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Development of boron calibration via hybrid comparator method in prompt gamma activation analysis

Journal of radioanalytical and nuclear chemistry, 2018-10, Vol.318 (1), p.271-277

2018

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Thin films of a-SiGe:H with device quality properties prepared by a novel hollow cathode deposition technique

Solar energy materials and solar cells, 2005-05, Vol.87 (1), p.87-98

2005

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Thin films of GeC deposited using a unique hollow cathode sputtering technique

Solar energy materials and solar cells, 2006-09, Vol.90 (15), p.2338-2345

2006

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Modeling Changes in Measured Conductance of Thin Boron Carbide Semiconducting Films Under Irradiation

IEEE transactions on nuclear science, 2016-12, Vol.63 (6), p.2815-2822

2016

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Analysis of semiconductor thin films deposited using a hollow cathode plasma torch

Solar energy materials and solar cells, 2007-09, Vol.91 (15), p.1383-1387

2007

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Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurements

Thin solid films, 2004-05, Vol.455 (Complete), p.443-449

2004

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Epoxy catalyzed sol–gel method for pinhole-free pyrite FeS2 thin films

Journal of alloys and compounds, 2014-09, Vol.607, p.169-176

2014

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Formation of CuIn1−xAlxSe2 thin films studied by Raman scattering

Thin solid films, 2011-06, Vol.519 (16), p.5329-5334

2011

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Thin films formed by selenization of CuInxB1-x precursors in Se vapor

Solar energy materials and solar cells, 2009, Vol.93 (1), p.45-50

2009

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A non-vacuum process for preparing nanocrystalline CuIn1-xGaxSe2 materials involving an open-air solvothermal reaction

Solar energy materials and solar cells, 2010, Vol.94 (1), p.8-11

2010

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Aluminum oxynitride coatings for oxidation resistance of epoxy films

Surface & coatings technology, 2002-06, Vol.155 (2), p.130-135

2002

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Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films

Surface & coatings technology, 2002-10, Vol.160 (2), p.114-123

2002

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Deposition of diamond-like carbon on a titanium biomedical alloy

Thin solid films, 1995-12, Vol.270 (1), p.275-278

1995

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Sputter deposition of high resistivity boron carbide

Thin solid films, 1998-12, Vol.335 (1), p.174-177

1998

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Characterization of pulsed laser deposited zinc oxide

Thin solid films, 1992-11, Vol.220 (1), p.92-99

1992

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Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometry

Thin solid films, 2004-05, Vol.455 (Complete), p.645-649

2004

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Self-assembled networks with neural computing attributes

Smart materials and structures, 2002-10, Vol.11 (5), p.761-766

2002

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Fabrication of boron-carbide/boron heterojunction devices

Applied physics letters, 1996-03, Vol.68 (11), p.1495-1497

1996

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Sound velocity and Young’s modulus in plasma deposited amorphous hydrogenated carbon

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2826-2830

2001

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Electrical and structural characterization of neutron irradiated amorphous boron carbide/silicon p-n heterojunctions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2018-10, Vol.432 (C), p.48-54

2018

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The effect of deposition conditions on the atomic oxygen induced degradation of MgF2 anti-reflective coatings

2010 35th IEEE Photovoltaic Specialists Conference, 2010, p.002546-002549

2010

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Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system

Surface & coatings technology, 2004-01, Vol.177, p.676-681

2004

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Chemical bath deposition (CBD) of iron sulfide thin films for photovoltaic applications, crystallographic and optical properties

2010 35th IEEE Photovoltaic Specialists Conference, 2010, p.002965-002969

2010

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Heterojunction fabrication by selective area chemical vapor deposition induced by synchrotron radiation

Applied physics letters, 1994-04, Vol.64 (15), p.1968-1970

1994

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Formation of pyrite ( FeS 2 ) thin films by thermal sulfurization of dc magnetron sputtered iron

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2011-01, Vol.29 (1), p.011001-011001-5

2011

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Development of boron calibration via hybrid comparator method in prompt gamma activation analysis

Thin films of a-SiGe:H with device quality properties prepared by a novel hollow cathode deposition technique

Thin films of GeC deposited using a unique hollow cathode sputtering technique

Modeling Changes in Measured Conductance of Thin Boron Carbide Semiconducting Films Under Irradiation

Analysis of semiconductor thin films deposited using a hollow cathode plasma torch

Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurements

Epoxy catalyzed sol–gel method for pinhole-free pyrite FeS2 thin films

Formation of CuIn1−xAlxSe2 thin films studied by Raman scattering

Thin films formed by selenization of CuInxB1-x precursors in Se vapor

A non-vacuum process for preparing nanocrystalline CuIn1-xGaxSe2 materials involving an open-air solvothermal reaction

Aluminum oxynitride coatings for oxidation resistance of epoxy films

Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films

Deposition of diamond-like carbon on a titanium biomedical alloy

Sputter deposition of high resistivity boron carbide

Characterization of pulsed laser deposited zinc oxide

Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometry

Self-assembled networks with neural computing attributes

Fabrication of boron-carbide/boron heterojunction devices

Sound velocity and Young’s modulus in plasma deposited amorphous hydrogenated carbon

Electrical and structural characterization of neutron irradiated amorphous boron carbide/silicon p-n heterojunctions

The effect of deposition conditions on the atomic oxygen induced degradation of MgF2 anti-reflective coatings

Deposition of high quality amorphous silicon, germanium and silicon-germanium thin films by a hollow cathode reactive sputtering system

Chemical bath deposition (CBD) of iron sulfide thin films for photovoltaic applications, crystallographic and optical properties

Heterojunction fabrication by selective area chemical vapor deposition induced by synchrotron radiation

Formation of pyrite ( FeS 2 ) thin films by thermal sulfurization of dc magnetron sputtered iron

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