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Diffraction-limited soft-x-ray projection imaging using a laser plasma source

Optics letters, 1991-10, Vol.16 (20), p.1557

1991

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Compound Bragg reflection filters made by spatial frequency doubling lithography

Journal of lightwave technology, 1989-09, Vol.7 (9), p.1379-1385, Article 1379

1989

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Reflective mask technologies and imaging results in soft x-ray projection lithography

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1991-11, Vol.9 (6), p.3176-3183

1991

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Use of trilevel resists for high-resolution soft-x-ray projection lithography

Applied physics letters, 1990-05, Vol.56 (22), p.2180-2182

1990

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Soft-x-ray projection lithography experiments using Schwarzschild imaging optics

Applied Optics, 1993-12, Vol.32 (34), p.7068

1993

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Spatial frequency doubling lithography (SFDL) of periodic structures for integrated optical circuit technology

Journal of lightwave technology, 1989-09, Vol.7 (9), p.1386-1393

1989

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Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Optics letters, 1990-05, Vol.15 (10), p.529

1990

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Soft-x-ray projection imaging with a 1:1 ring-field optic

Applied Optics, 1993-12, Vol.32 (34), p.7072

1993

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Reduction imaging with soft x rays for projection lithography

Review of Scientific Instruments, 1992-01, Vol.63 (1), p.737-740

1992

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Experiments in projection lithography using soft x-rays

Microelectronic engineering, 1991-01, Vol.13 (1-4), p.243-250

1991

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Soft x-ray projection lithography using a 1:1 ring field optical system

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1991-11, Vol.9 (6), p.3193-3197

1991

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Diffraction-limited soft x-ray projection lithography with a laser plasma source

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1991-11, Vol.9 (6), p.3184-3188

1991

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Excimer Laser Based Lithography: A Deep-Ultraviolet Wafer Stepper For VLSI Processing

Optical engineering, 1987-04, Vol.26 (4), p.264311

1987

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The Politics of Reapportionment

Jewell, Malcolm

1st edition., 2011

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Short‐wavelength annular‐field optical system for imaging tenth‐micron features

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1989-11, Vol.7 (6), p.1613-1615

1989

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Reduction imaging at 14 nm using multilayer‐coated optics: Printing of features smaller than 0.1 μm

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1990-11, Vol.8 (6), p.1509-1513

1990

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Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1994-11, Vol.12 (6), p.3820-3825

1994

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