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Applications of spectroscopic ellipsometry to microelectronics

Thin solid films, 1993-10, Vol.233 (1), p.96-111

Irene, E.A.

1993

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Suicide death and hospital-treated suicidal behaviour in asylum seekers in the Netherlands: a national registry-based study

BMC public health, 2011-06, Vol.11 (1), p.484-484, Article 484

2011

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A spectroscopic immersion ellipsometry study of SiO2-Si interface roughness for electron cyclotron resonance plasma and thermally oxidized Si surfaces

Thin solid films, 1998-02, Vol.313-314, p.286-291

1998

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Mortality and causes of death among asylum seekers in the Netherlands, 2002–2005

Journal of epidemiology and community health (1979), 2011-04, Vol.65 (4), p.376-383

2011

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In Situ Ellipsometry in Microelectronics

MRS bulletin, 1995-05, Vol.20 (5), p.24-28

1995

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Electronic materials science

Irene, Eugene A

1, 2005

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Ellipsometry study of poly( o-methoxyaniline) thin films

Thin solid films, 2006-04, Vol.500 (1), p.252-258

2006

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A study of the optical and electronic properties of poly (vinylidene fluoride–trifluoroethylene) copolymer thin films

Thin solid films, 2006-08, Vol.513 (1), p.283-288

2006

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Optical properties of N, N′-bis(3-phenoxy-3-phenoxy-phenoxy)-1,4,5,8-naphthalene-tetracarboxylic diimide by spectroscopic ellipsometry

Thin solid films, 2006-04, Vol.500 (1), p.9-14

2006

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Pre-Oxidation Anneal Kinetics: Interface Degradation of Thin SIO2 Films on Silicon

MRS proceedings, 1992, Vol.259

1992

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Magnesium oxide as a candidate high-{kappa} gate dielectric

Applied physics letters, 2006-04, Vol.88 (14)

2006

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A spectroscopic immersion ellipsometry study of SiO 2-Si interface roughness for electron cyclotron resonance plasma and thermally oxidized Si surfaces

Thin solid films, 1998, Vol.313, p.286-291

1998

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Molecular sieving by electropolymerized porphyrin films only a few monolayers thick

Journal of physical chemistry (1952), 1989-07, Vol.93 (14), p.5568-5574

1989

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Studies of Silicon Oxynitride Films Produced by Radio-Frequency Plasma Assisted Electron Cyclotron Resonance

MRS proceedings, 2000, Vol.648, Article P6.2

2000

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In situ ellipsometry for monitoring nucleation and growth of silicon on silicon dioxide

Thin solid films, 1998-02, Vol.313 (1-2), p.424-429

1998

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A spectroscopic anisotropy ellipsometry study of YBa 2Cu 3O 7− x superconductors

Thin solid films, 1998, Vol.313, p.362-367

1998

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An electrical study of a thin film poly(o-methoxyaniline) field effect transitor

Synthetic metals, 2001-03, Vol.121 (1), p.1687-1688

2001

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An in situ and ex situ ellipsometry comparison of the interfaces of Si and GaAs resulting from thermal and plasma oxidation

Thin solid films, 1998-02, Vol.313 (1-2), p.454-458

1998

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Pre-Oxidation Anneal Kinetics: Interface Degradation of Thin SIO 2 Films on Silicon

MRS proceedings, 1992, Vol.259, Article 93

1992

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A spectroscopic anisotropy ellipsometry study of YBa2Cu3O7−x superconductors

Thin solid films, 1998-02, Vol.313-314, p.362-367

1998

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Fowler-Nordheim Tunneling Current Oscillation Study of Interface Roughness

MRS proceedings, 1999, Vol.567, Article 221

1999

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A comparison of the Oxidation and Passivation of Si, Ge and InP

Materials science forum, 1995, Vol.185-188, p.37-42

Irene, E.A.

1995

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In-Situ Real-Time Ellipsometry Study of Dynamic Processes of YBa 2 Cu 3 O 7−x Thin Films

MRS proceedings, 1999, Vol.569, Article 77

1999

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A square law for the analysis of real time ellipsometric nucleation and growth data

Thin solid films, 1998-02, Vol.313 (1-2), p.416-419

1998

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In-situ real time studies of nickel silicide formation

MRS proceedings, 1999, Vol.569, Article 121

1999

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Applications of spectroscopic ellipsometry to microelectronics

Suicide death and hospital-treated suicidal behaviour in asylum seekers in the Netherlands: a national registry-based study

A spectroscopic immersion ellipsometry study of SiO2-Si interface roughness for electron cyclotron resonance plasma and thermally oxidized Si surfaces

Mortality and causes of death among asylum seekers in the Netherlands, 2002–2005

In Situ Ellipsometry in Microelectronics

Electronic materials science

Ellipsometry study of poly( o-methoxyaniline) thin films

A study of the optical and electronic properties of poly (vinylidene fluoride–trifluoroethylene) copolymer thin films

Optical properties of N, N′-bis(3-phenoxy-3-phenoxy-phenoxy)-1,4,5,8-naphthalene-tetracarboxylic diimide by spectroscopic ellipsometry

Pre-Oxidation Anneal Kinetics: Interface Degradation of Thin SIO2 Films on Silicon

Magnesium oxide as a candidate high-{kappa} gate dielectric

A spectroscopic immersion ellipsometry study of SiO 2-Si interface roughness for electron cyclotron resonance plasma and thermally oxidized Si surfaces

Molecular sieving by electropolymerized porphyrin films only a few monolayers thick

Studies of Silicon Oxynitride Films Produced by Radio-Frequency Plasma Assisted Electron Cyclotron Resonance

In situ ellipsometry for monitoring nucleation and growth of silicon on silicon dioxide

A spectroscopic anisotropy ellipsometry study of YBa 2Cu 3O 7− x superconductors

An electrical study of a thin film poly(o-methoxyaniline) field effect transitor

An in situ and ex situ ellipsometry comparison of the interfaces of Si and GaAs resulting from thermal and plasma oxidation

Pre-Oxidation Anneal Kinetics: Interface Degradation of Thin SIO 2 Films on Silicon

A spectroscopic anisotropy ellipsometry study of YBa2Cu3O7−x superconductors

Fowler-Nordheim Tunneling Current Oscillation Study of Interface Roughness

A comparison of the Oxidation and Passivation of Si, Ge and InP

In-Situ Real-Time Ellipsometry Study of Dynamic Processes of YBa 2 Cu 3 O 7−x Thin Films

A square law for the analysis of real time ellipsometric nucleation and growth data

In-situ real time studies of nickel silicide formation

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