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Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas

Chemical vapor deposition, 2005-12, Vol.11 (11-12), p.457-468

2005

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Remote AP-PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO)

Chemical vapor deposition, 2005-12, Vol.11 (11-12), p.481-490

2005

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The reduction of l-cystine hydrochloride at stationary and rotating disc mercury electrodes

Electrochimica acta, 2005-10, Vol.51 (1), p.133-145

2005

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Considerations for the Selection and Design of Sampling Systems for Heterogeneous Processes in a Stirred Tank Reactor

Chemical engineering research & design, 2005-04, Vol.83 (4), p.344-351

2005

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The reduction of l-cystine in hydrochloric acid at mercury drop electrodes

Journal of electroanalytical chemistry (Lausanne, Switzerland), 2006-02, Vol.587 (1), p.31-41

2006

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Disposal methods for chlorinated aromatic waste

Chemical Society reviews, 1995, Vol.24 (6), p.423

1995

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The reduction of l-cystine hydrochloride at lead using static and rotating disc electrodes

Journal of electroanalytical chemistry (Lausanne, Switzerland), 2005-09, Vol.583 (2), p.260-272

2005

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CVD comes of age

Chemical vapor deposition, 2005-01, Vol.11 (1), p.7-7

Hitchman, M. L.

2005

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An investigation of the electrochemical reduction of pentachlorophenol with analysis by HPLC

Journal of applied electrochemistry, 1997, Vol.27 (1), p.51-57

1997

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Evaluation of a reactor model and cathode materials for batch electrolysis of l-cystine hydrochloride

Journal of electroanalytical chemistry (Lausanne, Switzerland), 1999-02, Vol.462 (1), p.97-110

1999

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Determination of pesticides using electrochemical biosensors

TrAC, Trends in analytical chemistry (Regular ed.), 1996, Vol.15 (1), p.38-45

1996

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An overview of the deposition chemistry and the properties of in situ doped polysilicon prepared by low pressure chemical vapour deposition

Journal of materials science, 1995-08, Vol.30 (16), p.4115-4124

1995

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Avoidant/restrictive food intake disorder (ARFID) in New Zealand and Australia: a scoping review

Journal of eating disorders, 2023-11, Vol.11 (1), p.196-196, Article 196

2023

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CVD preparation and characterization of tin dioxide films for electrochemical applications

Journal of materials chemistry, 1997, Vol.7 (8), p.1421-1427

1997

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Potentiometric determination of proton activities in solutions containing hydrofluoric acid using thermally oxidized iridium electrodes

Analyst (London), 1991, Vol.116 (11), p.1131-1133

1991

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Some considerations of the thermodynamics and kinetics of the chemical vapour deposition of tungsten

Applied surface science, 1989-09, Vol.38 (1), p.312-337

1989

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Advanced Materials CVD Leads the ISI Citation Index for Coatings and Thin Films

Chemical vapor deposition, 2002-12, Vol.8 (6), p.235-235

Hitchman, M. L.

2002

Volltextzugriff (PDF)

Mass transport in an electrochemical laboratory filterpress reactor and its enhancement by turbulence promoters

Electrochimica acta, 1996-03, Vol.41 (4), p.591-603

1996

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An investigation of the relative roles of kinetics and transport in cathodic inhibition

Corrosion science, 1994-07, Vol.36 (7), p.1237-1246

1994

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The optical, thermal and electrochemical properties of co-electropolymerised films of acrylamide and carbazole

Synthetic metals, 2000-04, Vol.110 (2), p.165-174

2000

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Studies of TiO2 thin films prepared by chemical vapour deposition for photocatalytic and photoelectrocatalytic degradation of 4-chlorophenol

Journal of electroanalytical chemistry (Lausanne, Switzerland), 2002-12, Vol.538-539, p.165-172

2002

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Low pressure chemical vapour deposition—some considerations, some models, some insights

Vacuum, 1990, Vol.41 (4), p.880-884

Hitchman, M.L

1990

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Editorial: The CVD Team

Chemical vapor deposition, 2006-01, Vol.12 (1), p.7-8

Hitchman, M. L.

2006

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Study of the factors affecting mass transport in electrochemical gas sensors

Analyst (London), 1997, Vol.122 (11), p.1411-1417

1997

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Editorial: Atmospheric Pressure Plasma Enhanced CVD

Chemical vapor deposition, 2005-12, Vol.11 (11-12), p.455-455

Hitchman, M. L.

2005

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Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas

Remote AP-PECVD of Silicon Dioxide Films from Hexamethyldisiloxane (HMDSO)

The reduction of l-cystine hydrochloride at stationary and rotating disc mercury electrodes

Considerations for the Selection and Design of Sampling Systems for Heterogeneous Processes in a Stirred Tank Reactor

The reduction of l-cystine in hydrochloric acid at mercury drop electrodes

Disposal methods for chlorinated aromatic waste

The reduction of l-cystine hydrochloride at lead using static and rotating disc electrodes

CVD comes of age

An investigation of the electrochemical reduction of pentachlorophenol with analysis by HPLC

Evaluation of a reactor model and cathode materials for batch electrolysis of l-cystine hydrochloride

Determination of pesticides using electrochemical biosensors

An overview of the deposition chemistry and the properties of in situ doped polysilicon prepared by low pressure chemical vapour deposition

Avoidant/restrictive food intake disorder (ARFID) in New Zealand and Australia: a scoping review

CVD preparation and characterization of tin dioxide films for electrochemical applications

Potentiometric determination of proton activities in solutions containing hydrofluoric acid using thermally oxidized iridium electrodes

Some considerations of the thermodynamics and kinetics of the chemical vapour deposition of tungsten

Advanced Materials CVD Leads the ISI Citation Index for Coatings and Thin Films

Mass transport in an electrochemical laboratory filterpress reactor and its enhancement by turbulence promoters

An investigation of the relative roles of kinetics and transport in cathodic inhibition

The optical, thermal and electrochemical properties of co-electropolymerised films of acrylamide and carbazole

Studies of TiO2 thin films prepared by chemical vapour deposition for photocatalytic and photoelectrocatalytic degradation of 4-chlorophenol

Low pressure chemical vapour deposition—some considerations, some models, some insights

Editorial: The CVD Team

Study of the factors affecting mass transport in electrochemical gas sensors

Editorial: Atmospheric Pressure Plasma Enhanced CVD

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