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Blockade of Cripto binding to cell surface GRP78 inhibits oncogenic Cripto signaling via MAPK PI3K and Smad2 3 pathways

Oncogene, 2009-06, Vol.28 (24), p.2324-2336

2009

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Carborane-based polymers: a novel class of semiconductors with tunable properties

Physical chemistry chemical physics : PCCP, 2017-05, Vol.19 (18), p.1986-1997

2017

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Mechanisms of oxygen plasma damage of amine and methyl terminated organosilicate low-k dielectrics from ab initio molecular dynamics simulations

Journal of physics. D, Applied physics, 2014-08, Vol.47 (33), p.335204-6

2014

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Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results

Applied surface science, 2007-05, Vol.253 (14), p.6176-6184

2007

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Spontaneous deposition of Pt and Ir on Ru: Reduction to intermediate oxidation states

Electrochimica acta, 2007-04, Vol.52 (15), p.5010-5017

2007

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Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen

Applied surface science, 2008-09, Vol.254 (22), p.7486-7493

2008

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Cellular and molecular aspects of pancreatic cancer

Acta histochemica, 2016-04, Vol.118 (3), p.305-316

2016

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Interaction of molecular nitrogen with vanadium oxide in the absence and presence of water vapor at room temperature: Near-ambient pressure XPS

The Journal of chemical physics, 2022-09, Vol.157 (10), p.104701-104701

2022

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A consistent method for quantitative XPS peak analysis of thin oxide films on clean polycrystalline iron surfaces

Applied surface science, 1997-09, Vol.119 (1-2), p.83-92

1997

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DHPS-dependent hypusination of eIF5A1/2 is necessary for TGFβ/fibronectin-induced breast cancer metastasis and associates with prognostically unfavorable genomic alterations in TP53

Biochemical and biophysical research communications, 2019-11, Vol.519 (4), p.838-845

2019

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Tumor Microenvironment Heterogeneity: Challenges and Opportunities

Current molecular biology reports, 2017-12, Vol.3 (4), p.218-229

2017

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The Effects of an Iodine Surface Layer on Ru Reactivity in Air and during Cu Electrodeposition

Journal of the Electrochemical Society, 2005, Vol.152 (2), p.G115

2005

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Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen

Thin solid films, 2005-05, Vol.478 (1-2), p.188-195

2005

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Cu electrodeposition on Ru(0001): Perchlorate dissociation and its effects on Cu deposition

Thin solid films, 2006-02, Vol.497 (1-2), p.121-129

2006

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Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111)

Thin solid films, 2003-11, Vol.444 (1-2), p.179-188

2003

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Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion

Journal of applied physics, 2009-07, Vol.106 (1), p.013311-013311-7

2009

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Cu interactions with α-Al2O3(0001): effects of surface hydroxyl groups versus dehydroxylation by Ar-ion sputtering

Surface science, 2000-10, Vol.465 (1-2), p.163-176

2000

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Copper wetting of α-Al2O3(0001) : theory and experiment

Surface science, 2000-02, Vol.446 (1-2), p.76-88

2000

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A Study of the Electrochemical Reduction of Nitrobenzene at Molybdenum Electrodes

Journal of the Electrochemical Society, 1999-10, Vol.146 (10), p.3762-3764

1999

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Characterization of oxidized Ni3Al(1 1 0) and interaction of the oxide film with water vapor

Surface science, 2002-11, Vol.519 (3), p.259-268

2002

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Nitridation of organo-silicate glass: A self-limiting process for PVD Ta1+xN/Ta barrier formation

Applied surface science, 2009-09, Vol.255 (23), p.9543-9547

2009

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Copper interaction with a Ta silicate surface: implications for interconnect technology

Thin solid films, 2002-08, Vol.415 (1), p.308-314

2002

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H2O-induced instability of Al2O3/Ni3Al(110) and Al2O3/Ni3Al(111) thin films under non-UHV conditions

Surface science, 2004-09, Vol.565 (2-3), p.L277-L282

2004

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Copper metallization of hydroxyl-modified amorphous Si:C:H films

Thin solid films, 2003-09, Vol.440 (1), p.100-108

2003

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Adhesion behavior of electroless deposited Cu on Pt/Ta silicate and Pt/SiO2

Applied surface science, 2004-01, Vol.222 (1-4), p.253-262

2004

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Blockade of Cripto binding to cell surface GRP78 inhibits oncogenic Cripto signaling via MAPK PI3K and Smad2 3 pathways

Carborane-based polymers: a novel class of semiconductors with tunable properties

Mechanisms of oxygen plasma damage of amine and methyl terminated organosilicate low-k dielectrics from ab initio molecular dynamics simulations

Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results

Spontaneous deposition of Pt and Ir on Ru: Reduction to intermediate oxidation states

Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen

Cellular and molecular aspects of pancreatic cancer

Interaction of molecular nitrogen with vanadium oxide in the absence and presence of water vapor at room temperature: Near-ambient pressure XPS

A consistent method for quantitative XPS peak analysis of thin oxide films on clean polycrystalline iron surfaces

DHPS-dependent hypusination of eIF5A1/2 is necessary for TGFβ/fibronectin-induced breast cancer metastasis and associates with prognostically unfavorable genomic alterations in TP53

Tumor Microenvironment Heterogeneity: Challenges and Opportunities

The Effects of an Iodine Surface Layer on Ru Reactivity in Air and during Cu Electrodeposition

Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen

Cu electrodeposition on Ru(0001): Perchlorate dissociation and its effects on Cu deposition

Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111)

Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion

Cu interactions with α-Al2O3(0001): effects of surface hydroxyl groups versus dehydroxylation by Ar-ion sputtering

Copper wetting of α-Al2O3(0001) : theory and experiment

A Study of the Electrochemical Reduction of Nitrobenzene at Molybdenum Electrodes

Characterization of oxidized Ni3Al(1 1 0) and interaction of the oxide film with water vapor

Nitridation of organo-silicate glass: A self-limiting process for PVD Ta1+xN/Ta barrier formation

Copper interaction with a Ta silicate surface: implications for interconnect technology

H2O-induced instability of Al2O3/Ni3Al(110) and Al2O3/Ni3Al(111) thin films under non-UHV conditions

Copper metallization of hydroxyl-modified amorphous Si:C:H films

Adhesion behavior of electroless deposited Cu on Pt/Ta silicate and Pt/SiO2

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