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Controlled cobalt recess for advanced interconnect metallization

Microelectronic engineering, 2019-09, Vol.217, p.111131, Article 111131

2019

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Polymerization Behavior of Xanthate-Containing Monomers toward PPV Precursor Polymers: Study of the Elimination Behavior of Precursor Polymers and Oligomers with in-Situ FT-IR and UV−Vis Analytical Techniques

Macromolecules, 2002-10, Vol.35 (21), p.7902-7910

2002

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Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma

Japanese Journal of Applied Physics, 2008-08, Vol.47 (8S2), p.6870

2008

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Application of UV Irradiation in Removal of Post-etch 193 nm Photoresist

MRS proceedings, 2009, Vol.1156 (1), Article 1156-D02-09

2009

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Synthesis and Characterization of Poly(pyridine vinylene) via the Sulfinyl Precursor Route

Macromolecules, 2001-10, Vol.34 (21), p.7294-7299

2001

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Study of the thermal elimination and degradation processes of PPV and OC(1)C(10)-PPV (precursor) polymers with in-situ analytical techniques

Kesters, Els

2002

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Synthesis and characterization of poly(pyridine vinylene) via the sulfinyl precursor route: Structural Characterization of Ring Polystyrene by Liquid Chromatography at the Critical Condition and MALDI-TOF Mass Spectrometry

Macromolecules, 2001, Vol.34 (21), p.7294-7299

2001

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In-situ electrical and spectroscopical techniques for the study of degradation mechanisms and life time prediction of organic based electronic material systems

MRS proceedings, 2003, Vol.771, Article L12.3/H11.3

2003

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In-situ electrical and spectroscopical techniques for the study of degradation mechanisms and life time prediction of organic based electronic material systems

MRS proceedings, 2003, Vol.769, Article H11.3/L12.3

2003

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Wet Clean Applications in Porous Low‐k Patterning Processes

Advanced Interconnects for ULSI Technology, 2012, p.129-171

2012

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Controlled cobalt recess for advanced interconnect metallization

Polymerization Behavior of Xanthate-Containing Monomers toward PPV Precursor Polymers: Study of the Elimination Behavior of Precursor Polymers and Oligomers with in-Situ FT-IR and UV−Vis Analytical Techniques

Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma

Application of UV Irradiation in Removal of Post-etch 193 nm Photoresist

Synthesis and Characterization of Poly(pyridine vinylene) via the Sulfinyl Precursor Route

Study of the thermal elimination and degradation processes of PPV and OC(1)C(10)-PPV (precursor) polymers with in-situ analytical techniques

Synthesis and characterization of poly(pyridine vinylene) via the sulfinyl precursor route: Structural Characterization of Ring Polystyrene by Liquid Chromatography at the Critical Condition and MALDI-TOF Mass Spectrometry

In-situ electrical and spectroscopical techniques for the study of degradation mechanisms and life time prediction of organic based electronic material systems

In-situ electrical and spectroscopical techniques for the study of degradation mechanisms and life time prediction of organic based electronic material systems

Wet Clean Applications in Porous Low‐k Patterning Processes

PERISCOPE: road towards effective control of pertussis

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