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Fabrication of Nanoparticle Films Applying Directed Self-assembly

Journal of Photopolymer Science and Technology, 2015/06/10, Vol.28(5), pp.643-647

2015

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Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Microelectronic engineering, 2016-06, Vol.159, p.21-26

2016

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Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(5), pp.647-652

2016

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Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Journal of Photopolymer Science and Technology, 2015/06/10, Vol.28(5), pp.649-652

2015

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Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template

Microelectronic engineering, 2011-08, Vol.88 (8), p.2571-2575

2011

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A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Microelectronic engineering, 2015-02, Vol.134, p.27-32

2015

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A simulation study for defects in sub-15 nm line-space using directed self-assembly

MRS proceedings, 2015, Vol.1750 (1), p.36-41, Article mrsf14-1750-kk05-18

2015

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Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

MRS proceedings, 2015, Vol.1750 (1), p.24-35, Article mrsf14-1750-kk06-04

2015

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Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process

Japanese Journal of Applied Physics, 2013-10, Vol.52 (10), p.105201-105201-5

2013

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A Simulation Study on Defectivity in Directed Self-assembly Lithography

Journal of Photopolymer Science and Technology, 2015/06/10, Vol.28(5), pp.683-688

2015

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The Photopolymer Science and Technology Award

Journal of Photopolymer Science and Technology, 2016/06/21, Vol.29(1), pp.11-15

2016

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Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 \hbox^ Bit Patterned Media

IEEE transactions on magnetics, 2011-01, Vol.47 (1), p.51-54

2011

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Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)

Journal of Photopolymer Science and Technology, 2012/06/26, Vol.25(1), pp.27-32

2012

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A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Journal of Photopolymer Science and Technology, 2015/05/25, Vol.28(5), pp.617-622

2015

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Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory

Journal of Photopolymer Science and Technology, 2014/07/08, Vol.27(1), pp.31-36

2014

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Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

ACS applied materials & interfaces, 2017-09, Vol.9 (37), p.31266-31278

2017

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A new positive electron-beam resist material composed of catechol derivatives

Microelectronic engineering, 2002-07, Vol.61, p.777-781

2002

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Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene- block -poly(methyl methacrylate)

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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Orientation and Position Control of Self-Assembled Polymer Pattern for Bit-Patterned Media

IEEE transactions on magnetics, 2014-03, Vol.50 (3), p.47-50

2014

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5 Tdots/in2 bit patterned media fabricated by a directed self-assembly mask

IEEE transactions on magnetics, 2013, Vol.49 (2), p.693-698

2013

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5 Tdots/in 2 bit patterned media fabricated by a directed self-assembly mask

IEEE transactions on magnetics, 2013-02, Vol.49 (2), p.693-698

2013

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5 [Formula Omitted] Bit Patterned Media Fabricated by a Directed Self-Assembly Mask

IEEE transactions on magnetics, 2013-02, Vol.49 (2), p.693

2013

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Simulation study on defect annihilation dynamics in directed self-assembly lithography

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2015-11, Vol.33 (6)

2015

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Fabrication of 5 Tdot/in.2 bit patterned media with servo pattern using directed self-assembly

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2012-11, Vol.30 (6)

2012

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Dissolution inhibitors for 193-nm chemically amplified resists

Japanese Journal of Applied Physics, 1997-12, Vol.36 (12B), p.7625-7631

1997

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Fabrication of Nanoparticle Films Applying Directed Self-assembly

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Fabrication of Sub-10 nm Metal Wire Circuits using Directed Self-Assembly of Block Copolymers

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

A simulation study for defects in sub-15 nm line-space using directed self-assembly

Directed self-assembly lithography for half-pitch sub-15 nm pattern fabrication process

Nanoimprint Lithography of 20-nm-Pitch Dot Array Pattern Using Tone Reversal Process

A Simulation Study on Defectivity in Directed Self-assembly Lithography

The Photopolymer Science and Technology Award

Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 \hbox^ Bit Patterned Media

Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High‑χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

A new positive electron-beam resist material composed of catechol derivatives

Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene- block -poly(methyl methacrylate)

Orientation and Position Control of Self-Assembled Polymer Pattern for Bit-Patterned Media

5 Tdots/in2 bit patterned media fabricated by a directed self-assembly mask

5 Tdots/in 2 bit patterned media fabricated by a directed self-assembly mask

5 [Formula Omitted] Bit Patterned Media Fabricated by a Directed Self-Assembly Mask

Simulation study on defect annihilation dynamics in directed self-assembly lithography

Fabrication of 5 Tdot/in.2 bit patterned media with servo pattern using directed self-assembly

Dissolution inhibitors for 193-nm chemically amplified resists

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