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Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films

Surface & coatings technology, 1999-01, Vol.111 (2), p.163-171

1999

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Characterisation of aluminium oxynitride gas barrier films

Thin solid films, 2001-06, Vol.388 (1), p.78-86

2001

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A microstructural study of transparent metal oxide gas barrier films

Thin solid films, 1999-11, Vol.355-356, p.500-505

1999

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Substrate effects from an unbalanced magnetron

Thin solid films, 1990, Vol.193 (1-2), p.127-137

1990

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High rate reactive sputtering using gas pulsing : a technique for the creation of films onto large, flat substrates

Thin solid films, 1999-08, Vol.351 (1-2), p.32-36

1999

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Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates

Surface & coatings technology, 1998-02, Vol.99 (1), p.147-160

1998

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Composition and conductivity of fluorine-doped conducting indium oxide films prepared by reactive ion plating

Thin solid films, 1981-03, Vol.77 (4), p.351-357

1981

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Reactive filtered arc evaporation

Vacuum, 2001-03, Vol.60 (3), p.361-368

2001

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The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant

Thin solid films, 1999, Vol.343, p.115-118

1999

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Fluorine doping of IN2O3 films employing ion-plating techniques

Thin solid films, 1981-06, Vol.80 (1-3), p.63-66

1981

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Composition control in conducting oxide thin films

Thin solid films, 1982-10, Vol.96 (2), p.121-127

1982

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Optical TiN films by filtered arc evaporation

Surface & coatings technology, 1997-06, Vol.92 (1), p.29-33

1997

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Synthesis of sputtered thin films in low energy ion beams

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1997, Vol.121 (1), p.65-72

Howson, R.P.

1997

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Production of transparent electrically conducting films by ion plating

Thin solid films, 1981-06, Vol.80 (1), p.137-142

1981

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Optical thin films obtained by plasma-induced chemical vapor deposition

Thin solid films, 1981-09, Vol.83 (2), p.253-258

1981

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The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content

Surface & coatings technology, 1998-02, Vol.99 (1), p.33-41

1998

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The optical properties of evaporated silicon oxide films

Thin solid films, 1972, Vol.9 (1), p.109-119

1972

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Composite metal/C:H films prepared in an unbalanced magnetron

Vacuum, 1997-10, Vol.48 (10), p.883-886

1997

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Sputtering of indium-tin oxide

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1997, Vol.121 (1), p.96-101

1997

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Reactive magnetron sputtering of silicon to produce silicon oxide

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 1997, Vol.121 (1), p.90-95

1997

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Reactive sputtering of electrically conducting tin oxide

Thin solid films, 1991-02, Vol.196 (2), p.315-321

1991

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Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

Vacuum, 1996-12, Vol.47 (12), p.1453-1463

1996

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Dynamic control of reactive magnetron sputtering: A theoretical analysis

Thin solid films, 1990-04, Vol.186 (1), p.129-136

1990

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Design and use of a vacuum system for high rate reactive sputtering of TiO2/TiN/TiO2 solar control films

Solar energy materials, 1988-12, Vol.18 (1-2), p.87-95

1988

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Fluorine doping of IN 2O 3 films employing ion-plating techniques

Thin solid films, 1981, Vol.80 (1), p.63-66

1981

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Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films

Characterisation of aluminium oxynitride gas barrier films

A microstructural study of transparent metal oxide gas barrier films

Substrate effects from an unbalanced magnetron

High rate reactive sputtering using gas pulsing : a technique for the creation of films onto large, flat substrates

Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates

Composition and conductivity of fluorine-doped conducting indium oxide films prepared by reactive ion plating

Reactive filtered arc evaporation

The properties of reactively-sputtered, stoichiometry-controlled and optimum-conductivity transparent indium oxide films as a function of their titanium, aluminium and zinc content; comparisons with the use of tin as a dopant

Fluorine doping of IN2O3 films employing ion-plating techniques

Composition control in conducting oxide thin films

Optical TiN films by filtered arc evaporation

Synthesis of sputtered thin films in low energy ion beams

Production of transparent electrically conducting films by ion plating

Optical thin films obtained by plasma-induced chemical vapor deposition

The properties of reactively sputtered, stoichiometry-controlled and optimum-conductivity transparent zinc/aluminium oxide films as a function of their aluminium content

The optical properties of evaporated silicon oxide films

Composite metal/C:H films prepared in an unbalanced magnetron

Sputtering of indium-tin oxide

Reactive magnetron sputtering of silicon to produce silicon oxide

Reactive sputtering of electrically conducting tin oxide

Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

Dynamic control of reactive magnetron sputtering: A theoretical analysis

Design and use of a vacuum system for high rate reactive sputtering of TiO2/TiN/TiO2 solar control films

Fluorine doping of IN 2O 3 films employing ion-plating techniques

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