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Blockade of Cripto binding to cell surface GRP78 inhibits oncogenic Cripto signaling via MAPK PI3K and Smad2 3 pathways

Oncogene, 2009-06, Vol.28 (24), p.2324-2336

2009

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Carborane-based polymers: a novel class of semiconductors with tunable properties

Physical chemistry chemical physics : PCCP, 2017-05, Vol.19 (18), p.1986-1997

2017

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Plasma modification of vanadium oxynitride surfaces: Characterization by in situ XPS experiments and DFT calculations

The Journal of chemical physics, 2020-10, Vol.153 (14), p.144709-144709

2020

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Cellular and molecular aspects of pancreatic cancer

Acta histochemica, 2016-04, Vol.118 (3), p.305-316

2016

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Interaction of molecular nitrogen with vanadium oxide in the absence and presence of water vapor at room temperature: Near-ambient pressure XPS

The Journal of chemical physics, 2022-09, Vol.157 (10), p.104701-104701

2022

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DHPS-dependent hypusination of eIF5A1/2 is necessary for TGFβ/fibronectin-induced breast cancer metastasis and associates with prognostically unfavorable genomic alterations in TP53

Biochemical and biophysical research communications, 2019-11, Vol.519 (4), p.838-845

2019

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Mechanisms of oxygen plasma damage of amine and methyl terminated organosilicate low-k dielectrics from ab initio molecular dynamics simulations

Journal of physics. D, Applied physics, 2014-08, Vol.47 (33), p.335204-6

2014

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CRIPTO and its signaling partner GRP78 drive the metastatic phenotype in human osteotropic prostate cancer

Oncogene, 2017-08, Vol.36 (33), p.4739-4749

2017

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Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results

Applied surface science, 2007-05, Vol.253 (14), p.6176-6184

2007

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A consistent method for quantitative XPS peak analysis of thin oxide films on clean polycrystalline iron surfaces

Applied surface science, 1997-09, Vol.119 (1-2), p.83-92

1997

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Spontaneous deposition of Pt and Ir on Ru: Reduction to intermediate oxidation states

Electrochimica acta, 2007-04, Vol.52 (15), p.5010-5017

2007

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Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen

Applied surface science, 2008-09, Vol.254 (22), p.7486-7493

2008

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Nitridation of organo-silicate glass: A self-limiting process for PVD Ta1+xN/Ta barrier formation

Applied surface science, 2009-09, Vol.255 (23), p.9543-9547

2009

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Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen

Thin solid films, 2005-05, Vol.478 (1-2), p.188-195

2005

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Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion

Journal of applied physics, 2009-07, Vol.106 (1), p.013311-013311-7

2009

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Tumor Microenvironment Heterogeneity: Challenges and Opportunities

Current molecular biology reports, 2017-12, Vol.3 (4), p.218-229

2017

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Electrodeposition of copper on Ru(0 0 0 1) in sulfuric acid solution: Growth kinetics and nucleation behavior

Electrochimica acta, 2006-04, Vol.51 (15), p.3086-3090

2006

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Cu electrodeposition on Ru(0001): Perchlorate dissociation and its effects on Cu deposition

Thin solid films, 2006-02, Vol.497 (1-2), p.121-129

2006

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The Effects of an Iodine Surface Layer on Ru Reactivity in Air and during Cu Electrodeposition

Journal of the Electrochemical Society, 2005, Vol.152 (2), p.G115

2005

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Cu interactions with α-Al2O3(0001): effects of surface hydroxyl groups versus dehydroxylation by Ar-ion sputtering

Surface science, 2000-10, Vol.465 (1-2), p.163-176

2000

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Copper wetting of α-Al2O3(0001) : theory and experiment

Surface science, 2000-02, Vol.446 (1-2), p.76-88

2000

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Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111)

Thin solid films, 2003-11, Vol.444 (1-2), p.179-188

2003

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Characterization of oxidized Ni3Al(1 1 0) and interaction of the oxide film with water vapor

Surface science, 2002-11, Vol.519 (3), p.259-268

2002

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Effect of surface impurities on the Cu/Ta interface

Thin solid films, 2000-11, Vol.376 (1), p.115-123

2000

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A Study of the Electrochemical Reduction of Nitrobenzene at Molybdenum Electrodes

Journal of the Electrochemical Society, 1999-10, Vol.146 (10), p.3762-3764

1999

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Blockade of Cripto binding to cell surface GRP78 inhibits oncogenic Cripto signaling via MAPK PI3K and Smad2 3 pathways

Carborane-based polymers: a novel class of semiconductors with tunable properties

Plasma modification of vanadium oxynitride surfaces: Characterization by in situ XPS experiments and DFT calculations

Cellular and molecular aspects of pancreatic cancer

Interaction of molecular nitrogen with vanadium oxide in the absence and presence of water vapor at room temperature: Near-ambient pressure XPS

DHPS-dependent hypusination of eIF5A1/2 is necessary for TGFβ/fibronectin-induced breast cancer metastasis and associates with prognostically unfavorable genomic alterations in TP53

Mechanisms of oxygen plasma damage of amine and methyl terminated organosilicate low-k dielectrics from ab initio molecular dynamics simulations

CRIPTO and its signaling partner GRP78 drive the metastatic phenotype in human osteotropic prostate cancer

Interfacial reactions during sputter deposition of Ta and TaN films on organosilicate glass: XPS and TEM results

A consistent method for quantitative XPS peak analysis of thin oxide films on clean polycrystalline iron surfaces

Spontaneous deposition of Pt and Ir on Ru: Reduction to intermediate oxidation states

Oxidation of Ni(Pt)Si by molecular vs. atomic oxygen

Nitridation of organo-silicate glass: A self-limiting process for PVD Ta1+xN/Ta barrier formation

Chemical vapor deposition of tantalum nitride with tert-butylimino tris(diethylamino) tantalum and atomic hydrogen

Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion

Tumor Microenvironment Heterogeneity: Challenges and Opportunities

Electrodeposition of copper on Ru(0 0 0 1) in sulfuric acid solution: Growth kinetics and nucleation behavior

Cu electrodeposition on Ru(0001): Perchlorate dissociation and its effects on Cu deposition

The Effects of an Iodine Surface Layer on Ru Reactivity in Air and during Cu Electrodeposition

Cu interactions with α-Al2O3(0001): effects of surface hydroxyl groups versus dehydroxylation by Ar-ion sputtering

Copper wetting of α-Al2O3(0001) : theory and experiment

Oxide film growth on Fe(111) and scanning tunneling microscopy induced high electric field stress in Fe2O3/Fe(111)

Characterization of oxidized Ni3Al(1 1 0) and interaction of the oxide film with water vapor

Effect of surface impurities on the Cu/Ta interface

A Study of the Electrochemical Reduction of Nitrobenzene at Molybdenum Electrodes

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