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Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

Japanese Journal of Applied Physics, 2022-10, Vol.61 (10), p.106502

Kozawa, Takahiro

2022

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Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics, 2022-11, Vol.61 (11), p.116501

Kozawa, Takahiro

2022

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Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

Japanese Journal of Applied Physics, 2023-01, Vol.62 (1), p.16509

Kozawa, Takahiro

2023

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Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics, 2022-01, Vol.61 (1), p.16501

Kozawa, Takahiro

2022

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Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography

Journal of Photopolymer Science and Technology, 2024/05/31, Vol.37(1), pp.129-134

Kozawa, Takahiro

2024

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Combined wet milling and heat treatment in water vapor for producing amorphous to crystalline ultrafine Li1.3Al0.3Ti1.7(PO4)3 solid electrolyte particles

RSC advances, 2021-01, Vol.11 (24), p.14796-14804

Kozawa, Takahiro

2021

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Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography

Japanese Journal of Applied Physics, 2019-09, Vol.58 (9), p.96502

Kozawa, Takahiro

2019

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Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

Japanese Journal of Applied Physics, 2015-01, Vol.54 (1), p.16502-1-016502-7

Kozawa, Takahiro

2015

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Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation

Japanese Journal of Applied Physics, 2012-08, Vol.51 (8), p.086504-086504-6

Kozawa, Takahiro

2012

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Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist

Japanese Journal of Applied Physics, 2018-12, Vol.57 (12), p.126502

Kozawa, Takahiro

2018

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Radiation Chemistry in Chemically Amplified Resists

Japanese Journal of Applied Physics, 2010-03, Vol.49 (3), p.030001-030001-19

Kozawa, Takahiro

2010

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Resist Materials and Processes for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2013-01, Vol.52 (1), p.010002-010002-14

2013

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Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

Japanese Journal of Applied Physics, 2022-01, Vol.61 (1), p.16502

2022

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Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography

Japanese Journal of Applied Physics, 2021-06, Vol.60 (SC), p.SCCC02

2021

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Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

Japanese Journal of Applied Physics, 2015-12, Vol.54 (12), p.126501

Kozawa, Takahiro

2015

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Formation of intramolecular dimer radical ions of diphenyl sulfones

Scientific reports, 2020-11, Vol.10 (1), p.19823-19823, Article 19823

2020

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Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication

Japanese Journal of Applied Physics, 2021-12, Vol.60 (12), p.126504

2021

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Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization

Japanese Journal of Applied Physics, 2022-06, Vol.61 (6), p.66504

2022

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Carbon nanoparticle-entrapped macroporous Mn3O4 microsphere anodes with improved cycling stability for Li-ion batteries

Scientific reports, 2022-07, Vol.12 (1), p.11992-11992, Article 11992

2022

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Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning

Japanese Journal of Applied Physics, 2022-05, Vol.61 (5), p.56505

2022

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Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication

Japanese Journal of Applied Physics, 2021-08, Vol.60 (8), p.86503

2021

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Macroporous Mn3O4 microspheres as a conversion-type anode material morphology for Li-ion batteries

Journal of solid state electrochemistry, 2020-06, Vol.24 (6), p.1283-1290

2020

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Preparation of Macroporous Mn3O4 Microspheres via Thermal Decomposition in Water Vapor

ChemistrySelect (Weinheim), 2018-02, Vol.3 (5), p.1419-1423

Kozawa, Takahiro

2018

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Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists

Japanese Journal of Applied Physics, 2012-06, Vol.51 (6), p.06FC01-06FC01-5

Kozawa, Takahiro

2012

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Estimation of electron affinity of photoacid generators: density functional theory calculations using static and dynamic models

Japanese Journal of Applied Physics, 2021-06, Vol.60 (SC), p.SCCC03

2021

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Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography

Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists

Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography

Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists

Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography

Combined wet milling and heat treatment in water vapor for producing amorphous to crystalline ultrafine Li1.3Al0.3Ti1.7(PO4)3 solid electrolyte particles

Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography

Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography

Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation

Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist

Radiation Chemistry in Chemically Amplified Resists

Resist Materials and Processes for Extreme Ultraviolet Lithography

Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography

Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists

Formation of intramolecular dimer radical ions of diphenyl sulfones

Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication

Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization

Carbon nanoparticle-entrapped macroporous Mn3O4 microsphere anodes with improved cycling stability for Li-ion batteries

Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning

Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication

Macroporous Mn3O4 microspheres as a conversion-type anode material morphology for Li-ion batteries

Preparation of Macroporous Mn3O4 Microspheres via Thermal Decomposition in Water Vapor

Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists

Estimation of electron affinity of photoacid generators: density functional theory calculations using static and dynamic models

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