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Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma

Materials, 2024-08, Vol.17 (16), p.3917

2024

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High Responsivity β‑Ga2O3 Metal–Semiconductor–Metal Solar-Blind Photodetectors with Ultraviolet Transparent Graphene Electrodes

ACS photonics, 2018-03, Vol.5 (3), p.1123-1128

2018

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Fluorescence quenching caused by aggregation of water-soluble CdSe quantum dots

Colloids and surfaces. A, Physicochemical and engineering aspects, 2010-04, Vol.359 (1), p.39-44

2010

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Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC

Korean Journal of Chemical Engineering, 2024, 41(5), 290, pp.1307-1310

2024

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Chemical synthesis of cobalt oxide thin film electrode for supercapacitor application

Synthetic metals, 2010-06, Vol.160 (11), p.1299-1302

2010

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Plasma Surface Modification of 3Y-TZP at Low and Atmospheric Pressures with Different Treatment Times

International journal of molecular sciences, 2023-04, Vol.24 (8), p.7663

2023

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Surface Texturing of Si with Periodically Arrayed Oblique Nanopillars to Achieve Antireflection

Materials, 2021-01, Vol.14 (2), p.380

2021

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Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether

Korean Journal of Chemical Engineering, 2022, 39(1), 262, pp.63-68

2022

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Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas

Korean Journal of Chemical Engineering, 2020, 37(2), 239, pp.374-379

2020

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Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potential

Coatings (Basel), 2023-08, Vol.13 (8), p.1452

2023

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Electrodeposition of Manganese-Nickel Oxide Films on a Graphite Sheet for Electrochemical Capacitor Applications

Materials, 2014-01, Vol.7 (1), p.265-274

2014

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Human Trial for the Effect of Plasma-Activated Water Spray on Vaginal Cleaning in Patients with Bacterial Vaginosis

Medical sciences (Basel), 2022-06, Vol.10 (2), p.33

2022

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Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8

Coatings (Basel), 2022-05, Vol.12 (5), p.679

2022

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Angular Dependence of Si3N4 Etching in C4F6/CH2F2/O2/Ar Plasmas

Chemical engineering & technology, 2017-12, Vol.40 (12), p.2251-2256

2017

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Sensitivity Enhancement of Dielectric Plasma Etching Endpoint Detection by Optical Emission Spectra With Modified K -Means Cluster Analysis

IEEE transactions on semiconductor manufacturing, 2017-02, Vol.30 (1), p.17-22

2017

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High luminescence efficiency white light emitting diodes based on surface functionalized quantum dots dispersed in polymer matrices

Colloids and surfaces. A, Physicochemical and engineering aspects, 2013-07, Vol.428, p.86-91

2013

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Atmospheric-pressure floating electrode-dielectric barrier discharge with flexible electrodes: Effect of conductor shapes

Korean Journal of Chemical Engineering, 2019, 36(8), 233, pp.1371-1376

2019

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Clustering and Self‐Recovery of Slanted Hydrogel Micropillars

Advanced materials interfaces, 2018-12, Vol.5 (24), p.n/a

2018

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Effect of oxygen flow rate on the electrical and optical characteristics of dopantless tin oxide films fabricated by low pressure chemical vapor deposition

Korean Journal of Chemical Engineering, 2016, 33(9), 198, pp.2711-2715

2016

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Electrical Resistivity of Ni–Fe Wires Coated with Sn Using low-Pressure Chemical Vapor Deposition

Coatings (Basel), 2020-04, Vol.10 (4), p.317

2020

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SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether

Applied surface science, 2020-04, Vol.508, p.144787, Article 144787

2020

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Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)

2018

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Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether

Thin solid films, 2019-01, Vol.669, p.262-268

2019

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Cobalt–nickel composite films synthesized by chemical bath deposition method as an electrode material for supercapacitors

Journal of materials science, 2011-05, Vol.46 (9), p.2977-2981

2011

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Mechanism of Sidewall Necking and Bowing in the Plasma Etching of High Aspect-Ratio Contact Holes

Journal of the Electrochemical Society, 2010, Vol.157 (3), p.D142

2010

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Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma

High Responsivity β‑Ga2O3 Metal–Semiconductor–Metal Solar-Blind Photodetectors with Ultraviolet Transparent Graphene Electrodes

Fluorescence quenching caused by aggregation of water-soluble CdSe quantum dots

Heptafluoroisopropyl Methyl Ether as a Low Global Warming Potential Alternative for Plasma Etching of SiC

Chemical synthesis of cobalt oxide thin film electrode for supercapacitor application

Plasma Surface Modification of 3Y-TZP at Low and Atmospheric Pressures with Different Treatment Times

Surface Texturing of Si with Periodically Arrayed Oblique Nanopillars to Achieve Antireflection

Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether

Si3N4 etch rates at various ion-incidence angles in high-density CF4, CHF3, and C2F6 plasmas

Controlling Bowing and Narrowing in SiO2 Contact-Hole Etch Profiles Using Heptafluoropropyl Methyl Ether as an Etchant with Low Global Warming Potential

Electrodeposition of Manganese-Nickel Oxide Films on a Graphite Sheet for Electrochemical Capacitor Applications

Human Trial for the Effect of Plasma-Activated Water Spray on Vaginal Cleaning in Patients with Bacterial Vaginosis

Plasma Etching of SiO2 Contact Holes Using Hexafluoroisopropanol and C4F8

Angular Dependence of Si3N4 Etching in C4F6/CH2F2/O2/Ar Plasmas

Sensitivity Enhancement of Dielectric Plasma Etching Endpoint Detection by Optical Emission Spectra With Modified K -Means Cluster Analysis

High luminescence efficiency white light emitting diodes based on surface functionalized quantum dots dispersed in polymer matrices

Atmospheric-pressure floating electrode-dielectric barrier discharge with flexible electrodes: Effect of conductor shapes

Clustering and Self‐Recovery of Slanted Hydrogel Micropillars

Effect of oxygen flow rate on the electrical and optical characteristics of dopantless tin oxide films fabricated by low pressure chemical vapor deposition

Electrical Resistivity of Ni–Fe Wires Coated with Sn Using low-Pressure Chemical Vapor Deposition

SiO2 etching in inductively coupled plasmas using heptafluoroisopropyl methyl ether and 1,1,2,2-tetrafluoroethyl 2,2,2-trifluoroethyl ether

Quasi atomic layer etching of SiO2 using plasma fluorination for surface cleaning

Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether

Cobalt–nickel composite films synthesized by chemical bath deposition method as an electrode material for supercapacitors

Mechanism of Sidewall Necking and Bowing in the Plasma Etching of High Aspect-Ratio Contact Holes

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