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High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

Surface & coatings technology, 2010, Vol.204 (11), p.1661-1684

2010

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Target heating and plasma dynamics during hot magnetron sputtering of Nb

Journal of physics. D, Applied physics, 2022-08, Vol.55 (34), p.345202

2022

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Ion formation in thermionic-emission-assisted hot magnetron sputtering discharge

Plasma sources science & technology, 2023-08, Vol.32 (8), p.8

2023

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VO2 nanostripe-based thin film with optimized color and solar characteristics for smart windows

Journal of applied physics, 2021-05, Vol.129 (18)

2021

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Insights on film growth conditions on a floating substrate during reactive Ar/O 2 bipolar high power impulse magnetron sputter deposition

Journal of physics. D, Applied physics, 2023-02, Vol.56 (7), p.75202

2023

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Sputtering process in the presence of plasma self-organization

Applied physics letters, 2017-01, Vol.110 (1)

2017

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Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition

Journal of physics. D, Applied physics, 2023-02, Vol.56 (7)

2023

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Energy flux measurements during magnetron sputter deposition processes

Surface & coatings technology, 2019-11, Vol.377, p.124887, Article 124887

2019

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Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Thin solid films, 2006-11, Vol.515 (3), p.1182-1186

2006

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Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition

Journal of physics. D, Applied physics, 2021-04, Vol.54 (15)

2021

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Extracellular bacterial inactivation proceeding without Cu-ion release: Drastic effects of the applied plasma energy on the performance of the Cu-polyester (PES) samples

Applied catalysis. B, Environmental, 2018-12, Vol.239, p.245-253

2018

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Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Surface & coatings technology, 2021-07, Vol.418, p.127235, Article 127235

2021

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Characterization of the nanoparticle suspension by operando absorption spectrophotometry during sputtering onto liquids

Instrumentation science & technology, 2024-03, Vol.52 (2), p.125-137

2024

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On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films

Journal of physics. D, Applied physics, 2021-10, Vol.54 (41)

2021

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MYRIAD: a new N-body code for simulations of star clusters

Astronomy and astrophysics (Berlin), 2010-11, Vol.522, p.A70

2010

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Measuring the energy flux at the substrate position during magnetron sputter deposition processes

Journal of applied physics, 2013-01, Vol.113 (1)

2013

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Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges

Journal of applied physics, 2006-01, Vol.99 (1), p.013307-013307-5

2006

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Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

Journal of applied physics, 2008-10, Vol.104 (8), p.083305-083305-8

2008

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Midwifery students' perspectives of physical and virtual mobility activities including preferences for e-learning: A cross-sectional survey

Nurse education today, 2022-02, Vol.109, p.105214-105214, Article 105214

2022

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Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Journal of physics. D, Applied physics, 2011-03, Vol.44 (11), p.115201

2011

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IR emission from the target during plasma magnetron sputter deposition

Thin solid films, 2013-10, Vol.545, p.44-49

2013

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Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Surface & coatings technology, 2014-09, Vol.254 (2014), p.291-297

2014

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Effect of the thickness of reactively sputtered WO3 submicron thin films used for NO2 detection

Sensors and actuators. B, Chemical, 2012-08, Vol.171-172, p.18-24

2012

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Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes

Surface & coatings technology, 2012-04, Vol.206 (16), p.3542-3549

2012

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Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy

Journal of applied physics, 2004-03, Vol.95 (5), p.2900-2905

2004

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High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

Target heating and plasma dynamics during hot magnetron sputtering of Nb

Ion formation in thermionic-emission-assisted hot magnetron sputtering discharge

VO2 nanostripe-based thin film with optimized color and solar characteristics for smart windows

Insights on film growth conditions on a floating substrate during reactive Ar/O 2 bipolar high power impulse magnetron sputter deposition

Sputtering process in the presence of plasma self-organization

Insights on film growth conditions on a floating substrate during reactive Ar/O2 bipolar high power impulse magnetron sputter deposition

Energy flux measurements during magnetron sputter deposition processes

Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental deposition

Extracellular bacterial inactivation proceeding without Cu-ion release: Drastic effects of the applied plasma energy on the performance of the Cu-polyester (PES) samples

Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Characterization of the nanoparticle suspension by operando absorption spectrophotometry during sputtering onto liquids

On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin films

MYRIAD: a new N-body code for simulations of star clusters

Measuring the energy flux at the substrate position during magnetron sputter deposition processes

Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges

Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

Midwifery students' perspectives of physical and virtual mobility activities including preferences for e-learning: A cross-sectional survey

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

IR emission from the target during plasma magnetron sputter deposition

Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Effect of the thickness of reactively sputtered WO3 submicron thin films used for NO2 detection

Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes

Measurement of ionic and neutral densities in amplified magnetron discharges by pulsed absorption spectroscopy

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