVD) technique

Influence of process pressure on HW-CVD deposited a-Si:H films

Gradual transitions in morphology of diamond films grown by using N 2 admixtures of CH 4+H 2 gas in a hot filament assisted chemical vapour deposition system

Properties of diamond films grown from CH4CF4H2 gas mixture using the hot-filament chemical vapor deposition technique

Raman scattering studies of amorphous Si x Ge 1− x :H alloy films produced by hot-filament assisted chemical vapour deposition technique

Gradual transitions in morphology of diamond films grown by using N2 admixtures of CH4+H2 gas in a hot filament assisted chemical vapour deposition system

Ion implantation effects in laser-deposited amorphous carbon films

The effect of substrate temperature on HW-CVD deposited a-SiGe:H films

Effect of chamber pressure on p-type μc-SiC:H thin films prepared by photo-CVD

Anomalous low-temperature Raman scattering in a –Si 1− x H x

Effect of coupling of radio-frequency plasma on the growth of diamond films in a hot filament reactor

Hot plasma box glow discharge deposition of a-Si 1− x:C x:H alloys

Low-pressure chemical vapour deposition of diamond films in a radio-frequency-plasma-assisted hot-filament reactor

Comparative study of properties of a-Si:H films produced by hot-filament CVD, glow discharge CVD and their hybrid version

Raman scattering studies of amorphous SixGe1−x:H alloy films produced by hot-filament assisted chemical vapour deposition technique

Role of surface features in CVD diamond nucleation on surface-pretreated substrates

Enhancement of nucleation and growth of diamond films using In–Sn–O buffer layer on Si substrate

Crystallographic studies of some mixed manganite spinels

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