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Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

ACS nano, 2013-12, Vol.7 (12), p.11333-11340

2013

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Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer

Nature communications, 2015-07, Vol.6 (1), p.7817-7817, Article 7817

2015

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The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration

Applied surface science, 2014-04, Vol.297, p.125-129

2014

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Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides

Scientific reports, 2016-01, Vol.6 (1), p.18754-18754, Article 18754

2016

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Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment

Applied physics letters, 2016-05, Vol.108 (21)

2016

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Very high frequency plasma reactant for atomic layer deposition

Applied surface science, 2016-11, Vol.387, p.109-117

2016

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Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-Film Transistors

IEEE electron device letters, 2016-05, Vol.37 (5), p.599-602

2016

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Fabrication of Transferable Al2O3 Nanosheet by Atomic Layer Deposition for Graphene FET

ACS applied materials & interfaces, 2014-02, Vol.6 (4), p.2764-2769

2014

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Building a deep learning-based QA system from a CQA dataset

Decision Support Systems, 2023-12, Vol.175, p.114038, Article 114038

2023

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Effects of Ar Addition to O 2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films

ACS applied materials & interfaces, 2018-11, Vol.10 (46), p.40286-40293

2018

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Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone

ACS applied materials & interfaces, 2018-01, Vol.10 (2), p.2143-2150

2018

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n-ZnO:N/p-Si nanowire photodiode prepared by atomic layer deposition

Applied physics letters, 2012-01, Vol.100 (4), p.041117-041117-4

2012

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Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Chemistry of materials, 2015-09, Vol.27 (17), p.5868-5877

2015

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Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films

ACS applied materials & interfaces, 2018-11, Vol.10 (46), p.40286-40293

2018

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Synthesis of Few-Layered Graphene Nanoballs with Copper Cores Using Solid Carbon Source

ACS applied materials & interfaces, 2013-04, Vol.5 (7), p.2432-2437

2013

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Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Journal of materials science, 2016-06, Vol.51 (11), p.5082-5091

2016

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Surface treatment process applicable to next generation graphene-based electronics

Carbon (New York), 2016-08, Vol.104, p.119-124

2016

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Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor

Applied surface science, 2015-07, Vol.343, p.128-132

2015

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Atomic layer deposition of HfO{sub 2} on graphene through controlled ion beam treatment

Applied physics letters, 2016-05, Vol.108 (21)

2016

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Optimization and device application potential of oxide–metal–oxide transparent electrode structure

RSC advances, 2015-01, Vol.5 (80), p.65094-65099

2015

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Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y 2 O 3 with Ozone

ACS applied materials & interfaces, 2018-01, Vol.10 (2), p.2143-2150

2018

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Growth characteristics and electrical properties of SiO.sub.2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Journal of materials science, 2016-06, Vol.51 (11), p.5082

2016

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Growth characteristics and electrical properties of SiO sub(2) thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Journal of materials science, 2016-06, Vol.51 (11), p.5082-5091

2016

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Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-05, Vol.35 (3)

2017

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Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition

2d materials, 2019-01, Vol.6 (1)

2019

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Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer

The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration

Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides

Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment

Very high frequency plasma reactant for atomic layer deposition

Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-Film Transistors

Fabrication of Transferable Al2O3 Nanosheet by Atomic Layer Deposition for Graphene FET

Building a deep learning-based QA system from a CQA dataset

Effects of Ar Addition to O 2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films

Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone

n-ZnO:N/p-Si nanowire photodiode prepared by atomic layer deposition

Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films

Synthesis of Few-Layered Graphene Nanoballs with Copper Cores Using Solid Carbon Source

Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Surface treatment process applicable to next generation graphene-based electronics

Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor

Atomic layer deposition of HfO{sub 2} on graphene through controlled ion beam treatment

Optimization and device application potential of oxide–metal–oxide transparent electrode structure

Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y 2 O 3 with Ozone

Growth characteristics and electrical properties of SiO.sub.2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Growth characteristics and electrical properties of SiO sub(2) thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors

Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition

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