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Laser Induced Dielectric Breakdown as a Novel Method for the Synthesis of Molybdenum Boride

Plasma chemistry and plasma processing, 2022-03, Vol.42 (2), p.395-412

2022

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A Semilattice of Degrees of Computable Metrics

Siberian mathematical journal, 2021-09, Vol.62 (5), p.822-841

Kornev, R. A.

2021

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Computable Reducibility of Metrics on the Reals

Algebra and logic, 2022-03, Vol.61 (1), p.71-78

Kornev, R. A.

2022

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Reducibility of Computable Metrics on the Real Line

Algebra and logic, 2017-09, Vol.56 (4), p.302-317

Kornev, R. A.

2017

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Equilibrium calculations for plasmas of volatile halides of III, IV and VI group elements mixed with H2 and H2 + CX4 (X = H, Cl, F) relevant to PECVD of isotopic materials

Journal of radioanalytical and nuclear chemistry, 2020-10, Vol.326 (1), p.407-421

2020

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Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge

Plasma chemistry and plasma processing, 2017-07, Vol.37 (4), p.997-1008

2017

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Modeling of Thermogasdynamics and Thermal Processes of Volatile Halides of Elements of III, IV and VI Groups in Thermal Plasma of RF-IC Discharge at Atmospheric Pressure

Plasma chemistry and plasma processing, 2022-11, Vol.42 (6), p.1381-1403

2022

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Hydrogen Reduction of MoF6 and Molybdenum Carbide Formation in RF Inductively Coupled Low-Pressure Discharge: Experiment and Equilibrium Thermodynamics Consideration

Plasma chemistry and plasma processing, 2021-03, Vol.41 (2), p.673-690

2021

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Laser induced dielectric breakdown in reactive mixture SiF4 + H2

Spectrochimica acta. Part B: Atomic spectroscopy, 2021-05, Vol.179, p.106099, Article 106099

2021

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Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3

Plasma chemistry and plasma processing, 2020-09, Vol.40 (5), p.1145-1162

2020

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Stand for Experimentally Studying Local Parameters of Chemically Active Induction Discharge Plasma

Instruments and experimental techniques (New York), 2022, Vol.65 (3), p.419-425

2022

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Plasma-enhanced CVD preparation of isotopes of group IV and VI elements

Journal of physics. Conference series, 2016-03, Vol.700 (1), p.12042

2016

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Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3

Plasma chemistry and plasma processing, 2020, Vol.40 (6), p.1639-1640

2020

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Simulation of Gas-Dynamic and Thermal Processes in Vortex-Stabilized, Inductively Coupled Argon–Hydrogen Plasma

High energy chemistry, 2018-09, Vol.52 (5), p.423-428

2018

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Microwave Interferometry of Chemically Active Plasma of RF Discharge in Mixtures Based on Fluorides of Silicon and Germanium

Plasma chemistry and plasma processing, 2017-11, Vol.37 (6), p.1655-1661

2017

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Punctual Dimension of Algebraic Structures in Certain Classes

Lobachevskii journal of mathematics, 2021-04, Vol.42 (4), p.716-725

2021

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Laser induced dielectric breakdown for synthesis of chlorofluorosilanes

Journal of fluorine chemistry, 2021-01, Vol.241, p.109692, Article 109692

2021

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Reduction of Boron Trichloride in Atmospheric-Pressure Argon–Hydrogen Radiofrequency Induction Plasma

High energy chemistry, 2019-05, Vol.53 (3), p.246-253

2019

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Effect of Gas Dynamic Conditions in Plasma Reactor on Efficiency of Boron and Silicon Synthesis in Inductively Coupled Argon–Hydrogen Plasma

High energy chemistry, 2019-11, Vol.53 (6), p.482-489

2019

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Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides

Theoretical foundations of chemical engineering, 2020-07, Vol.54 (4), p.631-640

2020

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Catalytic effects of electrode material on the silicon tetrachloride hydrogenation in RF-arc-discharge

RSC advances, 2016-01, Vol.6 (12), p.99816-99824

2016

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Comparative Study of Gas-Dynamic Processes in Inductively Coupled Argon–Hydrogen Plasma Containing Boron Trichloride and Boron Trifluoride

High energy chemistry, 2019-03, Vol.53 (2), p.155-161

2019

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Feasibility study of the production of bulk stable Ge isotopes by the hydrogen plasma chemical reduction of fluorides

Materials science & engineering. B, Solid-state materials for advanced technology, 2019-05, Vol.244, p.1-5

2019

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Gas-dynamic and thermal processes in a high-frequency induction plasma torch with tangential stabilization of the gas flow

Theoretical foundations of chemical engineering, 2017-09, Vol.51 (5), p.736-741

2017

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Features of germanium tetrafluoride reduction with hydrogen in inductively and capacitively coupled radiofrequency discharges

High energy chemistry, 2017, Vol.51 (1), p.56-59

2017

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Laser Induced Dielectric Breakdown as a Novel Method for the Synthesis of Molybdenum Boride

A Semilattice of Degrees of Computable Metrics

Computable Reducibility of Metrics on the Reals

Reducibility of Computable Metrics on the Real Line

Equilibrium calculations for plasmas of volatile halides of III, IV and VI group elements mixed with H2 and H2 + CX4 (X = H, Cl, F) relevant to PECVD of isotopic materials

Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge

Modeling of Thermogasdynamics and Thermal Processes of Volatile Halides of Elements of III, IV and VI Groups in Thermal Plasma of RF-IC Discharge at Atmospheric Pressure

Hydrogen Reduction of MoF6 and Molybdenum Carbide Formation in RF Inductively Coupled Low-Pressure Discharge: Experiment and Equilibrium Thermodynamics Consideration

Laser induced dielectric breakdown in reactive mixture SiF4 + H2

Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3

Stand for Experimentally Studying Local Parameters of Chemically Active Induction Discharge Plasma

Plasma-enhanced CVD preparation of isotopes of group IV and VI elements

Correction to: Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3

Simulation of Gas-Dynamic and Thermal Processes in Vortex-Stabilized, Inductively Coupled Argon–Hydrogen Plasma

Microwave Interferometry of Chemically Active Plasma of RF Discharge in Mixtures Based on Fluorides of Silicon and Germanium

Punctual Dimension of Algebraic Structures in Certain Classes

Laser induced dielectric breakdown for synthesis of chlorofluorosilanes

Reduction of Boron Trichloride in Atmospheric-Pressure Argon–Hydrogen Radiofrequency Induction Plasma

Effect of Gas Dynamic Conditions in Plasma Reactor on Efficiency of Boron and Silicon Synthesis in Inductively Coupled Argon–Hydrogen Plasma

Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides

Catalytic effects of electrode material on the silicon tetrachloride hydrogenation in RF-arc-discharge

Comparative Study of Gas-Dynamic Processes in Inductively Coupled Argon–Hydrogen Plasma Containing Boron Trichloride and Boron Trifluoride

Feasibility study of the production of bulk stable Ge isotopes by the hydrogen plasma chemical reduction of fluorides

Gas-dynamic and thermal processes in a high-frequency induction plasma torch with tangential stabilization of the gas flow

Features of germanium tetrafluoride reduction with hydrogen in inductively and capacitively coupled radiofrequency discharges

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