UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition

Japanese Journal of Applied Physics, 2019-11, Vol.58 (11), p.110902

2019

Volltextzugriff (PDF)

Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-05, Vol.38 (3)

2020

Volltextzugriff (PDF)

Separation and Recovery of Lithium, Cobalt and Nickel Ion in an Aqueous Phase by Slug Flow

MATEC Web of Conferences, 2021, Vol.333, p.5004

2021

Volltextzugriff (PDF)

New era of silicon technologies due to radical reaction based semiconductor manufacturing

Journal of physics. D, Applied physics, 2006-01, Vol.39 (1), p.R1-R17

2006

Volltextzugriff (PDF)

Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-09, Vol.38 (5)

2020

Volltextzugriff (PDF)

Very High Carrier Mobility for High-Performance CMOS on a Si(110) Surface

IEEE transactions on electron devices, 2007-06, Vol.54 (6), p.1438-1445

2007

Volltextzugriff (PDF)

Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition

Thin solid films, 2010-03, Vol.518 (11), p.2953-2956

2010

Volltextzugriff (PDF)

Impact of Improved High-Performance Si(110)-Oriented Metal–Oxide–Semiconductor Field-Effect Transistors Using Accumulation-Mode Fully Depleted Silicon-on-Insulator Devices

Japanese Journal of Applied Physics, 2006-04, Vol.45 (4S), p.3110

2006

Volltextzugriff (PDF)

Effect of Hydrogen on Silicon Nitrides Formation by Microwave Excited Plasma Enhanced Chemical Vapor Deposition

ECS transactions, 2015-03, Vol.66 (4), p.151-159

2015

Volltextzugriff (PDF)

ENIGMA: an enterotype-like unigram mixture model for microbial association analysis

BMC genomics, 2019-04, Vol.20 (Suppl 2), p.191-191, Article 191

2019

Volltextzugriff (PDF)

High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma

Japanese Journal of Applied Physics, 2011-03, Vol.50 (3), p.036502-036502-6

2011

Volltextzugriff (PDF)

A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region

Japanese Journal of Applied Physics, 2003, Vol.42 (Part 1, No. 4B), p.1887-1891

2003

Volltextzugriff (PDF)

Light-Emitting Diode Based on ZnO by Plasma-Enhanced Metal--Organic Chemical Vapor Deposition Employing Microwave Excited Plasma

Japanese Journal of Applied Physics, 2010-04, Vol.49 (4), p.04DG14-04DG14-4

2010

Volltextzugriff (PDF)

Low-Dielectric-Constant Nonporous Fluorocarbon Films for Interlayer Dielectric

Japanese Journal of Applied Physics, 2008-04, Vol.47 (4S), p.2515

2008

Volltextzugriff (PDF)

Damage-free microwave-excited plasma etching without carrier deactivation of heavily doped Si under thin silicide layer

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2008-01, Vol.26 (1), p.8-16

2008

Volltextzugriff (PDF)

Inhalation of hydrogen gas elevates urinary 8-hydroxy-2′-deoxyguanine in Parkinson’s disease

Medical gas research, 2018, Vol.8 (4), p.144

2018

Volltextzugriff (PDF)

Effects of Ion-Bombardment-Assist and High Temperature on Growth of Zinc Oxide Films by Microwave Excited High Density Plasma Enhanced Metal Organic Chemical Vapor Deposition

Japanese Journal of Applied Physics, 2009-04, Vol.48 (4S), p.4

2009

Volltextzugriff (PDF)

Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2009-07, Vol.27 (4), p.686-695

2009

Volltextzugriff (PDF)

Effect of Water on Hydrolytic Cleavage of Non-Terminal α‑Glycosidic Bonds in Cyclodextrins To Generate Monosaccharides and Their Derivatives in a Dimethyl Sulfoxide–Water Mixture

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2014-02, Vol.118 (8), p.1309-1319

2014

Volltextzugriff (PDF)

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH) /CaO Immobilization

IEEE transactions on semiconductor manufacturing, 2008-11, Vol.21 (4), p.668-675

2008

Volltextzugriff (PDF)

Silicon nitride film growth for advanced gate dielectric at low temperature employing high-density and low-energy ion bombardment

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1999-09, Vol.17 (5), p.3129-3133

1999

Volltextzugriff (PDF)

High-Quality Silicon Oxide Film Formed by Diffusion Region Plasma Enhanced Chemical Vapor Deposition and Oxygen Radical Treatment Using Microwave-Excited High-Density Plasma

Japanese Journal of Applied Physics, 2003, Vol.42 (Part 1, No. 4B), p.1911-1915

2003

Volltextzugriff (PDF)

High-Speed Damage-Free Contact Hole Etching Using Dual Shower Head Microwave-Excited High-Density-Plasma Equipment

Japanese Journal of Applied Physics, 2004-04, Vol.43 (4S), p.1784

2004

Volltextzugriff (PDF)

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)2/CaO Immobilization

IEEE transactions on semiconductor manufacturing, 2008-11, Vol.21 (4), p.668-675

2008

Volltextzugriff (PDF)

Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-k Copper Metallization

Japanese Journal of Applied Physics, 2008-04, Vol.47 (4S), p.2531

2008

Volltextzugriff (PDF)

1 – 25 von 560

Suche als RSS-Feed

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(451)
Mit Volltextzugriff
(491)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Thema

15 weitere anzeigen...

Weniger anzeigen...

Neu hinzugefügt

... seit 90 Tagen
(1)

Menü

Weitere Dienste

Einstellungen

Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition

Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition

Separation and Recovery of Lithium, Cobalt and Nickel Ion in an Aqueous Phase by Slug Flow

New era of silicon technologies due to radical reaction based semiconductor manufacturing

Low-energy high-flux ion bombardment-induced interfacial mixing during Al2O3 plasma-enhanced atomic layer deposition

Very High Carrier Mobility for High-Performance CMOS on a Si(110) Surface

Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition

Impact of Improved High-Performance Si(110)-Oriented Metal–Oxide–Semiconductor Field-Effect Transistors Using Accumulation-Mode Fully Depleted Silicon-on-Insulator Devices

Effect of Hydrogen on Silicon Nitrides Formation by Microwave Excited Plasma Enhanced Chemical Vapor Deposition

ENIGMA: an enterotype-like unigram mixture model for microbial association analysis

High-Rate Deposition of Amorphous Silicon Films by Microwave-Excited High-Density Plasma

A New Microwave-Excited Plasma Etching Equipment for Separating Plasma Excited Region from Etching Process Region

Light-Emitting Diode Based on ZnO by Plasma-Enhanced Metal--Organic Chemical Vapor Deposition Employing Microwave Excited Plasma

Low-Dielectric-Constant Nonporous Fluorocarbon Films for Interlayer Dielectric

Damage-free microwave-excited plasma etching without carrier deactivation of heavily doped Si under thin silicide layer

Inhalation of hydrogen gas elevates urinary 8-hydroxy-2′-deoxyguanine in Parkinson’s disease

Effects of Ion-Bombardment-Assist and High Temperature on Growth of Zinc Oxide Films by Microwave Excited High Density Plasma Enhanced Metal Organic Chemical Vapor Deposition

Establishment of very uniform gas-flow pattern in the process chamber for microwave-excited high-density plasma by ceramic shower plate

Effect of Water on Hydrolytic Cleavage of Non-Terminal α‑Glycosidic Bonds in Cyclodextrins To Generate Monosaccharides and Their Derivatives in a Dimethyl Sulfoxide–Water Mixture

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH) /CaO Immobilization

Silicon nitride film growth for advanced gate dielectric at low temperature employing high-density and low-energy ion bombardment

High-Quality Silicon Oxide Film Formed by Diffusion Region Plasma Enhanced Chemical Vapor Deposition and Oxygen Radical Treatment Using Microwave-Excited High-Density Plasma

High-Speed Damage-Free Contact Hole Etching Using Dual Shower Head Microwave-Excited High-Density-Plasma Equipment

High-Efficiency PFC Abatement System Utilizing Plasma Decomposition and Ca(OH)2/CaO Immobilization

Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-k Copper Metallization

Suchergebnisse filtern