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Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Applied physics letters, 2006-07, Vol.89 (4)

2006

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In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Journal of physics. D, Applied physics, 2009-04, Vol.42 (7), p.073001-073001 (19); [np]

2009

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Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Applied physics letters, 2006-08, Vol.89 (8)

2006

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Sheet resistance under Ohmic contacts to AlGaN/GaN heterostructures

Applied physics letters, 2014-06, Vol.104 (24)

2014

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Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

Journal of applied physics, 2008-05, Vol.103 (10)

2008

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Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

Journal of the Electrochemical Society, 2006, Vol.153 (11), p.G956

2006

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In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Applied physics letters, 2006-09, Vol.89 (13)

2006

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In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Journal of applied physics, 2006-07, Vol.100 (2)

2006

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Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-01, Vol.28 (1), p.77-87

2010

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A vacuum-UV laser-induced fluorescence experiment for measurement of rotationally and vibrationally excited H2

Review of scientific instruments, 2004-04, Vol.75 (4), p.996-999

2004

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Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

Journal of the Electrochemical Society, 2007, Vol.154 (7), p.G165

2007

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Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2007-09, Vol.25 (5), p.1357-1366

2007

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Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Physica status solidi. C, 2005-12, Vol.2 (12), p.3958-3962

2005

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Human rhinovirus C: Age, season, and lower respiratory illness over the past 3 decades

Journal of allergy and clinical immunology, 2013-01, Vol.131 (1), p.69-77.e6

2013

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Utility of lateral scapular radiographs in initial evaluation of nontraumatic shoulder conditions

JSES reviews, reports, and techniques, 2022-05, Vol.2 (2), p.149-154

2022

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Clinical Fate of Glenohumeral Osteoarthritis Following Intraarticular Corticosteroid Injection: An Analysis in 311 Shoulders

Journal of shoulder and elbow arthroplasty, 2022, Vol.6, p.24715492221075446-24715492221075446

2022

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Characterization of recessed Ohmic contacts to AlGaN/GaN

Proceedings of the 2015 International Conference on Microelectronic Test Structures, 2015, p.158-162

2015

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Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2005-07, Vol.23 (4), p.L5-L8

2005

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Reaction mechanisms during plasma-assisted atomic layer depositionof metal oxides: A case study for Al 2 O 3

Journal of applied physics, 2008-05, Vol.103 (10), p.103302-103302-14

2008

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Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al 2 O 3

Journal of applied physics, 2008-05, Vol.103 (10)

2008

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Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2008-05, Vol.26 (3), p.472-480

2008

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Plasma-assisted atomic layer deposition of Ta 2 O 5 from alkylamide precursor and remote O 2 plasma

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2008-05, Vol.26 (3), p.472-480

2008

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In situ spectroscopic ellipsometry study on the growth of ultrathinTiN films by plasma-assisted atomic layer deposition

Journal of applied physics, 2006-07, Vol.100 (2), p.023534-023534-10

2006

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Ultralow surface recombination of c - Si substrates passivatedby plasma-assisted atomic layer deposited Al 2 O 3

Applied physics letters, 2006-07, Vol.89 (4), p.042112-042112-3

2006

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In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al 2 O 3

Applied physics letters, 2006-09, Vol.89 (13), p.131505-131505-3

2006

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Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Sheet resistance under Ohmic contacts to AlGaN/GaN heterostructures

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes

A vacuum-UV laser-induced fluorescence experiment for measurement of rotationally and vibrationally excited H2

Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor

Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Human rhinovirus C: Age, season, and lower respiratory illness over the past 3 decades

Utility of lateral scapular radiographs in initial evaluation of nontraumatic shoulder conditions

Clinical Fate of Glenohumeral Osteoarthritis Following Intraarticular Corticosteroid Injection: An Analysis in 311 Shoulders

Characterization of recessed Ohmic contacts to AlGaN/GaN

Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry

Reaction mechanisms during plasma-assisted atomic layer depositionof metal oxides: A case study for Al 2 O 3

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al 2 O 3

Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma

Plasma-assisted atomic layer deposition of Ta 2 O 5 from alkylamide precursor and remote O 2 plasma

In situ spectroscopic ellipsometry study on the growth of ultrathinTiN films by plasma-assisted atomic layer deposition

Ultralow surface recombination of c - Si substrates passivatedby plasma-assisted atomic layer deposited Al 2 O 3

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al 2 O 3

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