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Surface Loss in Ozone-Based Atomic Layer Deposition Processes

Chemistry of materials, 2011-05, Vol.23 (9), p.2381-2387

2011

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Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

Journal of physical chemistry. C, 2019-11, Vol.123 (44), p.27030-27035

2019

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Surface zeta potential and diamond growth on gallium oxide single crystal

Carbon (New York), 2021-08, Vol.181, p.79-86

2021

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Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions

Nanoscale, 2021-06, Vol.13 (22), p.192-199

2021

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Atomic layer deposition of high-mobility hydrogen-doped zinc oxide

Solar energy materials and solar cells, 2017-12, Vol.173, p.111-119

2017

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Status and prospects of plasma-assisted atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-05, Vol.37 (3)

2019

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Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties

Plasma sources science & technology, 2019-02, Vol.28 (2), p.24002

2019

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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

ACS applied materials & interfaces, 2018-04, Vol.10 (15), p.13158-13180

2018

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Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Chemistry of materials, 2021-07, Vol.33 (13), p.5002-5009

2021

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Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale, 2018-05, Vol.10 (18), p.8615-8627

2018

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Foundations of atomic-level plasma processing in nanoelectronics

Plasma sources science & technology, 2022-10, Vol.31 (10), p.103002

2022

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Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition

ACS applied materials & interfaces, 2015-08, Vol.7 (30), p.16723-16729

2015

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Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers

ACS applied materials & interfaces, 2015-10, Vol.7 (40), p.22525-22532

2015

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Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-12, Vol.41 (6)

2023

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Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-05, Vol.37 (3)

2019

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Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

ACS applied materials & interfaces, 2015-09, Vol.7 (35), p.19857-19862

2015

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Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride

The journal of physical chemistry letters, 2015-09, Vol.6 (18), p.3610-3614

2015

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Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies

ACS applied materials & interfaces, 2017-01, Vol.9 (2), p.1858-1869

2017

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Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-07, Vol.36 (4)

2018

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Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

Applied physics letters, 2015-07, Vol.107 (1)

2015

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Ultrathin superconducting TaCxN1−x films prepared by plasma-enhanced atomic layer deposition with ion-energy control

Applied physics letters, 2023-09, Vol.123 (13)

2023

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Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy

Chemistry of materials, 2016-08, Vol.28 (16), p.5864-5871

2016

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Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma

Journal of physical chemistry. C, 2021-02, Vol.125 (7), p.3913-3923

2021

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Room-Temperature Atomic Layer Deposition of Platinum

Chemistry of materials, 2013-05, Vol.25 (9), p.1769-1774

2013

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Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2)

2020

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Surface Loss in Ozone-Based Atomic Layer Deposition Processes

Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

Surface zeta potential and diamond growth on gallium oxide single crystal

Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions

Atomic layer deposition of high-mobility hydrogen-doped zinc oxide

Status and prospects of plasma-assisted atomic layer deposition

Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Foundations of atomic-level plasma processing in nanoelectronics

Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In2O3:H Prepared by Atomic Layer Deposition

Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time

Ultrathin superconducting TaCxN1−x films prepared by plasma-enhanced atomic layer deposition with ion-energy control

Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy

Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma

Room-Temperature Atomic Layer Deposition of Platinum

Atomic layer deposition of cobalt phosphate from cobaltocene, trimethylphosphate, and O2 plasma

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