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Efficiency improvement of near-ultraviolet InGaN LEDs using patterned sapphire substrates

IEEE journal of quantum electronics, 2005-11, Vol.41 (11), p.1403-1409

2005

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Room-temperature continuous-wave vertical-cavity surface-emitting GaAs injection lasers

Applied physics letters, 1989-12, Vol.55 (24), p.2473-2475

1989

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Deep Subhalf‐Micron Contact Filling Technology Using Control Etching and Collimated Ti Sputtering Techniques

Journal of the Electrochemical Society, 1995-02, Vol.142 (2), p.664-668

1995

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InP Etch Pit Morphologies Revealed by Novel HCl ‐ Based Etchants

Journal of the Electrochemical Society, 1989-06, Vol.136 (6), p.1804-1806

1989

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Preferential Etching of InGaAsP / InP Using Low Temperature Bromine/Methanol for Planar Buried Heterostructure Lasers

Journal of the Electrochemical Society, 1989-06, Vol.136 (6), p.1828-1830

1989

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Preferential Etching of InP Through Photoresist Masks

Journal of the Electrochemical Society, 1988-09, Vol.135 (9), p.2334-2338

1988

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Reticulated Single‐Crystal Luminescent Screen

Journal of the Electrochemical Society, 1986-07, Vol.133 (7), p.1492-1497

1986

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SiO2 films by low pressure chemical vapor deposition using diethylsilane: Processing and characterization

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1991-09, Vol.9 (5), p.2602-2606

1991

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Chemical Cleaning of Gratings in Distributed Feedback InP Lasers

Journal of the Electrochemical Society, 1990-11, Vol.137 (11), p.3639-3642

1990

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Planarization of SiO2 films using reactive ion beam in plasma enhanced chemical vapor deposition

Journal of applied physics, 1991-05, Vol.69 (9), p.6637-6642

1991

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Controlled Undercutting of V‐Groove Channels for InP by Photoresist Etch Mask

Journal of the Electrochemical Society, 1988-05, Vol.135 (5), p.1231-1234

1988

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A Novel Etch Mask Process for the Etching of (011) Oriented Facet V‐Grooves in InP (100) Wafers

Journal of the Electrochemical Society, 1987-11, Vol.134 (11), p.2850-2856

1987

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Effects of Mask Imperfections on InP Etching Profiles

Journal of the Electrochemical Society, 1990-01, Vol.137 (1), p.239-242

1990

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New chemical solutions for the etching of (011) oriented V-grooves in InP(001) for CSBH laser diodes

Journal of materials research, 1989-08, Vol.4 (4), p.857-862

1989

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Modified Photoresist Etch Mask Process for InP Channeled Substrate Lasers

Journal of the Electrochemical Society, 1989-03, Vol.136 (3), p.772-775

1989

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An Improved Terbium‐Activated Single‐Crystal Phosphor for Head Up Display Cathode Ray Tube

Journal of the Electrochemical Society, 1988-05, Vol.135 (5), p.1302-1305

1988

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Monolithically integrated thermoelectric controlled laser diode

Applied physics letters, 1985-08, Vol.47 (3), p.222-224

1985

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Preparation of Y 3Al5 O 12 ‐ Based Phosphor Powders

Journal of the Electrochemical Society, 1987-02, Vol.134 (2), p.493-498

1987

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Novel technique of phosphor deposition to form cathode-ray-tube screens

IEEE transactions on electron devices, 1986-08, Vol.33 (8), p.1227-1230

1986

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Wafer Stage Staining Technique for Detection of Zn Out‐Diffusion in InGaAsP / InP Lasers

Journal of the Electrochemical Society, 1990-10, Vol.137 (10), p.3270-3271

1990

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Planarization of SiO sub 2 films using reactive ion beam in plasma-enhanced chemical vapor deposition

Journal of applied physics, 1991-01, Vol.69 (9), p.6637-6642

1991

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Chemical Etching of (001) InP by HBr ‐ H 2 O 2 ‐ H 2 O ‐ HCl Solution

Journal of the Electrochemical Society, 1989-10, Vol.136 (10), p.3094-3097

1989

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A photoluminescence technique for characterizing the GaInAsP channeled substrate buried heterostructure wafer for lasing wavelength

Journal of materials research, 1988-04, Vol.3 (2), p.309-313

1988

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Growth Parameter Optimization and Tb3+ Sensitization of Ce3+ Activated Y 3Al5 O 12 Phosphor

Journal of the Electrochemical Society, 1987-10, Vol.134 (10), p.2624-2628

1987

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1.5μm InP/GaInAsP linear laser array with twelve individually addressable elements

Electronics letters, 1988, Vol.24 (4), p.217-219

1988

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Efficiency improvement of near-ultraviolet InGaN LEDs using patterned sapphire substrates

Room-temperature continuous-wave vertical-cavity surface-emitting GaAs injection lasers

Deep Subhalf‐Micron Contact Filling Technology Using Control Etching and Collimated Ti Sputtering Techniques

InP Etch Pit Morphologies Revealed by Novel HCl ‐ Based Etchants

Preferential Etching of InGaAsP / InP Using Low Temperature Bromine/Methanol for Planar Buried Heterostructure Lasers

Preferential Etching of InP Through Photoresist Masks

Reticulated Single‐Crystal Luminescent Screen

SiO2 films by low pressure chemical vapor deposition using diethylsilane: Processing and characterization

Chemical Cleaning of Gratings in Distributed Feedback InP Lasers

Planarization of SiO2 films using reactive ion beam in plasma enhanced chemical vapor deposition

Controlled Undercutting of V‐Groove Channels for InP by Photoresist Etch Mask

A Novel Etch Mask Process for the Etching of (011) Oriented Facet V‐Grooves in InP (100) Wafers

Effects of Mask Imperfections on InP Etching Profiles

New chemical solutions for the etching of (011) oriented V-grooves in InP(001) for CSBH laser diodes

Modified Photoresist Etch Mask Process for InP Channeled Substrate Lasers

An Improved Terbium‐Activated Single‐Crystal Phosphor for Head Up Display Cathode Ray Tube

Monolithically integrated thermoelectric controlled laser diode

Preparation of Y 3Al5 O 12 ‐ Based Phosphor Powders

Novel technique of phosphor deposition to form cathode-ray-tube screens

Wafer Stage Staining Technique for Detection of Zn Out‐Diffusion in InGaAsP / InP Lasers

Planarization of SiO sub 2 films using reactive ion beam in plasma-enhanced chemical vapor deposition

Chemical Etching of (001) InP by HBr ‐ H 2 O 2 ‐ H 2 O ‐ HCl Solution

A photoluminescence technique for characterizing the GaInAsP channeled substrate buried heterostructure wafer for lasing wavelength

Growth Parameter Optimization and Tb3+ Sensitization of Ce3+ Activated Y 3Al5 O 12 Phosphor

1.5μm InP/GaInAsP linear laser array with twelve individually addressable elements

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