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Formation of tantalum nitride films by rapid thermal processing

Thin solid films, 2003-08, Vol.437 (1), p.108-115

2003

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A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

Applied surface science, 2005-09, Vol.252 (1), p.66-76

2005

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Formation of niobium oxynitrides by rapid thermal processing (RTP)

Applied surface science, 2005-09, Vol.252 (1), p.205-210

2005

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Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films

Applied surface science, 2005-09, Vol.252 (1), p.177-184

2005

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Effect of Nanodiamond Particles Incorporation in Hydroxyapatite Coatings

ECS transactions, 2009, Vol.25 (3), p.403-410

2009

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Comparison of Evaluation Criteria for Efficient Gettering of Cu and Ni in Silicon Wafers

ECS transactions, 2009, Vol.25 (3), p.67-78

2009

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Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques

Analytical and bioanalytical chemistry, 2004-06, Vol.379 (4), p.554-567

2004

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Formation of vanadium nitride by rapid thermal processing

Thin solid films, 1999-07, Vol.349 (1-2), p.14-18

1999

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Drain Leakage Current Evaluation in the Diamond SOI nMOSFET at High Temperatures

ECS transactions, 2009, Vol.25 (3), p.243-253

2009

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Comparability of TXRF Systems at Different Laboratories

ECS transactions, 2009, Vol.25 (3), p.325-335

2009

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Investigations of the Surface Chemical Composition and Atomic Structure of ex-situ Sulfur Passivated Ge(100)

ECS transactions, 2009, Vol.25 (3), p.421-432

2009

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Probing Patterned Wafer Structures by Means of Grazing Incidence X-ray Fluorescence Analysis

ECS transactions, 2009, Vol.25 (3), p.441-451

2009

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Copper Decoration and Etching for Delineation of Crystal Defects in Thick SOI

ECS transactions, 2009, Vol.25 (3), p.79-90

2009

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Electrical Characterization of Deep-Lying Donor Layers Created by Proton Implantation and Subsequent Annealing in N-Type Float Zone and Czochralski Silicon

ECS transactions, 2009, Vol.25 (3), p.55-65

2009

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A Comparison Between Self-assembled Monolayers on Gold and Germanium Employing Grazing Incidence X-ray Absorption Spectrometry GIXRF-NEXAFS

ECS transactions, 2009, Vol.25 (3), p.433-439

2009

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Advanced Application of Resistivity and Hall Effect Measurements to Characterization of Silicon

ECS transactions, 2009, Vol.25 (3), p.25-34

2009

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Si Wafer Analysis of Light Elements by TXRF

ECS transactions, 2009, Vol.25 (3), p.301-309

2009

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Detection of Vacancy Distributions by Decoration with Hydrogen

ECS transactions, 2009, Vol.25 (3), p.35-49

2009

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Studies on Galvanic Corrosion on Floating and Grounded Bondpads in Wafer Fabrication

ECS transactions, 2009, Vol.25 (3), p.219-223

2009

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Revealing Copper Contamination in Silicon after Low Temperature Treatments

ECS transactions, 2009, Vol.25 (3), p.337-348

2009

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Controlling Copper ECD Processes by Early Fault Detection and Diagnosis Using In-situ Electrochemical Sensor Coupled with Pattern Recognition Chemometrics

ECS transactions, 2009, Vol.25 (3), p.199-217

2009

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Defect Analysis in Solar Cell Silicon by Photoluminescence Spectroscopy and Topography

ECS transactions, 2009, Vol.25 (3), p.3-10

2009

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Investigation on Particle Generation Mechanism during Dichlorosilane-Based WSi Deposition Process

ECS transactions, 2009, Vol.25 (3), p.225-231

2009

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Poly Si TFT on Microsheet

ECS transactions, 2009, Vol.25 (3), p.255-258

Won, Sunghwan

2009

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Characterisation of High-k Containing Nanolayers by Reference-Free X-Ray Fluorescence Analysis with Synchrotron Radiation

ECS transactions, 2009, Vol.25 (3), p.293-300

2009

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Formation of tantalum nitride films by rapid thermal processing

A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films

Formation of niobium oxynitrides by rapid thermal processing (RTP)

Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers – preparation of oxynitride films

Effect of Nanodiamond Particles Incorporation in Hydroxyapatite Coatings

Comparison of Evaluation Criteria for Efficient Gettering of Cu and Ni in Silicon Wafers

Niobium nitride films formed by rapid thermal processing (RTP): a study of depth profiles and interface reactions by complementary analytical techniques

Formation of vanadium nitride by rapid thermal processing

Drain Leakage Current Evaluation in the Diamond SOI nMOSFET at High Temperatures

Comparability of TXRF Systems at Different Laboratories

Investigations of the Surface Chemical Composition and Atomic Structure of ex-situ Sulfur Passivated Ge(100)

Probing Patterned Wafer Structures by Means of Grazing Incidence X-ray Fluorescence Analysis

Copper Decoration and Etching for Delineation of Crystal Defects in Thick SOI

Electrical Characterization of Deep-Lying Donor Layers Created by Proton Implantation and Subsequent Annealing in N-Type Float Zone and Czochralski Silicon

A Comparison Between Self-assembled Monolayers on Gold and Germanium Employing Grazing Incidence X-ray Absorption Spectrometry GIXRF-NEXAFS

Advanced Application of Resistivity and Hall Effect Measurements to Characterization of Silicon

Si Wafer Analysis of Light Elements by TXRF

Detection of Vacancy Distributions by Decoration with Hydrogen

Studies on Galvanic Corrosion on Floating and Grounded Bondpads in Wafer Fabrication

Revealing Copper Contamination in Silicon after Low Temperature Treatments

Controlling Copper ECD Processes by Early Fault Detection and Diagnosis Using In-situ Electrochemical Sensor Coupled with Pattern Recognition Chemometrics

Defect Analysis in Solar Cell Silicon by Photoluminescence Spectroscopy and Topography

Investigation on Particle Generation Mechanism during Dichlorosilane-Based WSi Deposition Process

Poly Si TFT on Microsheet

Characterisation of High-k Containing Nanolayers by Reference-Free X-Ray Fluorescence Analysis with Synchrotron Radiation

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