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Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Chemistry of materials, 1991-05, Vol.3 (3), p.462-471

1991

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Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

Chemistry of materials, 1994-03, Vol.6 (3), p.287-294

1994

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The role of molecular defects on the structure and phase transitions of poly(vinylidene fluoride)

Polymer (Guildford), 1987, Vol.28 (4), p.617-626

1987

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On the Curie temperature of poly(vinylidene fluoride)

Macromolecules, 1986-05, Vol.19 (5), p.1491-1494

1986

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The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators

The Journal of imaging science and technology, 1997-01, Vol.41 (1), p.35-40

1997

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Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide)

Chemistry of materials, 1992-03, Vol.4 (2), p.278-284

1992

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Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists

Journal of Photopolymer Science and Technology, 1998, Vol.11(3), pp.419-429

1998

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Synthesis and characterization of poly[4-((tert-butoxycarbonyl)oxy)styrene-sulfone]

Chemistry of materials, 1991-07, Vol.3 (4), p.660-667

1991

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A novel approach to inducing aqueous base solubility in substituted styrene-sulfone polymers

Macromolecules, 1993-04, Vol.26 (9), p.2165-2170

1993

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Formation of Polymers Containing 4-Hydroxystyrene via Hydrolysis of 4-((Trimethylsilyl)oxy)styrene

Macromolecules, 1994-08, Vol.27 (18), p.4936-4940

1994

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Identification of sensitive positive and negative working resist materials for proximity X-ray lithography

Microelectronic engineering, 1995-02, Vol.27 (1), p.389-392

1995

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The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid

Polymer engineering and science, 1992-10, Vol.32 (20), p.1509-1510

1992

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Arylmethyl sulfones: A new class of photoacid generators

Polymer engineering and science, 1992-10, Vol.32 (20), p.1476-1480

1992

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Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices: studies pertaining to chemical amplification and imaging

Macromolecules, 1990, Vol.23 (1), p.145-150

1990

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Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging

Macromolecules, 1990-01, Vol.23 (1), p.145-150

1990

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The Synthesis, Characterization and Lithography of Photo-Acid Generators with Improved Thermal Stability

Journal of Photopolymer Science and Technology, 1993, Vol.6(4), pp.515-524

1993

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A Commercially Viable 193 nm Single Layer Resist Platform

Journal of photopolymer science and technology, 1997, Vol.10 (3), p.511-520

1997

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Photogenerated Acid-Catalyzed Formation of Phosphonic/Phosphoric Acids by Deprotection of Esters in Polymer Films

Macromolecules, 1995-01, Vol.28 (1), p.110-115

1995

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Ferroelectric properties of form I perdeuteriated poly(vinylidene fluoride)

Macromolecules, 1987-09, Vol.20 (9), p.2318-2320

1987

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THE SYNTHESIS, CHARACTERIZATION AND LITHOGRAPHIC BEHAVIOR OF ACID PHOTOGENERATING SYSTEMS BASED UPON 2-NITROBENZYL ESTER DERIVATIVES

Journal of Photopolymer Science and Technology, 1991, Vol.4(3), pp.341-355

1991

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SENSITIVITY ENHANCEMENT OF t-BOC BASED CHEMICALLY AMPLIFIED RESISTS THROUGH OPTIMIZATION OF PROCESS PREBAKE CONDITIONS

Journal of Photopolymer Science and Technology, 1992, Vol.5(1), pp.9-15

1992

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Compositional variation of the structure and solid-state transformations of vinylidene fluoride/tetrafluoroethylene copolymers

Macromolecules, 1988-01, Vol.21 (1), p.78-83

1988

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New isomers of poly(vinyl fluoride) with controlled regiosequence microstructure

Polymer (Guilford), 1988, Vol.29 (1), p.168-172

1988

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193 nm single layer resist strategies, concepts, and recent results

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-11, Vol.16 (6), p.3716-3721

1998

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A Commercially Viable 193nm Single Layer Resist Platform

Journal of Photopolymer Science and Technology, 1997, Vol.10(3), pp.511-520

1997

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Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

The role of molecular defects on the structure and phase transitions of poly(vinylidene fluoride)

On the Curie temperature of poly(vinylidene fluoride)

The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators

Radiation-induced chemistry of poly(4-[(tert-butoxycarbonyl)oxy]styrene-co-sulfur dioxide)

Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists

Synthesis and characterization of poly[4-((tert-butoxycarbonyl)oxy)styrene-sulfone]

A novel approach to inducing aqueous base solubility in substituted styrene-sulfone polymers

Formation of Polymers Containing 4-Hydroxystyrene via Hydrolysis of 4-((Trimethylsilyl)oxy)styrene

Identification of sensitive positive and negative working resist materials for proximity X-ray lithography

The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid

Arylmethyl sulfones: A new class of photoacid generators

Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrices: studies pertaining to chemical amplification and imaging

Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging

The Synthesis, Characterization and Lithography of Photo-Acid Generators with Improved Thermal Stability

A Commercially Viable 193 nm Single Layer Resist Platform

Photogenerated Acid-Catalyzed Formation of Phosphonic/Phosphoric Acids by Deprotection of Esters in Polymer Films

Ferroelectric properties of form I perdeuteriated poly(vinylidene fluoride)

THE SYNTHESIS, CHARACTERIZATION AND LITHOGRAPHIC BEHAVIOR OF ACID PHOTOGENERATING SYSTEMS BASED UPON 2-NITROBENZYL ESTER DERIVATIVES

SENSITIVITY ENHANCEMENT OF t-BOC BASED CHEMICALLY AMPLIFIED RESISTS THROUGH OPTIMIZATION OF PROCESS PREBAKE CONDITIONS

Compositional variation of the structure and solid-state transformations of vinylidene fluoride/tetrafluoroethylene copolymers

New isomers of poly(vinyl fluoride) with controlled regiosequence microstructure

193 nm single layer resist strategies, concepts, and recent results

A Commercially Viable 193nm Single Layer Resist Platform

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