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Smart Nanostructured Materials based on Self‐Assembly of Block Copolymers

Advanced functional materials, 2020-01, Vol.30 (2), p.n/a

2020

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Wafer‐Scale Synthesis of Reliable High‐Mobility Molybdenum Disulfide Thin Films via Inhibitor‐Utilizing Atomic Layer Deposition

Advanced materials (Weinheim), 2017-12, Vol.29 (47), p.n/a

2017

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Flash Light Millisecond Self‐Assembly of High χ Block Copolymers for Wafer‐Scale Sub‐10 nm Nanopatterning

Advanced materials (Weinheim), 2017-08, Vol.29 (32), p.n/a

2017

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Directed self-assembly of block copolymers for next generation nanolithography

Materials today (Kidlington, England), 2013-12, Vol.16 (12), p.468-476

2013

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Mechanically Guided Post‐Assembly of 3D Electronic Systems

Advanced functional materials, 2018-11, Vol.28 (48), p.n/a

2018

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Flexible and Transferrable Self-Assembled Nanopatterning on Chemically Modified Graphene

Advanced materials (Weinheim), 2013-03, Vol.25 (9), p.1331-1335

2013

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3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Advanced materials (Weinheim), 2016-02, Vol.28 (8), p.1591-1596

2016

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Development and economic analysis of bioethanol production facilities using lignocellulosic biomass

Journal of bioscience and bioengineering, 2019-10, Vol.128 (4), p.475-479

2019

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Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

Advanced materials (Weinheim), 2008-05, Vol.20 (10), p.1898-1904

2008

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Sub-Nanometer Level Size Tuning of a Monodisperse Nanoparticle Array Via Block Copolymer Lithography

Advanced functional materials, 2011-01, Vol.21 (2), p.250-254

2011

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Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography

ACS nano, 2010-09, Vol.4 (9), p.5464-5470

2010

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Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

Advanced materials (Weinheim), 2016-10, Vol.28 (38), p.8439-8445

2016

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One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy

Nano letters, 2010-09, Vol.10 (9), p.3500-3505

2010

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Bimodal phase separated block copolymer/homopolymer blends self-assembly for hierarchical porous metal nanomesh electrodes

Nanoscale, 2018-01, Vol.10 (1), p.100-108

2018

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Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning

ACS nano, 2010-09, Vol.4 (9), p.5181-5186

2010

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Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning

Advanced materials (Weinheim), 2008-06, Vol.20 (12), p.2303-2307

2008

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Production of anhydrous ethanol using oil palm empty fruit bunch in a pilot plant

Biomass & bioenergy, 2014-08, Vol.67, p.99-107

2014

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Direct 3-D Nanoparticle Assemblies in Thin Films via Topographically Patterned Surfaces

Advanced materials (Weinheim), 2014-05, Vol.26 (18), p.2777-2781

2014

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Production of anhydrous ethanol using various PSA (Pressure Swing Adsorption) processes in pilot plant

Renewable energy, 2012-06, Vol.42, p.41-45

2012

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Spontaneous Lamellar Alignment in Thickness‐Modulated Block Copolymer Films

Advanced functional materials, 2009-08, Vol.19 (16), p.2584-2591

2009

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Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS

ACS applied materials & interfaces, 2018-12, Vol.10 (51), p.44660-44667

2018

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Neutral-layer-free directed self-assembly of block copolymer in trench using capillary force-induced meniscus

Nanotechnology, 2021-01, Vol.32 (4), p.04LT01-04LT01

2021

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MoS2–InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity

ACS applied materials & interfaces, 2016-04, Vol.8 (13), p.8576-8582

2016

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Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Small (Weinheim an der Bergstrasse, Germany), 2014-10, Vol.10 (20), p.4207-4212

2014

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Atomic layer deposition of Al2O3 on MoS2, WS2, WSe2, and h-BN: surface coverage and adsorption energy

RSC advances, 2017-01, Vol.7 (2), p.884-889

2017

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Smart Nanostructured Materials based on Self‐Assembly of Block Copolymers

Wafer‐Scale Synthesis of Reliable High‐Mobility Molybdenum Disulfide Thin Films via Inhibitor‐Utilizing Atomic Layer Deposition

Flash Light Millisecond Self‐Assembly of High χ Block Copolymers for Wafer‐Scale Sub‐10 nm Nanopatterning

Directed self-assembly of block copolymers for next generation nanolithography

Mechanically Guided Post‐Assembly of 3D Electronic Systems

Flexible and Transferrable Self-Assembled Nanopatterning on Chemically Modified Graphene

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene

Development and economic analysis of bioethanol production facilities using lignocellulosic biomass

Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers

Sub-Nanometer Level Size Tuning of a Monodisperse Nanoparticle Array Via Block Copolymer Lithography

Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography

Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy

Bimodal phase separated block copolymer/homopolymer blends self-assembly for hierarchical porous metal nanomesh electrodes

Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning

Hierarchical Self-Assembly of Block Copolymers for Lithography-Free Nanopatterning

Production of anhydrous ethanol using oil palm empty fruit bunch in a pilot plant

Direct 3-D Nanoparticle Assemblies in Thin Films via Topographically Patterned Surfaces

Production of anhydrous ethanol using various PSA (Pressure Swing Adsorption) processes in pilot plant

Spontaneous Lamellar Alignment in Thickness‐Modulated Block Copolymer Films

Ultralarge Area Sub-10 nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High-Sensitivity SERS

Neutral-layer-free directed self-assembly of block copolymer in trench using capillary force-induced meniscus

MoS2–InGaZnO Heterojunction Phototransistors with Broad Spectral Responsivity

Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Atomic layer deposition of Al2O3 on MoS2, WS2, WSe2, and h-BN: surface coverage and adsorption energy

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