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The Establishment of Sputtering and Plasma Process Sub-Division, its History and the Locus of Development

Journal of the Vacuum Society of Japan, 2014, Vol.57(1), pp.32-34

HATA, Tomonobu

2014

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Anomalous Large Thermoelectric Power on Heavily B-Doped SiGe Thin Films with Thermal Annealing

Japanese Journal of Applied Physics, 2002-08, Vol.41 (Part 2, No. 8B), p.L949-L951

2002

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Unbalanced Magnetron Sputtering Using Cylindrical Target for Low-Temperature Optical Coating

Japanese Journal of Applied Physics, 2005-01, Vol.44 (1S), p.669

2005

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Electrical Properties of Low-Temperature (450°C) Pb(Zr,Ti)O 3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering

Japanese Journal of Applied Physics, 1996-09, Vol.35 (9S), p.5084

1996

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Low-Temperature Fabrication of Pb(Zr,Ti)O 3 Films by RF Reactive Sputtering Using Zr/Ti + PbO Target

Japanese Journal of Applied Physics, 1995-09, Vol.34 (9S), p.5120

1995

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Growth Dependence of Reactively Sputtered Yttria-Stabilized Zirconia on Si(100), (110), (111) Substrates

Japanese Journal of Applied Physics, 1999-01, Vol.38 (1A), p.L74

1999

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Target for a Pb(Zr,Ti)O 3 Thin Film Deposited at a Low Temperature Using a Quasi-Metallic Mode of Reactive Sputtering

Japanese Journal of Applied Physics, 1999-12, Vol.38 (12R), p.6882

1999

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Analysis of pyroelectric signal in photoacoustic spectroscopy using a transparent transducer

JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP, 1993-05, Vol.32 (5B), p.2561-2566

1993

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Epitaxial growth of SiGe thin films by ion-beam sputtering

Applied surface science, 1997-04, Vol.113, p.43-47

1997

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スパッタリングおよびプラズマプロセス技術部会（SP 部会）の設立と発展の軌跡

Journal of the Vacuum Society of Japan, 2014, Vol.57(1), pp.32-34

畑, 朋延

2014

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Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr,Ti)O 3 Films

Japanese Journal of Applied Physics, 1996-03, Vol.35 (3R), p.1868

1996

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Electrical properties of low-temperature (450°C) Pb(Zr,Ti)O3 films prepared in quasi-metallic mode by RF reactive sputtering

Japanese journal of applied physics, 1996-09, Vol.35 (9B), p.5084-5088

1996

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Ozone in reactive gas for producing tin-doped indium oxide films by DC reactive magnetron sputtering

Thin solid films, 1996-08, Vol.281, p.209-212

1996

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Determination of material thermal properties using photoacoustic signals detected by a transparent transducer

Japanese Journal of Applied Physics, 1994-05, Vol.33 (5B), p.3238-3245

1994

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Analysis of sputter process on a new ZrTi+PbO target system and its application to low-temperature deposition of ferroelectric Pb(Zr,Ti)O3 films

Japanese journal of applied physics, 1996, Vol.35 (3), p.1868-1872

1996

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Improvement of the crystalline quality of an yttria-stabilized zirconia film on silicon by a new deposition process in reactive sputtering

Thin solid films, 1993-06, Vol.229 (1), p.17-23

1993

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Investigation of oxygen source from vapor phase and target for growth of Pb(Zr,Ti)O3 thin film

Electronics & communications in Japan. Part 2, Electronics, 2003-03, Vol.86 (3), p.28-34

2003

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PHOTOACOUSTIC SPECTROSCOPY (PAS) OF SEMICONDUCTOR MATERIALS USING TRANSPARENT TRANSDUCER

Journal of Advanced Science, 1990/12/15, Vol.2(4), pp.213-217

HATA, Tomonobu

1990

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Recent Trends of PVD and CVD. Deposition of Metal-oxide Films by Reactive Sputtering

Hyōmen gijutsu, 1995, Vol.46 (7), p.590-593

HATA, Tomonobu

1995

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Low-temperature fabrication (450°C) and evaluation of Pb(Zr, Ti)O3 thin films by reactive sputtering using (ZrTi + PbO) target

Integrated ferroelectrics, 1996-10, Vol.12 (2-4), p.151-160

1996

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Optimization of ZnO Piezoelectric Thin Films and Bottom Electrodes in Thin Film BulkAcoustic Wave Resonator

IEEJ transactions on sensors and micromachines, 2000, Vol.120 (12), p.547-553

2000

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Study on differential photothermal deflection spectroscopy (PDS) considering the intensity profile of a probe beam

Japanese Journal of Applied Physics, 1993-05, Vol.32 (5B), p.2557-2560

1993

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Improvement of sensitivity of photothermal deflection spectroscopy by a double pass method

Review of scientific instruments, 1992-03, Vol.63 (3), p.1909-1913

1992

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Evaluation of optical absorption coefficient of Si by photothermal spectroscopy using transparent pyroelectric transducer

Japanese Journal of Applied Physics, 1995-05, Vol.34 (5B), p.2911-2916

1995

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New method to control composition ratio of alloy films by compressed magnetic field–magnetron sputtering technique

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1987-07, Vol.5 (4), p.2154-2157

1987

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The Establishment of Sputtering and Plasma Process Sub-Division, its History and the Locus of Development

Anomalous Large Thermoelectric Power on Heavily B-Doped SiGe Thin Films with Thermal Annealing

Unbalanced Magnetron Sputtering Using Cylindrical Target for Low-Temperature Optical Coating

Electrical Properties of Low-Temperature (450°C) Pb(Zr,Ti)O 3 Films Prepared in Quasi-Metallic Mode by RF Reactive Sputtering

Low-Temperature Fabrication of Pb(Zr,Ti)O 3 Films by RF Reactive Sputtering Using Zr/Ti + PbO Target

Growth Dependence of Reactively Sputtered Yttria-Stabilized Zirconia on Si(100), (110), (111) Substrates

Target for a Pb(Zr,Ti)O 3 Thin Film Deposited at a Low Temperature Using a Quasi-Metallic Mode of Reactive Sputtering

Analysis of pyroelectric signal in photoacoustic spectroscopy using a transparent transducer

Epitaxial growth of SiGe thin films by ion-beam sputtering

スパッタリングおよびプラズマプロセス技術部会（SP 部会）の設立と発展の軌跡

Analysis of Sputter Process on a New ZrTi+PbO Target System and Its Application to Low-Temperature Deposition of Ferroelectric Pb(Zr,Ti)O 3 Films

Electrical properties of low-temperature (450°C) Pb(Zr,Ti)O3 films prepared in quasi-metallic mode by RF reactive sputtering

Ozone in reactive gas for producing tin-doped indium oxide films by DC reactive magnetron sputtering

Determination of material thermal properties using photoacoustic signals detected by a transparent transducer

Analysis of sputter process on a new ZrTi+PbO target system and its application to low-temperature deposition of ferroelectric Pb(Zr,Ti)O3 films

Improvement of the crystalline quality of an yttria-stabilized zirconia film on silicon by a new deposition process in reactive sputtering

Investigation of oxygen source from vapor phase and target for growth of Pb(Zr,Ti)O3 thin film

PHOTOACOUSTIC SPECTROSCOPY (PAS) OF SEMICONDUCTOR MATERIALS USING TRANSPARENT TRANSDUCER

Recent Trends of PVD and CVD. Deposition of Metal-oxide Films by Reactive Sputtering

Low-temperature fabrication (450°C) and evaluation of Pb(Zr, Ti)O3 thin films by reactive sputtering using (ZrTi + PbO) target

Optimization of ZnO Piezoelectric Thin Films and Bottom Electrodes in Thin Film BulkAcoustic Wave Resonator

Study on differential photothermal deflection spectroscopy (PDS) considering the intensity profile of a probe beam

Improvement of sensitivity of photothermal deflection spectroscopy by a double pass method

Evaluation of optical absorption coefficient of Si by photothermal spectroscopy using transparent pyroelectric transducer

New method to control composition ratio of alloy films by compressed magnetic field–magnetron sputtering technique

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