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Quantitation of the ROS production in plasma and radiation treatments of biotargets

Scientific reports, 2019-12, Vol.9 (1), p.19837-11, Article 19837

2019

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Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

Physics of plasmas, 2020-08, Vol.27 (8)

2020

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Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model

Physics of plasmas, 2021-10, Vol.28 (10), p.103505

2021

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Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma

Materials, 2021-06, Vol.14 (11), p.3005

2021

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2022 Review of Data-Driven Plasma Science

IEEE transactions on plasma science, 2023-07, Vol.51 (7), p.1-89

2023

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Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate

Current Applied Physics, 2022, 36(0), , pp.183-186

2022

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Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables

IEEE transactions on semiconductor manufacturing, 2018-05, Vol.31 (2), p.232-241

2018

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Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing

Plasma processes and polymers, 2019-09, Vol.16 (9), p.n/a

2019

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Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions

Physics of plasmas, 2015-03, Vol.22 (3)

2015

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Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma

Journal of the Korean Physical Society, 2022, 80(3), , pp.233-240

2022

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Plasma information-based virtual metrology (PI-VM) and mass production process control

Journal of the Korean Physical Society, 2022-04, Vol.80 (8), p.647-669

2022

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Population Kinetics Modeling of Low-Temperature Argon Plasma

Atoms, 2021-12, Vol.9 (4), p.100

2021

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Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

IEEE transactions on semiconductor manufacturing, 2015-08, Vol.28 (3), p.241-246

2015

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Simulations of fusion edge plasmas by linear plasma devices: physics and plasma–material interactions

Journal of the Korean Physical Society, 2022-04, Vol.80 (8), p.717-734

2022

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Development of plasma sources and diagnostics for the simulation of fusion edge plasmas

Journal of the Korean Physical Society, 2022-04, Vol.80 (8), p.735-758

2022

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High-temperature thermo-mechanical behavior of functionally graded materials produced by plasma sprayed coating: Experimental and modeling results

Metals and Materials International, 2016, 22(5), , pp.817-824

2016

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Numerical Analysis on the Electrical and Thermal Flow Characteristics of Ar-N2 Inductively Coupled Plasma Torch System

Journal of the Korean Physical Society, 2018, 72(7), , pp.755-764

2018

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Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes

Computers & chemical engineering, 2022-03, Vol.159, p.107696, Article 107696

2022

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Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate

Current applied physics, 2024-05, Vol.61, p.19-24

2024

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Competitive roles of dislocations on blister formation in polycrystalline pure tungsten

Journal of alloys and compounds, 2022-10, Vol.918, p.165745, Article 165745

2022

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Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method

Journal of physics. D, Applied physics, 2015-01, Vol.48 (2), p.22001-6

2015

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Effect of yttrium doping in tungsten on sinterability and properties as a plasma-facing material

Journal of alloys and compounds, 2023-08, Vol.953, p.169961, Article 169961

2023

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Effects of metastable species in helium and argon atmospheric pressure plasma jets (APPJs) on inactivation of periodontopathogenic bacteria

Journal of the Korean Physical Society, 2016, 68(10), , pp.1176-1191

2016

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Deposition/erosion and H/D retention characteristics in gaps of PFCs in KSTAR studied by cavity technique

Journal of nuclear materials, 2013-07, Vol.438, p.S698-S706

2013

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Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM

Plasma physics and controlled fusion, 2024-02, Vol.66 (2), p.25014

2024

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Quantitation of the ROS production in plasma and radiation treatments of biotargets

Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma

2022 Review of Data-Driven Plasma Science

Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate

Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables

Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing

Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions

Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma

Plasma information-based virtual metrology (PI-VM) and mass production process control

Population Kinetics Modeling of Low-Temperature Argon Plasma

Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

Simulations of fusion edge plasmas by linear plasma devices: physics and plasma–material interactions

Development of plasma sources and diagnostics for the simulation of fusion edge plasmas

High-temperature thermo-mechanical behavior of functionally graded materials produced by plasma sprayed coating: Experimental and modeling results

Numerical Analysis on the Electrical and Thermal Flow Characteristics of Ar-N2 Inductively Coupled Plasma Torch System

Sparse Bayesian long short-term memory networks for computationally efficient stochastic modeling of plasma etch processes

Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate

Competitive roles of dislocations on blister formation in polycrystalline pure tungsten

Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method

Effect of yttrium doping in tungsten on sinterability and properties as a plasma-facing material

Effects of metastable species in helium and argon atmospheric pressure plasma jets (APPJs) on inactivation of periodontopathogenic bacteria

Deposition/erosion and H/D retention characteristics in gaps of PFCs in KSTAR studied by cavity technique

Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM

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