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TOPCon – Technology options for cost efficient industrial manufacturing

Solar energy materials and solar cells, 2021-08, Vol.227, p.111100, Article 111100

2021

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High-temperature degradation in plasma-enhanced chemical vapor deposition Al2O3 surface passivation layers on crystalline silicon

Journal of applied physics, 2014-08, Vol.116 (5)

2014

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On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

Nanomaterials (Basel, Switzerland), 2020-11, Vol.10 (11), p.2214

2020

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Nanotextured multicrystalline Al-BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes

Physica status solidi. PSS-RRL. Rapid research letters, 2015-08, Vol.9 (8), p.448-452

2015

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Plasma-free Dry-chemical Texturing Process for High-efficiency Multicrystalline Silicon Solar Cells

Energy procedia, 2016-08, Vol.92, p.359-368

2016

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Optimized amorphous silicon nitride layers for the front side passivation of c-Si PERC solar cells

EPJ Photovoltaics, 2020, Vol.11, p.6

2020

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Laser‐enhanced contact optimization on iTOPCon solar cells

Progress in photovoltaics, 2022-12, Vol.30 (12), p.1393-1399

2022

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Laser‐enhanced contact optimization on i TOPCon solar cells

Progress in photovoltaics, 2022-12, Vol.30 (12), p.1393-1399

2022

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Optimizing Emitter Diffusion Process for Atmospheric Pressure Dry Nanotextured Monocrystalline PERC

IEEE journal of photovoltaics, 2022-01, Vol.12 (1), p.244-250

2022

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Efficient silicon nitride SiNx:H antireflective and passivation layers deposited by atmospheric pressure PECVD for silicon solar cells

Progress in photovoltaics, 2019-11, Vol.27 (11), p.1007-1019

2019

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On the emitter formation in nanotextured silicon solar cells to achieve improved electrical performances

Solar energy materials and solar cells, 2016-08, Vol.152, p.94-102

2016

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Inline PECVD Deposition of Poly‐Si‐Based Tunnel Oxide Passivating Contacts

Physica status solidi. A, Applications and materials science, 2018-12, Vol.215 (23), p.n/a

2018

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Atmospheric Pressure Dry Etching of Polysilicon Layers for Highly Reverse Bias‐Stable TOPCon Solar Cells

Solar RRL, 2022-05, Vol.6 (5), p.n/a

2022

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EFFICIENT SILICON NITRIDE SiNx:H ANTIREFLECTIVE AND PASSIVATION LAYERS DEPOSITED BY ATMOSPHERIC PRESSURE PECVD FOR LOW COST PERC SOLAR CELLS

Progress in photovoltaics, 2019-06, Vol.27 (11), p.1007-1019

2019

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Stack Diffusion Process for Cost- and Energy-Efficient Boron Emitter Formation

IEEE journal of photovoltaics, 2022-11, Vol.12 (6), p.1-7

2022

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Nanostructuring of c-Si surface by F 2 -based atmospheric pressure dry texturing process

Physica status solidi. A, Applications and materials science, 2015-02, Vol.212 (2), p.307-311

2015

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Efficient silicon nitride SiN x :H antireflective and passivation layers deposited by atmospheric pressure PECVD for silicon solar cells

Progress in photovoltaics, 2019-11, Vol.27 (11), p.1007-1019

2019

Volltextzugriff (PDF)

Nanostructuring of c-Si surface by F2-based atmospheric pressure dry texturing process

Physica status solidi. A, Applications and materials science, 2015-02, Vol.212 (2), p.307-311

2015

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Optimized Adhesion of Plated Silicon Solar Cell Contacts by F 2 ‐Based Dry Atmospheric Pressure Nano‐Roughening

Physica status solidi. A, Applications and materials science, 2018-11, Vol.215 (21)

2018

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Optimized Adhesion of Plated Silicon Solar Cell Contacts by F2‐Based Dry Atmospheric Pressure Nano‐Roughening

Physica status solidi. A, Applications and materials science, 2018-11, Vol.215 (21), p.n/a

2018

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On the Nature of Emitter Diffusion and Screen-Printing Contact Formation on Nanostructured Silicon Surfaces

IEEE journal of photovoltaics, 2017-01, Vol.7 (1), p.136-143

2017

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Nanostructuring of c-Si surface by F sub(2)-based atmospheric pressure dry texturing process

Physica status solidi. A, Applications and materials science, 2015-02, Vol.212 (2), p.307-311

2015

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Rear passivated mc-Si solar cells textured by atmospheric pressure dry etching

Energy procedia, 2017-09, Vol.124, p.260-266

2017

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High-temperature degradation in plasma-enhanced chemical vapor deposition Al{sub 2}O{sub 3} surface passivation layers on crystalline silicon

Journal of applied physics, 2014-08, Vol.116 (5)

2014

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Notice of Removal: On the nature of emitter diffusion and screen-printing contact formation on nanostructured silicon surfaces

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC), 2017, p.1-3

2017

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TOPCon – Technology options for cost efficient industrial manufacturing

High-temperature degradation in plasma-enhanced chemical vapor deposition Al2O3 surface passivation layers on crystalline silicon

On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

Nanotextured multicrystalline Al-BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes

Plasma-free Dry-chemical Texturing Process for High-efficiency Multicrystalline Silicon Solar Cells

Optimized amorphous silicon nitride layers for the front side passivation of c-Si PERC solar cells

Laser‐enhanced contact optimization on iTOPCon solar cells

Laser‐enhanced contact optimization on i TOPCon solar cells

Optimizing Emitter Diffusion Process for Atmospheric Pressure Dry Nanotextured Monocrystalline PERC

Efficient silicon nitride SiNx:H antireflective and passivation layers deposited by atmospheric pressure PECVD for silicon solar cells

On the emitter formation in nanotextured silicon solar cells to achieve improved electrical performances

Inline PECVD Deposition of Poly‐Si‐Based Tunnel Oxide Passivating Contacts

Atmospheric Pressure Dry Etching of Polysilicon Layers for Highly Reverse Bias‐Stable TOPCon Solar Cells

EFFICIENT SILICON NITRIDE SiNx:H ANTIREFLECTIVE AND PASSIVATION LAYERS DEPOSITED BY ATMOSPHERIC PRESSURE PECVD FOR LOW COST PERC SOLAR CELLS

Stack Diffusion Process for Cost- and Energy-Efficient Boron Emitter Formation

Nanostructuring of c-Si surface by F 2 -based atmospheric pressure dry texturing process

Efficient silicon nitride SiN x :H antireflective and passivation layers deposited by atmospheric pressure PECVD for silicon solar cells

Nanostructuring of c-Si surface by F2-based atmospheric pressure dry texturing process

Optimized Adhesion of Plated Silicon Solar Cell Contacts by F 2 ‐Based Dry Atmospheric Pressure Nano‐Roughening

Optimized Adhesion of Plated Silicon Solar Cell Contacts by F2‐Based Dry Atmospheric Pressure Nano‐Roughening

On the Nature of Emitter Diffusion and Screen-Printing Contact Formation on Nanostructured Silicon Surfaces

Nanostructuring of c-Si surface by F sub(2)-based atmospheric pressure dry texturing process

Rear passivated mc-Si solar cells textured by atmospheric pressure dry etching

High-temperature degradation in plasma-enhanced chemical vapor deposition Al{sub 2}O{sub 3} surface passivation layers on crystalline silicon

Notice of Removal: On the nature of emitter diffusion and screen-printing contact formation on nanostructured silicon surfaces

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