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Fabrication and investigation of three-dimensional ferroelectric capacitors for the application of FeRAM

AIP advances, 2016-03, Vol.6 (3), p.035128-035128-12

2016

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Atomic Layer Deposition of the Conductive Delafossite PtCoO2

Advanced materials interfaces, 2022-04, Vol.9 (12), p.n/a

2022

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Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-05, Vol.33 (3)

2015

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High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma

AIP advances, 2016-08, Vol.6 (8), p.085111-085111-8

2016

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Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon

Physica status solidi. A, Applications and materials science, 2019-09, Vol.216 (17), p.n/a

2019

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Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process

IEEE electron device letters, 2019-09, Vol.40 (9), p.1507-1510

2019

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Atomic Layer Deposition of the Conductive Delafossite PtCoO 2

Advanced materials interfaces, 2022-04, Vol.9 (12)

2022

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Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-03, Vol.36 (2)

2018

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Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon: Insulating Films on Semiconductors 2013

Microelectronic engineering, 2013, Vol.109, p.113-116

2013

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Use of B{sub 2}O{sub 3} films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-05, Vol.33 (3)

2015

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Application of atomic layer deposited dopant sources for ultra-shallow doping of silicon

Physica status solidi. C, 2014-01, Vol.11 (1), p.41-45

2014

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P-type Doping of Silicon Suitable for Structures with High Aspect Ratios by Using a Dopant Source of Boron Oxide Grown by Atomic Layer Deposition

ECS transactions, 2012, Vol.45 (6), p.55-67

2012

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Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon

Microelectronic engineering, 2013-09, Vol.109, p.113-116

2013

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Deposition of Iridium Thin Films on Three-Dimensional Structures With PE-MOCVD

Chemical vapor deposition, 2015-03, Vol.21 (1-2-3), p.46-53

2015

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Investigation of Antimony Oxide Films Deposited by Atomic Layer Deposition

ECS transactions, 2012, Vol.45 (3), p.461-473

2012

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Observation of steplike sheet resistance increase of shallow doped bare silicon during initial contact to air

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2006-12, Vol.253 (1-2), p.232-235

2006

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Enhanced Ferroelectric Properties of Multilayer SBT-BTN Thin Films for NVRAM Applications

Journal of crystallization process and technology, 2015, Vol.5 (4), p.49-57

2015

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Atomic Layer Deposition of Antimony Oxide on Hydrogen-terminated Silicon Substrates

ECS transactions, 2009, Vol.19 (1), p.105-114

2009

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Hot-Wire Chemical Vapor Deposition of Ge 2 Sb 2 Te 5 Thin Films

ECS transactions, 2010-10, Vol.28 (15), p.35-44

2010

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PECVD Synthesis of Silicon Nanowires Assisted by Templates of Gallium Islands

MRS proceedings, 2010, Vol.1258 (1), Article 1258-Q04-04

2010

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EVALUATION OF DIFFERENT METALORGANIC PRECURSORS FOR Ge-Sb-Te THIN FILM DEPOSITION

Integrated ferroelectrics, 2009-12, Vol.110 (1), p.87-93

2009

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Activated Pulsed Metalorganic Chemical Vapor Deposition of Ge2Sb2Te5 Thin Films Using Alkyl Precursors

MRS proceedings, 2010, Vol.1251 (1)

2010

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Activated Pulsed Metalorganic Chemical Vapor Deposition of Ge 2 Sb 2 Te 5 Thin Films Using Alkyl Precursors

MRS proceedings, 2010, Vol.1251, Article 1251-H03-23

2010

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Gallium Assisted PECVD Synthesis of Silicon Nanowires

ECS transactions, 2010, Vol.28 (15), p.45-56

2010

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Fabrication and investigation of three-dimensional ferroelectric capacitors for the application of FeRAM

Atomic Layer Deposition of the Conductive Delafossite PtCoO2

Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

High temperature reactive ion etching of iridium thin films with aluminum mask in CF4/O2/Ar plasma

Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon

Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

Boosting n-Type Doping Levels of Ge With Co-Doping by Integrating Plasma-Assisted Atomic Layer Deposition and Flash Annealing Process

Atomic Layer Deposition of the Conductive Delafossite PtCoO 2

Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds

Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon: Insulating Films on Semiconductors 2013

Use of B{sub 2}O{sub 3} films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Application of atomic layer deposited dopant sources for ultra-shallow doping of silicon

P-type Doping of Silicon Suitable for Structures with High Aspect Ratios by Using a Dopant Source of Boron Oxide Grown by Atomic Layer Deposition

Investigation of oxide thin films deposited by atomic layer deposition as dopant source for ultra-shallow doping of silicon

Deposition of Iridium Thin Films on Three-Dimensional Structures With PE-MOCVD

Investigation of Antimony Oxide Films Deposited by Atomic Layer Deposition

Observation of steplike sheet resistance increase of shallow doped bare silicon during initial contact to air

Enhanced Ferroelectric Properties of Multilayer SBT-BTN Thin Films for NVRAM Applications

Atomic Layer Deposition of Antimony Oxide on Hydrogen-terminated Silicon Substrates

Hot-Wire Chemical Vapor Deposition of Ge 2 Sb 2 Te 5 Thin Films

PECVD Synthesis of Silicon Nanowires Assisted by Templates of Gallium Islands

EVALUATION OF DIFFERENT METALORGANIC PRECURSORS FOR Ge-Sb-Te THIN FILM DEPOSITION

Activated Pulsed Metalorganic Chemical Vapor Deposition of Ge2Sb2Te5 Thin Films Using Alkyl Precursors

Activated Pulsed Metalorganic Chemical Vapor Deposition of Ge 2 Sb 2 Te 5 Thin Films Using Alkyl Precursors

Gallium Assisted PECVD Synthesis of Silicon Nanowires

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