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2D Transition Metal Dichalcogenide Heterostructures for p‐ and n‐Type Photovoltaic Self‐Powered Gas Sensor

Advanced functional materials, 2020-10, Vol.30 (43), p.n/a

2020

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Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity

Advanced functional materials, 2021-08, Vol.31 (33), p.n/a

2021

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Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052802-052802

2017

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Efficient access to general α-tertiary amines via water-accelerated organocatalytic multicomponent allylation

Nature communications, 2022-05, Vol.13 (1), p.2702-2702, Article 2702

2022

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A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

ACS nano, 2016-04, Vol.10 (4), p.4451-4458

2016

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Effects of a Nb nanopin electrode on the resistive random-access memory switching characteristics of NiO thin films

Nanoscale, 2018-07, Vol.1 (28), p.13443-13448

2018

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The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO3 thin films

Applied physics letters, 2013-09, Vol.103 (13)

2013

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Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD

Journal of materials chemistry. C, Materials for optical and electronic devices, 2023-03, Vol.11 (11), p.3743-375

2023

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Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor

Journal of materials science, 2019-08, Vol.54 (16), p.11145-11156

2019

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Thermal adsorption-enhanced atomic layer etching of Si3N4

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)

2018

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Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers

ACS applied materials & interfaces, 2019-05, Vol.11 (18), p.16804-16814

2019

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Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors

Journal of materials chemistry. C, Materials for optical and electronic devices, 2018, Vol.6 (27), p.7367-7376

2018

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A Strategy for Wafer‐Scale Crystalline MoS2 Thin Films with Controlled Morphology Using Pulsed Metal–Organic Chemical Vapor Deposition at Low Temperature

Advanced materials interfaces, 2022-02, Vol.9 (4), p.n/a

2022

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Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Journal of materials science, 2016-06, Vol.51 (11), p.5082-5091

2016

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Low Pressure Chemical Vapor Deposition of Aluminum-Doped Zinc Oxide for Transparent Conducting Electrodes

Journal of the Electrochemical Society, 2011-01, Vol.158 (8), p.D495

2011

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Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces

Advanced materials interfaces, 2022-05, Vol.9 (13), p.n/a

2022

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Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition

Journal of the Electrochemical Society, 2011, Vol.158 (1), p.D1

2011

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Confinement of Ferroelectric Domain-Wall Motion at Artificially Formed Conducting-Nanofilaments in Epitaxial BiFeO3 Thin Films

ACS applied materials & interfaces, 2014-05, Vol.6 (9), p.6346-6350

2014

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Electronic Structure of Cerium Oxide Gate Dielectric Grown by Plasma-Enhanced Atomic Layer Deposition

Journal of the Electrochemical Society, 2011, Vol.158 (10), p.G217

2011

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Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition

Nanotechnology, 2008-01, Vol.19 (4), p.045302-045302 (8)

2008

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Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces

Applied surface science, 2024-07, Vol.662, p.160099, Article 160099

2024

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Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition

Materials letters, 2024-07, Vol.366, p.136570, Article 136570

2024

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Area-selective atomic layer deposition of high-quality Ru thin films by chemo-selective adsorption of short alkylating agents

Materials letters, 2023-02, Vol.333, p.133574, Article 133574

2023

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Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor

Chemistry of materials, 2019-08, Vol.31 (15), p.5502-5508

2019

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Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

Applied surface science, 2023-11, Vol.636, p.157864, Article 157864

2023

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2D Transition Metal Dichalcogenide Heterostructures for p‐ and n‐Type Photovoltaic Self‐Powered Gas Sensor

Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity

Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide

Efficient access to general α-tertiary amines via water-accelerated organocatalytic multicomponent allylation

A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

Effects of a Nb nanopin electrode on the resistive random-access memory switching characteristics of NiO thin films

The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO3 thin films

Advanced atomic layer deposition (ALD): controlling the reaction kinetics and nucleation of metal thin films using electric-potential-assisted ALD

Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor

Thermal adsorption-enhanced atomic layer etching of Si3N4

Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers

Comparative study of the growth characteristics and electrical properties of atomic-layer-deposited HfO2 films obtained from metal halide and amide precursors

A Strategy for Wafer‐Scale Crystalline MoS2 Thin Films with Controlled Morphology Using Pulsed Metal–Organic Chemical Vapor Deposition at Low Temperature

Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Low Pressure Chemical Vapor Deposition of Aluminum-Doped Zinc Oxide for Transparent Conducting Electrodes

Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces

Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition

Confinement of Ferroelectric Domain-Wall Motion at Artificially Formed Conducting-Nanofilaments in Epitaxial BiFeO3 Thin Films

Electronic Structure of Cerium Oxide Gate Dielectric Grown by Plasma-Enhanced Atomic Layer Deposition

Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition

Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces

Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition

Area-selective atomic layer deposition of high-quality Ru thin films by chemo-selective adsorption of short alkylating agents

Thermal Atomic Layer Deposition of Device-Quality SiO2 Thin Films under 100 °C Using an Aminodisilane Precursor

Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

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