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Japan Meteorological Agency/Meteorological Research Institute Coupled Prediction System Version 3 (JMA/MRI–CPS3)

Journal of the Meteorological Society of Japan. Ser. II, 2023, Vol.101(2), pp.149-169

2023

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Environmental Lapse Rate for High‐Resolution Land Surface Downscaling: An Application to ERA5

Earth and space science (Hoboken, N.J.), 2020-05, Vol.7 (5), p.n/a

2020

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Typhoon Ensemble Prediction System Developed at the Japan Meteorological Agency

Monthly weather review, 2009-08, Vol.137 (8), p.2592-2604

2009

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Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography

Microelectronic engineering, 2014-06, Vol.121, p.142-146

2014

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Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Key engineering materials, 2013-01, Vol.534, p.126-130

2013

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Resolution Dependence of Singular Vectors Computed for Typhoon SINLAKU

SOLA, 2010, Vol.6, pp.45-48

2010

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Leukemia inhibitory factor induces multi-lineage differentiation of adult stem-like cells in kidney via kidney-specific cadherin 16

Biochemical and biophysical research communications, 2005-03, Vol.328 (1), p.288-291

2005

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Japan Meteorological Agency/Meteorological Research Institute Coupled Prediction System Version 3 (JMA/MRI-CPS3)

気象集誌. 第2輯, 2023, pp.2023-009

2023

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A Simple Design of Resonator-coupled Wireless Power Transfer System

IEEJ Transactions on Electronics, Information and Systems, 2010/12/01, Vol.130(12), pp.2198-2203

2010

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Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution

Japanese Journal of Applied Physics, 2013-12, Vol.52 (12), p.126504-126504-5

2013

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Ordering of 6-nm-sized nanodot arrays with 10-nm-pitch using self-assembled block copolymers along electron beam-drawn guide-lines

Microelectronic engineering, 2014-07, Vol.123, p.54-57

2014

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Musculin/MyoR is expressed in kidney side population cells and can regulate their function

The Journal of cell biology, 2005-06, Vol.169 (6), p.921-928

2005

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Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography: Nano Fabrication 2013

Microelectronic engineering, 2014, Vol.121, p.142-146

2014

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Comparative study of coil resonators for wireless power transfer system in terms of transfer loss

IEICE Electronics Express, 2010-01, Vol.7 (11), p.785-790

2010

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Impact of Resolution Degradation of the Initial Condition on Typhoon Track Forecasts

Weather and forecasting, 2010-10, Vol.25 (5), p.1568-1573

2010

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Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Key engineering materials, 2013-12, Vol.596, p.83-87

2013

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Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording

Key engineering materials, 2013-12, Vol.596, p.73-77

2013

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Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography

Key engineering materials, 2013-12, Vol.596, p.97-100

2013

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Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling

Key engineering materials, 2014-01, Vol.596, p.92-96

2014

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Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in.2 Patterned Media

Key engineering materials, 2013-12, Vol.596, p.78-82

2013

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Comparison of Nanosized Pattern of Calixarene and ZEP520 Resists by Using Energy Deposition Distribution

Key engineering materials, 2013-01, Vol.534, p.107-112

2013

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Electron Beam Lithography of $15\times 15$ nm2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Jpn J Appl Phys, 2012-06, Vol.51 (6), p.06FB02-06FB02-4

2012

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Electron Beam Lithography of 15×15 nm 2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Japanese Journal of Applied Physics, 2012-06, Vol.51 (6S), p.6

2012

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Electron Beam Lithography of 15×15 nm 2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Japanese Journal of Applied Physics, 2012-06, Vol.51 (6S), p.6

2012

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Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media

Key engineering materials, 2013-01, Vol.534, p.118-121

2013

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Japan Meteorological Agency/Meteorological Research Institute Coupled Prediction System Version 3 (JMA/MRI–CPS3)

Environmental Lapse Rate for High‐Resolution Land Surface Downscaling: An Application to ERA5

Typhoon Ensemble Prediction System Developed at the Japan Meteorological Agency

Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

Resolution Dependence of Singular Vectors Computed for Typhoon SINLAKU

Leukemia inhibitory factor induces multi-lineage differentiation of adult stem-like cells in kidney via kidney-specific cadherin 16

Japan Meteorological Agency/Meteorological Research Institute Coupled Prediction System Version 3 (JMA/MRI-CPS3)

A Simple Design of Resonator-coupled Wireless Power Transfer System

Simulation of Fine Resist Profile Formation by Electron Beam Drawing and Development with Solubility Rate Based on Energy Deposition Distribution

Ordering of 6-nm-sized nanodot arrays with 10-nm-pitch using self-assembled block copolymers along electron beam-drawn guide-lines

Musculin/MyoR is expressed in kidney side population cells and can regulate their function

Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography: Nano Fabrication 2013

Comparative study of coil resonators for wireless power transfer system in terms of transfer loss

Impact of Resolution Degradation of the Initial Condition on Typhoon Track Forecasts

Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly

Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording

Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography

Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling

Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in.2 Patterned Media

Comparison of Nanosized Pattern of Calixarene and ZEP520 Resists by Using Energy Deposition Distribution

Electron Beam Lithography of $15\times 15$ nm2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Electron Beam Lithography of 15×15 nm 2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Electron Beam Lithography of 15×15 nm 2 Pitched Nanodot Arrays with a Size of Less than 10 nm Using High Development Contrast Salty Developer

Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media

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